Patents by Inventor Hironori Shinkai

Hironori Shinkai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Base fabric, jet loom, and method of manufacturing base fabric
    Patent number: 11346024
    Abstract: A base fabric, having a coefficient of variation CV1 (100×standard deviation/average value) of 3.0% or less in a length direction of a weft-direction disintegrated yarn strength and a coefficient of variation CV2 (100×standard deviation/average value) of 4.0 or less in a length direction of a weft-direction disintegrated yarn elongation.
    Type: Grant
    Filed: December 10, 2018
    Date of Patent: May 31, 2022
    Assignee: Toray Industries, Inc.
    Inventors: Tamotsu Arichi, Hironori Shinkai, Yoshihiro Kawahara
  • BASE FABRIC, JET LOOM, AND METHOD OF MANUFACTURING BASE FABRIC
    Publication number: 20200354864
    Abstract: A base fabric, having a coefficient of variation CV1 (100×standard deviation/average value) of 3.0% or less in a length direction of a weft-direction disintegrated yarn strength and a coefficient of variation CV2 (100×standard deviation/average value) of 4.0 or less in a length direction of a weft-direction disintegrated yarn elongation.
    Type: Application
    Filed: December 10, 2018
    Publication date: November 12, 2020
    Inventors: Tamotsu Arichi, Hironori Shinkai, Yoshihiro Kawahara
  • Fast-response photorefractive polymer element
    Patent number: 9500932
    Abstract: The present invention provides a fast-response photorefractive polymer element (1) including two insulating substrates (2, 2) arranged substantially in parallel with each other, ITO electrodes (3, 3) provided on inner surfaces (2a, 2a) of two insulating substrates (2, 2), dark current control layers (4, 4) provided on inner surfaces (3a, 3a) of ITO electrodes (3, 3), and a photorefractive composite material (5) provided between two insulating substrates (2, 2) with ITO electrodes (3, 3) and dark current control layers (4, 4). The photorefractive composite material (5) contains polytriarylamine (PTAA) which is a photorefractive polymer, and a dark current control layer (4) is a single-layered monomolecular film or multi-layered monomolecular films. With these configurations, a fast-response photorefractive polymer element achieves significantly improved responsiveness.
    Type: Grant
    Filed: August 6, 2013
    Date of Patent: November 22, 2016
    Assignee: National University Corporation Kyoto Institute of Technology
    Inventors: Naoto Tsutsumi, Kenji Kinashi, Hironori Shinkai
  • FAST-RESPONSE PHOTOREFRACTIVE POLYMER ELEMENT
    Publication number: 20150227019
    Abstract: The present invention provides a fast-response photorefractive polymer element (1) including two insulating substrates (2, 2) arranged substantially in parallel with each other, ITO electrodes (3, 3) provided on inner surfaces (2a, 2a) of two insulating substrates (2, 2), dark current control layers (4, 4) provided on inner surfaces (3a, 3a) of ITO electrodes (3, 3), and a photorefractive composite material (5) provided between two insulating substrates (2, 2) with ITO electrodes (3, 3) and dark current control layers (4, 4). The photorefractive composite material (5) contains polytriarylamine (PTAA) which is a photorefractive polymer, and a dark current control layer (4) is a single-layered monomolecular film or multi-layered monomolecular films. With these configurations, a fast-response photorefractive polymer element achieves significantly improved responsiveness.
    Type: Application
    Filed: August 6, 2013
    Publication date: August 13, 2015
    Inventors: Naoto Tsutsumi, Kenji Kinashi, Hironori Shinkai