Patents by Inventor Hironori Kamiyama

Hironori Kamiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9678248
    Abstract: In order to improve the scratch resistance of an antireflective article having a moth-eye structure, an antireflective article is provided that has fine protrusions densely arranged therein, and has the interval between adjacent fine protrusions being no more than the shortest wavelength in the wavelength band for antireflection. At least some of the fine protrusions are fine protrusions having a plurality of apexes.
    Type: Grant
    Filed: July 31, 2013
    Date of Patent: June 13, 2017
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Yoshihiro Fukui, Hironori Kamiyama, Yuichi Miyazaki, Takafumi Shibata, Masafumi Tanaka, Kazuo Matsufuji, Nobu Masubuchi, Yuri Shimozaki, Youichirou Oohashi
  • Patent number: 9442222
    Abstract: In order to improve the scratch resistance of an antireflective article having a moth-eye structure, an antireflective article is provided that has fine protrusions densely arranged therein, has the interval between adjacent fine protrusions being no more than the shortest wavelength for an electromagnetic wavelength band for antireflection, and wherein: the fine protrusions are arranged in a non-lattice shape in the planar view; and mesh division lines formed upon the valley sections between each adjacent fine protrusions and surrounding each fine protrusion match Voronoi tessellation having the center of gravity of the fine protrusions, in the planar view as the generating point therefor, in at least one area of the antireflective article.
    Type: Grant
    Filed: July 31, 2013
    Date of Patent: September 13, 2016
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Yoshihiro Fukui, Hironori Kamiyama, Yuichi Miyazaki, Takafumi Shibata, Masafumi Tanaka, Kazuo Matsufuji, Yuri Shimozaki
  • Patent number: 9427894
    Abstract: Provided is an inexpensive anti-reflection article with a sufficient anti-reflection property by using an anti-reflection article manufacturing mold plate manufactured at low cost. In a method of manufacturing an anti-reflection article manufacturing mold plate used to manufacture an anti-reflection article provided with an anti-reflection surface in which minute convex portions or minute concave portions are densely arranged and a gap between the adjacent minute convex portions or minute concave portions is the shortest wavelength or less of a wavelength band for anti-reflection, the method of manufacturing an anti-reflection article manufacturing mold plate includes: molding an uneven shape on a surface of a receptive layer by causing an anti-reflection surface of another anti-reflection article to come into pressure-contact with the surface of the receptive layer including a curable base; and curing the receptive layer in which the uneven shape is molded.
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: August 30, 2016
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Hironori Kamiyama, Toshiaki Satou, Minoru Yamamoto, Tsukasa Ayuzawa
  • Publication number: 20150298363
    Abstract: Provided is an inexpensive anti-reflection article with a sufficient anti-reflection property by using an anti-reflection article manufacturing mold plate manufactured at low cost. In a method of manufacturing an anti-reflection article manufacturing mold plate used to manufacture an anti-reflection article provided with an anti-reflection surface in which minute convex portions or minute concave portions are densely arranged and a gap between the adjacent minute convex portions or minute concave portions is the shortest wavelength or less of a wavelength band for anti-reflection, the method of manufacturing an anti-reflection article manufacturing mold plate includes: molding an uneven shape on a surface of a receptive layer by causing an anti-reflection surface of another anti-reflection article to come into pressure-contact with the surface of the receptive layer including a curable base; and curing the receptive layer in which the uneven shape is molded.
    Type: Application
    Filed: September 27, 2013
    Publication date: October 22, 2015
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Hironori KAMIYAMA, Toshiaki SATOU, Minoru YAMAMOTO, Tsukasa AYUZAWA
  • Patent number: 9158040
    Abstract: To provide an anti-reflection article which can be manufactured by using an anti-reflection article manufacturing mold plate having improved abrasion resistance compared to the related art and has a sufficient anti-reflection property. An anti-reflection article is formed as an anti-reflection article in which minute concave portions are densely arranged and the gap between the adjacent minute concave portions is the shortest wavelength of a wavelength band or less of an electromagnetic wave for anti-reflection. In the anti-reflection article, at least some of the minute concave portions are a minute concave portion with multiple lowermost points in the minute concave portion.
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: October 13, 2015
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Hironori Kamiyama, Toshiaki Satou, Minoru Yamamoto, Tsukasa Ayuzawa
  • Publication number: 20150168609
    Abstract: In order to improve the scratch resistance of an antireflective article having a moth-eye structure, an antireflective article is provided that has fine protrusions densely arranged therein, has the interval between adjacent fine protrusions being no more than the shortest wavelength for an electromagnetic wavelength band for antireflection, and wherein: the fine protrusions are arranged in a non-lattice shape in the planar view; and mesh division lines formed upon the valley sections between each adjacent fine protrusions and surrounding each fine protrusion match Voronoi tessellation having the center of gravity of the fine protrusions, in the planar view as the generating point therefor, in at least one area of the antireflective article.
    Type: Application
    Filed: July 31, 2013
    Publication date: June 18, 2015
    Inventors: Yoshihiro Fukui, Hironori Kamiyama, Yuichi Miyazaki, Takafumi Shibata, Masafumi Tanaka, Kazuo Matsufuji, Yuri Shimozaki
  • Publication number: 20150168610
    Abstract: In order to improve the scratch resistance of an antireflective article having a moth-eye structure, an antireflective article is provided that has fine protrusions densely arranged therein, and has the interval between adjacent fine protrusions being no more than the shortest wavelength in the wavelength band for antireflection. At least some of the fine protrusions are fine protrusions having a plurality of apexes.
    Type: Application
    Filed: July 31, 2013
    Publication date: June 18, 2015
    Inventors: Yoshihiro Fukui, Hironori Kamiyama, Yuichi Miyazaki, Takafumi Shibata, Masafumi Tanaka, Kazuo Matsufuji, Nobu Masubuchi, Yuri Shimozaki, Youichirou Oohashi
  • Patent number: 8815130
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Grant
    Filed: October 5, 2007
    Date of Patent: August 26, 2014
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Patent number: 8785108
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Grant
    Filed: October 5, 2007
    Date of Patent: July 22, 2014
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Patent number: 8283577
    Abstract: Intended is to provide an electromagnetic shielding material having a conductive layer pattern by transferring a conductive composite to a transparent base material, and an electromagnetic shielding material having a metal layer formed on the transferred conductive layer. The electromagnetic shielding material is free from the troubles such as the breaking of wire, the non-conforming shape or the low contact, which is based on the non-conforming transfer of the conductive composite. The electromagnetic shielding material comprises a transparent base material, a primer layer formed over the transparent base material, and a conductive layer formed in a predetermined pattern on the primer layer. In the primer layer, a portion having the conductive layer formed therein has a thickness larger than the thickness of a portion without the conductive layer.
    Type: Grant
    Filed: June 6, 2008
    Date of Patent: October 9, 2012
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Nobuo Naito, Hironori Kamiyama, Nozomi Kaga, Yuichi Miyazaki, Takeshi Nishizono, Hidetsugu Tazawa, Shinya Kiura
  • Patent number: 8268546
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Grant
    Filed: May 19, 2008
    Date of Patent: September 18, 2012
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Patent number: 8039074
    Abstract: An electromagnetic wave shielding sheet with a protective film that is temporarily laminated on a copper mesh layer for shielding electromagnetic waves is disclosed. The electromagnetic wave shielding sheet includes a transparent substrate, at least a copper mesh layer provided on one surface of the transparent substrate and a protective film temporarily laminated to the copper-mesh-layer-side surface. The protective film includes a support and an adhesive layer containing a polymer having repeating units derived from an acrylic ester and/or a methacrylic ester on the support.
    Type: Grant
    Filed: June 8, 2010
    Date of Patent: October 18, 2011
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Akiko Gotou, Hironori Kamiyama
  • Patent number: 7998662
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: August 16, 2011
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Patent number: 7982380
    Abstract: A front filter for a plasma display that is mainly used as a TV display. The front filter has an anti-glare function which is capable of effectively preventing reflection concurrently with achieving black color reproduction, and a functional layer for imparting a function required of an image display device such as a light absorbing function and/or an adhesion function. This front filter has an anti-glare layer having a concavo-convex shape on an outermost surface thereof, a polyester film and a functional layer. The anti-glare layer is disposed on the observer-side surface of the front filter; at least one functional layer is disposed on the display device side.
    Type: Grant
    Filed: August 10, 2007
    Date of Patent: July 19, 2011
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kamiyama, Nobuo Naitou, Yukimitsu Iwata, Yoshihiro Nishimura, Shinnichi Katou, Akiko Gotou
  • Patent number: 7965446
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Grant
    Filed: October 5, 2007
    Date of Patent: June 21, 2011
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Patent number: 7943275
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Grant
    Filed: October 5, 2007
    Date of Patent: May 17, 2011
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Manabu Yamamoto, Daigo Aoki, Hironori Kamiyama, Shinichi Hikosaka, Mitsuhiro Kashiwabara
  • Publication number: 20100247877
    Abstract: The present invention is to provide an electromagnetic wave shielding sheet with a protective film that is temporarily laminated on a copper mesh layer for shielding electromagnetic waves, the electromagnetic wave shielding sheet is not discolored even after long-term use, especially at high temperature and high humidity, while the protective film exhibits appropriate adhesion properties.
    Type: Application
    Filed: June 8, 2010
    Publication date: September 30, 2010
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Akiko GOTOU, Hironori KAMIYAMA
  • Publication number: 20100230154
    Abstract: Intended is to provide an electromagnetic shielding material having a conductive layer pattern by transferring a conductive composite to a transparent base material, and an electromagnetic shielding material having a metal layer formed on the transferred conductive layer. The electromagnetic shielding material is free from the troubles such as the breaking of wire, the non-conforming shape or the low contact, which is based on the non-conforming transfer of the conductive composite. The electromagnetic shielding material comprises a transparent base material, a primer layer formed over the transparent base material, and a conductive layer formed in a predetermined pattern on the primer layer. In the primer layer, a portion having the conductive layer formed therein has a thickness larger than the thickness of a portion without the conductive layer.
    Type: Application
    Filed: June 6, 2008
    Publication date: September 16, 2010
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Nobuo Naito, Hironori Kamiyama, Nozomi Kaga, Yuichi Miyazaki, Takeshi Nishizono, Hidetsugu Tazawa, Shinya Kiura
  • Publication number: 20100177397
    Abstract: A front filter for a plasma display that is mainly used as a TV display. The front filter has an anti-glare function which is capable of effectively preventing reflection concurrently with achieving black color reproduction, and a functional layer for imparting a function required of an image display device such as a light absorbing function and/or an adhesion function. This front filter has an anti-glare layer having a concavo-convex shape on an outermost surface thereof, a polyester film and a functional layer. The anti-glare layer is disposed on the observer-side surface of the front filter; at least one functional layer is disposed on the display device side.
    Type: Application
    Filed: August 10, 2007
    Publication date: July 15, 2010
    Inventors: Hironori Kamiyama, Nobuo Naitou, Yukimitsu Iwata, Yoshihiro Nishimura, Shinnichi Katou, Akiko Gotou
  • Publication number: 20100112311
    Abstract: A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
    Type: Application
    Filed: January 6, 2010
    Publication date: May 6, 2010
    Inventors: Hironori KOBAYASHI, Manabu YAMAMOTO, Daigo AOKI, Hironori KAMIYAMA, Shinichi HIKOSAKA, Mitsuhiro KASHIWABARA