Abstract: A imaging optical system is a system of a liquid immersion type permitting a plane-parallel plate in liquid to be replaced with another, without substantial degradation of imaging performance, while ensuring sufficiently high laser resistance of a boundary lens. The imaging optical system is provided with a first optically transparent member located nearest to a second plane, and a second optically transparent member located adjacent to the first optically transparent member. An optical path between the first optically transparent member and the second plane is fillable with a first liquid and an optical path between the first optically transparent member and the second optically transparent member is fillable with a second liquid. The optical system satisfies the condition of 1<D1/(M1+M2)<20, where D1 is a center thickness of the first optically transparent member, M1 a center thickness of a layer of the first liquid, and M2 a center thickness of a layer of the second liquid.

Abstract: A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, ? is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25<D/Ym×tan ?<1.7 is satisfied.

Abstract: An exposure apparatus uses a dioptric projection optical system easy to manufacture and a mask of an ordinary size, and is able to effect a projection exposure in a high resolution with high throughput, while securing a large effective image-side numerical aperture through the intervention of a high-refractive-index medium in an optical path between the projection optical system and a photosensitive substrate. The exposure apparatus is configured to effect a projection exposure of a reduced image of a pattern formed on the mask (R), through the projection optical system (PL) onto the photosensitive substrate (W). Where a refractive index of an atmosphere in an optical path of the projection optical system is 1, the optical path between the projection optical system and the photosensitive substrate is filled with a medium having the refractive index larger than 1.1.

Abstract: Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.

Abstract: A projection optical system in which an image of a first surface is projected onto a second surface based on a light beam having a predetermined wavelength. The projection optical system having at least one isometric system refractive member made of an isometric system crystal material. The isometric system crystal material transmits a light beam having the predetermined wavelength. The projection optical system also has an amorphous refractive member made of an amorphous material for compensating deterioration of optical performance due to intrinsic birefringence of the isometric system refractive member.

Abstract: Excellent optical performance is obtained without substantially any impact of birefringence even when a crystal material with intrinsic birefringence such as fluorite is used.