Patents by Inventor Hironori Hasei

Hironori Hasei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7534337
    Abstract: A substrate before an insulation process, which is provided with a protection film to prevent a part of a surface area, which has electrical conductivity from being insulated, the substrate comprises: a base including the surface area, which has electrical conductivity; a protection film covering over the part of the surface area, which has electrical conductivity, and being formed on the base; the protection film including; a first protection layer having a circumferential partition wall and a second protection layer placed and embedded in an area, which is surrounded by the circumferential partition wall.
    Type: Grant
    Filed: January 26, 2006
    Date of Patent: May 19, 2009
    Assignee: Seiko Epson Corporation
    Inventor: Hironori Hasei
  • Patent number: 7527368
    Abstract: An identification code is formed in a code formation area provided on a substrate. The code formation area is divided into a plurality of data cells. A plurality of dots are bonded with the substrate in such a manner that each of the dots is arranged in a predetermined data cell selected from the data cells. Each dot includes a projection formed in a peripheral portion of the dot and a flat portion formed in a center of the dot encompassed by the peripheral portion. The ratio of the thickness of the projection to the thickness of the flat portion is greater than 4 and smaller than 7. This structure improves the bonding strength of each dot with respect to the substrate.
    Type: Grant
    Filed: February 24, 2006
    Date of Patent: May 5, 2009
    Assignee: Seiko Epson Corporation
    Inventor: Hironori Hasei
  • Patent number: 7517125
    Abstract: A backlight unit including: a light source that irradiates light; and a diffusing plate that diffuses the light irradiated from the light source, wherein the diffusing plate is provided with a first microlens of ellipsoid form, and a second microlens of ellipsoid form disposed in such a manner that long axes of the first microlens and the second microlens are approximately perpendicular to each other, and a long axis direction of the first microlens and a long axis direction of the light source are arranged approximately parallel to each other, and a long axis direction of the second microlens and the long axis direction of the light source are arranged approximately perpendicular to each other.
    Type: Grant
    Filed: June 12, 2006
    Date of Patent: April 14, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Hironori Hasei, Akira Inagaki, Kazumi Aruga
  • Publication number: 20090051718
    Abstract: An acceptable duration is defined as the time necessary for allowing the diameter of a microdroplet that has reached the substrate to become a maximum acceptable droplet diameter. A scanning speed is set in such a manner that the microdroplet that has been received by the substrate reaches a radiating position from a droplet receiving position immediately after the acceptable duration has passed since reception of the microdroplet by the substrate. A laser beam is radiated onto the microdroplet immediately after the acceptable duration has passed since the reception of the microdroplet Fb by the substrate, or when the microdroplet is located at the radiating position.
    Type: Application
    Filed: October 22, 2008
    Publication date: February 26, 2009
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Yuji IWATA, Hirotsuna MIURA, Hironori HASEI
  • Patent number: 7492521
    Abstract: A method for manufacturing an optical sheet, comprises: (a) discharging a first lens material in liquid form being a material for a micro lens on a sheet in a dot array; (b) semi-curing the first lens material arranged on the sheet; (c) discharging a second lens material in liquid form being a material for the micro lens towards gap portions between the dots of the first lens material; and (d) forming a micro lens array by full curing the first and the second lens materials.
    Type: Grant
    Filed: June 5, 2006
    Date of Patent: February 17, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Hironori Hasei, Akira Inagaki
  • Publication number: 20080272388
    Abstract: A method for fabricating a thin film pattern on a substrate, includes the steps of: forming a concave part on the substrate that conforms to the thin film pattern; and applying a function liquid into the concave part.
    Type: Application
    Filed: July 1, 2008
    Publication date: November 6, 2008
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Toshihiro Ushiyama, Toshimitsu Hirai, Toshiaki Mikoshiba, Hiroshi Kiguchi, Hironori Hasei
  • Patent number: 7410905
    Abstract: A method for fabricating a thin film pattern on a substrate, includes the steps of: forming a concave part on the substrate that conforms to the thin film pattern; and applying a function liquid into the concave part.
    Type: Grant
    Filed: May 27, 2004
    Date of Patent: August 12, 2008
    Assignee: Seiko Epson Corporation
    Inventors: Toshihiro Ushiyama, Toshimitsu Hirai, Toshiaki Mikoshiba, Hiroshi Kiguchi, Hironori Hasei
  • Patent number: 7393130
    Abstract: An optical substrate includes an exit face through which a light entered from an incident face is emitted, a lens forming region provided on the exit face and in which a plurality of microlenses are formed, and a non-lens forming region provided in an area other than the lens forming region on the exit face and surrounded by the microlenses. The microlenses diffuse and emit the light entered through the exit face. The non-lens forming region is used to identify a predetermined direction of the substrate.
    Type: Grant
    Filed: June 13, 2006
    Date of Patent: July 1, 2008
    Assignee: Seiko Epson Corporation
    Inventor: Hironori Hasei
  • Patent number: 7364622
    Abstract: The invention provides an apparatus for fabricating a device, in which a high operation efficiency is maintained in a drying treatment for a multilayer-interconnection device. The device can also be fabricated inexpensively. An apparatus for fabricating a device has an inkjet unit that can dispose a liquid material on a substrate, and a preparatory dryer to blow a gas heated at a predetermined temperature to the substrate.
    Type: Grant
    Filed: March 7, 2003
    Date of Patent: April 29, 2008
    Assignee: Seiko Epson Corporation
    Inventors: Hironori Hasei, Toshimitsu Hirai
  • Publication number: 20070240299
    Abstract: A method is provided for forming a functional film having at least first and second functional materials arranged in accordance with a prescribed coating pattern on a substrate. The method includes discharging the first functional material having a smaller coating surface area than the second functional material according to the prescribed coating pattern onto the substrate using a droplet discharge apparatus, and discharging the second functional material according to the prescribed coating pattern onto the substrate using the droplet discharge apparatus after the first functional material is discharged onto the substrate.
    Type: Application
    Filed: April 5, 2007
    Publication date: October 18, 2007
    Applicant: Seiko Epson Corporation
    Inventor: Hironori Hasei
  • Publication number: 20070240300
    Abstract: A method for manufacturing an electrode having a collector and an electrode layer containing an active material formed on the collector is provided that includes the steps of discharging a composition for forming an electrode layer containing an active material and an organic solvent on the collector from a droplet discharge apparatus to form a film composed of the composition, reducing the pressure of an atmosphere surrounding the film within a prescribed period of time to a pressure that brings a boiling point of the organic solvent to a temperature in a range of 10° C. to 30° C., and maintaining the reduced pressure to dry and remove the organic solvent to form the electrode layer. The method can further include the step of heating the film to a temperature between 50° C. and 150° C., after the reduced pressure is maintained.
    Type: Application
    Filed: April 5, 2007
    Publication date: October 18, 2007
    Applicant: Seiko Epson Corporation
    Inventor: Hironori Hasei
  • Patent number: 7282779
    Abstract: A device includes banks formed on a substrate, a conducting film formed by droplet ejection onto a predetermined pattern formation region in a groove between the banks, and a second conductive film formed by droplet ejection disposed outside the pattern formation region and electrically separated from the conductive film.
    Type: Grant
    Filed: May 21, 2004
    Date of Patent: October 16, 2007
    Assignee: Seiko Epson Corporation
    Inventor: Hironori Hasei
  • Patent number: 7282459
    Abstract: Aspects of the invention can provide an ejection method to form a micro lens efficiently on each of a plurality of semiconductor lasers in a wafer state. So that a distance in an x-axis direction between two mutually adjacent sections subject to ejection and a distance between any two nozzles of a plurality of nozzles arranged in the x-axis direction may be in agreement, the ejection method can include a step of positioning a substrate having the two sections subject to ejection, a step of moving relatively the plurality of nozzles along a y-axis direction intersecting the x-axis direction perpendicularly to the substrate, and a step of ejecting a liquid material respectively from the two nozzles to the two sections subject to ejection if the two nozzles should respectively penetrate areas corresponding to the two sections.
    Type: Grant
    Filed: September 16, 2004
    Date of Patent: October 16, 2007
    Assignee: Seiko Epson Corporation
    Inventor: Hironori Hasei
  • Patent number: 7265907
    Abstract: Exemplary embodiments of the present invention provide an optimal manufacturing method of a microlens to diffuse light. According to exemplary embodiments, a manufacturing method of microlens includes forming a generally convex shaped lens portions made from a light transmissive resin on a substrate having light transmissivity, and curing the lens portions, forming the lens portions being a process in which a plurality of the lens portions are formed so as to be coupled on the substrate.
    Type: Grant
    Filed: August 27, 2004
    Date of Patent: September 4, 2007
    Assignee: Seiko Epson Corporation
    Inventor: Hironori Hasei
  • Publication number: 20070082144
    Abstract: A contact angle for a liquid on a substrate is set by a surface treatment process such that defects do not occur in a thin film pattern. In particular, the contact angle is set in a range of 15° to 45°. By doing this, it is possible to provide a device, a conductive thin film wiring device, and a method for forming a thin film pattern in which defects such as disconnections and short circuits can be prevented in a thin film pattern which is formed by an ink jet method.
    Type: Application
    Filed: December 8, 2006
    Publication date: April 12, 2007
    Applicant: Seiko Epson Corporation
    Inventors: Hironori Hasei, Toshimitsu Hirai
  • Publication number: 20070020792
    Abstract: A method for manufacturing an optical sheet includes: a) discharging a liquid lens material onto a sheet having a light-transmitting property, the liquid lens material being to be a material of micro lenses; b) discharging a liquid material onto the sheet, the liquid material being to be a material of recognition marks; and c) hardening the lens material and the liquid material to form the micro lenses and the recognition marks.
    Type: Application
    Filed: June 20, 2006
    Publication date: January 25, 2007
    Applicant: SEIKO EPSON CORPORATION
    Inventor: Hironori HASEI
  • Publication number: 20070002205
    Abstract: An optical substrate includes an exit face through which a light entered from an incident face is emitted, a lens forming region provided on the exit face and in which a plurality of microlenses formed, and a non-lens forming region provided in an area other than the lens forming region on the exit face and surrounded by the microlenses. The microlenses diffuse and emit the light entered through the exit face. The non-lens forming region is used to identify a predetermined direction of the substrate.
    Type: Application
    Filed: June 13, 2006
    Publication date: January 4, 2007
    Applicant: SEIKO EPSON CORPORATION
    Inventor: Hironori HASEI
  • Publication number: 20060291239
    Abstract: A backlight unit includes a light source emitting light and a light diffusing plate diffusing light emitted from the light source, the light diffusing plate having an ellipsoidal microlens, the ellipsoidal microlens being provided in a plural number and a major axis direction of the microlens being substantially orthogonal to a longer axis direction of the light source.
    Type: Application
    Filed: June 12, 2006
    Publication date: December 28, 2006
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Hironori HASEI, Akira INAGAKI
  • Publication number: 20060290839
    Abstract: A backlight unit including: a light source that irradiates light; and a diffusing plate that diffuses the light irradiated from the light source, wherein the diffusing plate is provided with a first microlens of ellipsoid form, and a second microlens of ellipsoid form disposed in such a manner that long axes of the first microlens and the second microlens are approximately perpendicular to each other, and a long axis direction of the first microlens and a long axis direction of the light source are arranged approximately parallel to each other, and a long axis direction of the second microlens and the long axis direction of the light source are arranged approximately perpendicular to each other.
    Type: Application
    Filed: June 12, 2006
    Publication date: December 28, 2006
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Hironori HASEI, Akira INAGAKI, Kazumi ARUGA
  • Publication number: 20060291065
    Abstract: A method of manufacturing an optical sheet provided with a plurality of microlenses on a surface of a base sheet, includes the step of applying a plurality of hemispherical liquid materials of the microlenses on the surface of the base sheet, the step of setting the base sheet in a predetermined direction in which the gravity acceleration acts on the applied hemispherical liquid materials of the microlenses to move away from the base sheet, and the step of curing the applied hemispherical liquid materials of the microlenses.
    Type: Application
    Filed: June 14, 2006
    Publication date: December 28, 2006
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Hironori HASEI, Akira INAGAKI, Mitsuru KURIBAYASHI