Patents by Inventor Hiromitsu Takase
Hiromitsu Takase has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8921807Abstract: A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.Type: GrantFiled: May 2, 2012Date of Patent: December 30, 2014Assignee: Canon Kabushiki KaishaInventors: Hiromitsu Takase, Ichiro Tanaka, Akira Miyake
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Patent number: 8698095Abstract: The charged particle beam drawing apparatus of the present invention performs drawing to a substrate with a plurality of charged particle beams. The drawing apparatus includes an electron lens positioned at a location facing opposite to the substrate and including a plurality of holes through which the charged particle beams pass; and a cleaning unit configured to release active species to a decomposition product that has adhered to the electron lens and reduce the decomposition product by the reaction of the active species and the decomposition product to thereby change the decomposition product to a volatile gas. Here, the cleaning unit has a plurality of openings formed such that the active species are released toward the plurality of holes of the electron lens.Type: GrantFiled: January 5, 2012Date of Patent: April 15, 2014Assignee: Canon Kabushiki KaishaInventors: Ichiro Tanaka, Akira Miyake, Hiromitsu Takase
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Publication number: 20120288799Abstract: A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.Type: ApplicationFiled: May 2, 2012Publication date: November 15, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Hiromitsu Takase, Ichiro Tanaka, Akira Miyake
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Publication number: 20120178025Abstract: The charged particle beam drawing apparatus of the present invention performs drawing to a substrate with a plurality of charged particle beams. The drawing apparatus includes an electron lens positioned at a location facing opposite to the substrate and including a plurality of holes through which the charged particle beams pass; and a cleaning unit configured to release active species to a decomposition product that has adhered to the electron lens and reduce the decomposition product by the reaction of the active species and the decomposition product to thereby change the decomposition product to a volatile gas. Here, the cleaning unit has a plurality of openings formed such that the active species are released toward the plurality of holes of the electron lens.Type: ApplicationFiled: January 5, 2012Publication date: July 12, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Ichiro TANAKA, Akira MIYAKE, Hiromitsu TAKASE
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Patent number: 8149378Abstract: A cleaning apparatus for an exposure apparatus that projects a pattern of an exposing mask onto a substrate with first light through an optical element is provided. The cleaning apparatus cleans the optical element with second light having a wavelength different from that of the first light, and includes a recording part configured to record information on exposure history of the exposure apparatus, and an information producing part configured to produce information on a cumulative irradiation light amount of the second light at each of regions in a predetermined cleaning area on the optical element, based on the information on the exposure history.Type: GrantFiled: April 23, 2008Date of Patent: April 3, 2012Assignee: Canon Kabushiki KaishaInventors: Hideki Morishima, Takahiro Sasaki, Hiromitsu Takase
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Patent number: 7724348Abstract: An exposure apparatus for exposing a substrate to exposure light via an original. The apparatus includes a reflector, which includes a multilayer film and a ruthenium film, and reflects the exposure light. The multilayer film reflects the exposure light, and the ruthenium film is arranged on the multilayer film. A vacuum container contains the reflector, an exhauster exhausts exhaust gas in the vacuum container, and a regulator supplies water vapor into the vacuum container and regulates an amount of the water vapor in the vacuum container, based on an amount of carbonaceous gas in the vacuum chamber, so as to retard oxidation of the ruthenium film.Type: GrantFiled: December 21, 2006Date of Patent: May 25, 2010Assignee: Canon Kabushiki KaishaInventors: Yoshio Gomei, Hiromitsu Takase, Shigeru Terashima
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Publication number: 20090093373Abstract: To provide a DNA micro-array having a nucleic acid probe immobilized on a substrate, which is used to detect a molecule of a target nucleic acid contained in a sample and has a substantially complementary base sequence to the target base sequence of the nucleic acid molecule, including at least one probe selected from the group consisting of: at least one internal standard probe for assay of PCR of the target nucleic acid; at least one external standard probe for a detection operation and assay of an amount of the probe; and a probe for measurement of the amount or density of the nucleic acid probe, formed by the same method as the nucleic acid probe.Type: ApplicationFiled: November 3, 2008Publication date: April 9, 2009Applicant: CANON KABUSHIKI KAISHAInventors: Masahiro Kawaguchi, Tadashi Okamoto, Hiromitsu Takase, Hiroyuki Hashimoto
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Publication number: 20080267815Abstract: A cleaning apparatus for an exposure apparatus that projects a pattern of an exposing mask onto a substrate with first light through an optical element is provided. The cleaning apparatus cleans the optical element with second light having a wavelength different from that of the first light, and includes a recording part configured to record information on exposure history of the exposure apparatus, and an information producing part configured to produce information on a cumulative irradiation light amount of the second light at each of regions in a predetermined cleaning area on the optical element, based on the information on the exposure history.Type: ApplicationFiled: April 23, 2008Publication date: October 30, 2008Applicant: CANON KABUSHIKI KAISHAInventors: Hideki Morishima, Takahiro Sasaki, Hiromitsu Takase
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Patent number: 7416462Abstract: To reuse glass used in a flat panel display, processing suitable for global environment such as processing of separating a lead component must be realized. A disassembly processing method for a flat panel display having a structure in which a face plate and rear plate mainly containing glass are airtightly joined via a frame with frit glass is characterized by including the step of separating the face plate and rear plate joined with the frit glass. The separation step is characterized by separating the face plate and rear plate by cutting, dissolution, or melting.Type: GrantFiled: January 3, 2005Date of Patent: August 26, 2008Assignee: Canon Kabushiki KaishaInventors: Takashi Noma, Toyoko Kobayashi, Taiko Motoi, Hiromitsu Takase, Naoko Miura, Shin Kobayashi
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Publication number: 20070097342Abstract: This invention provides a novel technique for reducing at least the former of the oxidation of a ruthenium film and the deposition of carbon onto the ruthenium film.Type: ApplicationFiled: December 21, 2006Publication date: May 3, 2007Applicant: CANON KABUSHIKI KAISHAInventors: Yoshio Gomei, Hiromitsu Takase, Shiqeru Terashima
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Patent number: 7208276Abstract: Nucleic acid probes arranged on a nucleic acid chip substrate in a matrix form can be analyzed quantitatively by TOF-SIMS with accuracy by forming a phosphorus-containing area which can be used as a standard on the substrate.Type: GrantFiled: December 4, 2003Date of Patent: April 24, 2007Assignee: Canon Kabushiki KaishaInventors: Hiromitsu Takase, Tadashi Okamoto, Toshiaki Aiba, Hiroyuki Hashimoto
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Patent number: 7188031Abstract: A measurement method is provided, which enables to obtain a two-dimensional image with better quantitative-ability by suppressing the influence of the charge-up, when the two-dimensional secondary ion image is obtained for a biological material fixed on a substrate having a high resistivity by utilizing a TOF-SIMS method in a certain wide area. A two-dimensional image having considerably high positioning resolution-ability can be obtained by the procedure in which the pulsed primary ion beam is irradiated at a spot, and the pulse-wise spot-applications of the primary ion beam and the simultaneous detection of the secondary ion generated from the irradiated primary ion beam proceed along with a discontinuous scanning pattern, and eventually the results of these secondary ion measurements are reconstructed into a two-dimensional image in line with the aforementioned discontinuous scanning pattern.Type: GrantFiled: June 24, 2003Date of Patent: March 6, 2007Assignee: Canon Kabushiki KaishaInventors: Tadashi Okamoto, Hiromitsu Takase, Hiroyuki Hashimoto
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Publication number: 20070042496Abstract: A measurement method is provided, which enables to obtain a two-dimensional image with better quantitative-ability by suppressing the influence of the charge-up, when the two-dimensional secondary ion image is obtained for a biological material fixed on a substrate having a high resistivity by utilizing a TOF-SIMS method in a certain wide area. A two-dimensional image having considerably high positioning resolution-ability can be obtained by the procedure in which the pulsed primary ion beam is irradiated at a spot, and the pulse-wise spot-applications of the primary ion beam and the simultaneous detection of the secondary ion generated from the irradiated primary ion beam proceed along with a discontinuous scanning pattern, and eventually the results of these secondary ion measurements are reconstructed into a two-dimensional image in line with the aforementioned discontinuous scanning pattern.Type: ApplicationFiled: June 24, 2003Publication date: February 22, 2007Applicant: CANON KABUSHIKI KAISHAInventors: Tadashi Okamoto, Hiromitsu Takase, Hiroyuki Hashimoto
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Patent number: 6951494Abstract: To reuse glass used in a flat panel display, processing suitable for global environment such as processing of separating a lead component must be realized. A disassembly processing method for a flat panel display having a structure in which a face plate and rear plate mainly containing glass are airtightly joined via a frame with frit glass is characterized by including the step of separating the face plate and rear plate joined with the frit glass. The separation step is characterized by separating the face plate and rear plate by cutting, dissolution, or melting.Type: GrantFiled: June 17, 2003Date of Patent: October 4, 2005Assignee: Canon Kabushiki KaishaInventors: Takashi Noma, Toyoko Kobayashi, Taiko Motoi, Hiromitsu Takase, Naoko Miura, Shin Kobayashi
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Publication number: 20050159068Abstract: To reuse glass used in a flat panel display, processing suitable for global environment such as processing of separating a lead component must be realized. A disassembly processing method for a flat panel display having a structure in which a face plate and rear plate mainly containing glass are airtightly joined via a frame with frit glass is characterized by including the step of separating the face plate and rear plate joined with the frit glass. The separation step is characterized by separating the face plate and rear plate by cutting, dissolution, or melting.Type: ApplicationFiled: January 3, 2005Publication date: July 21, 2005Applicant: CANON KABUSHIKI KAISHAInventors: Takashi Noma, Toyoko Kobayashi, Taiko Motoi, Hiromitsu Takase, Naoko Miura, Shin Kobayashi
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Publication number: 20040259088Abstract: The analysis method according to the present invention provides a method for detecting the target nucleic acid in the sample, in which the problems caused by employing the radio isotope and fluorescent methods can be solved, thereby enabling the acquisition of gene information with higher accuracy. A method for analyzing a target nucleic acid in a sample is conducted by: reacting the sample with a probe support having two or more probes fixed thereon, which contain a base portion being complementary with a base sequence of the target nucleic acid; and detecting an existence of a hybridized complex of the probe and the target nucleic acid using time of flight secondary ion mass spectrometry, in which the hybridized complex is formed when the target nucleic acid is contained in the sample, wherein the target nucleic acid and the nucleic acid probe are a combination of RNA and DNA.Type: ApplicationFiled: June 18, 2003Publication date: December 23, 2004Applicant: CANON KABUSHIKI KAISHAInventors: Tadashi Okamoto, Hiromitsu Takase, Hiroyuki Hashimoto
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Publication number: 20040152113Abstract: Nucleic acid probes arranged on a nucleic acid chip substrate in a matrix form can be analyzed quantitatively by TOF-SIMS with accuracy by forming a phosphorus-containing area which can be used as a standard on the substrate.Type: ApplicationFiled: December 4, 2003Publication date: August 5, 2004Inventors: Hiromitsu Takase, Tadashi Okamoto, Toshiaki Aiba, Hiroyuki Hashimoto
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Publication number: 20040137491Abstract: A method of analyzing a measuring sample is provided which is capable of accurately analyzing the state of a probe disposed on a carrier and formation/unformation of a hybrid between the probe and a target nucleic acid, for example, imaging of the disposing locations and quantitative analysis thereof.Type: ApplicationFiled: December 23, 2003Publication date: July 15, 2004Inventors: Tadashi Okamoto, Hiromitsu Takase, Hiroyuki Hashimoto
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Publication number: 20040132080Abstract: To provide a DNA micro-array having a nucleic acid probe immobilized on a substrate, which is used to detect a molecule of a target nucleic acid contained in a sample and has a substantially complementary base sequence to the target base sequence of the nucleic acid molecule, including at least one probe selected from the group consisting of: at least one internal standard probe for assay of PCR of the target nucleic acid; at least one external standard probe for a detection operation and assay of an amount of the probe; and a probe for measurement of the amount or density of the nucleic acid probe, formed by the same method as the nucleic acid probe.Type: ApplicationFiled: December 17, 2003Publication date: July 8, 2004Applicant: Canon Kabushiki KaishaInventors: Masahiro Kawaguchi, Tadashi Okamoto, Hiromitsu Takase, Hiroyuki Hashimoto
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Publication number: 20040002276Abstract: To reuse glass used in a flat panel display, processing suitable for global environment such as processing of separating a lead component must be realized. A disassembly processing method for a flat panel display having a structure in which a face plate and rear plate mainly containing glass are airtightly joined via a frame with frit glass is characterized by including the step of separating the face plate and rear plate joined with the frit glass. The separation step is characterized by separating the face plate and rear plate by cutting, dissolution, or melting.Type: ApplicationFiled: June 17, 2003Publication date: January 1, 2004Applicant: CANON KABUSHIKI KAISHAInventors: Takashi Noma, Toyoko Kobayashi, Taiko Motoi, Hiromitsu Takase, Naoko Miura, Shin Kobayashi