Patents by Inventor Hironori Atarashi

Hironori Atarashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9029474
    Abstract: The present invention relates to a process for producing a polymer structure comprising: mixing and unifying a matrix polymer made of a linear polymer and a highly-branched polymer having hydrophilic functional groups at molecular ends and to form a structure containing the matrix polymer and the highly-branched polymer; and subjecting the obtained structure to either immersion in water and/or a hydrophilic solvent or exposure to an atmosphere of vapor of water and/or a hydrophilic solvent at a temperature ranging from a temperature lower than Tg of the matrix polymer by 30° C. to decomposition temperature of the matrix polymer; wherein the hydrophilic functional groups at the molecular ends of the highly-branched polymer are distributed in outermost surface of the polymer structure at an enhanced density. The present invention also relates to a process for producing a polymer structure in which vinyl polymer chains are grafted to at least a part of the hydrophilic functional groups.
    Type: Grant
    Filed: April 23, 2008
    Date of Patent: May 12, 2015
    Assignees: Nissan Chemical Industries, Ltd., Kyushu University
    Inventors: Masaaki Ozawa, Keisuke Odoi, Hironori Atarashi, Kei-ichi Akabori, Toshihiko Nagamura, Keiji Tanaka
  • Publication number: 20150060281
    Abstract: A method for manufacturing a metamaterial including an electromagnetic wave resonator that resonates with an electromagnetic wave is provided. In the method, a support including a portion where the electromagnetic wave resonator is to be formed is formed, and the electromagnetic wave resonator is arranged in the support by depositing a material to form the electromagnetic wave resonator on the portion of the support. The support is formed by forming a column structure of a hydrophilic/hydrophobic phase-separated film including a hydrophilic liquid phase area penetrating through in a thickness direction, by packing a filler into the column structure of the hydrophilic/hydrophobic phase-separated film including the hydrophilic liquid phase area so as to form the filler as high as the column structure, and by obtaining the support including the filler by removing at least a part of the hydrophilic/hydrophobic phase-separated film.
    Type: Application
    Filed: July 21, 2014
    Publication date: March 5, 2015
    Applicants: TOKYO INSTITUTE OF TECHNOLOGY, Asahi Glass Company, Limited
    Inventors: Tomokazu IYODA, Hironori ATARASHI, Nanae YAMASHITA, Kaori KAMATA, Kenji KITAOKA
  • Publication number: 20100120984
    Abstract: The present invention relates to a process for producing a polymer structure comprising: mixing and unifying a matrix polymer made of a linear polymer and a highly-branched polymer having hydrophilic functional groups at molecular ends and to form a structure containing the matrix polymer and the highly-branched polymer; and subjecting the obtained structure to either immersion in water and/or a hydrophilic solvent or exposure to an atmosphere of vapor of water and/or a hydrophilic solvent at a temperature ranging from a temperature lower than Tg of the matrix polymer by 30° C. to decomposition temperature of the matrix polymer; wherein the hydrophilic functional groups at the molecular ends of the highly-branched polymer are distributed in outermost surface of the polymer structure at an enhanced density. The present invention also relates to a process for producing a polymer structure in which vinyl polymer chains are grafted to at least a part of the hydrophilic functional groups.
    Type: Application
    Filed: April 23, 2008
    Publication date: May 13, 2010
    Applicants: NISSAN CHEMICAL INDUSTRIES, LTD., KYUSYU UNIVERSITY
    Inventors: Masaaki Ozawa, Keisuke Odoi, Hironori Atarashi, Kei-ichi Akabori, Toshihiro Nagamura, Keiji Tanaka