Patents by Inventor Hironori Tsunoyama

Hironori Tsunoyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LOADED BODY, APPARATUS FOR PRODUCINGLOADED BODY AND METHOD FOR PRODUCING LOADED BODY
    Publication number: 20230203642
    Abstract: Nanoclusters are produced in a gas phase using a nanocluster manufacturing section including: a vacuum container; a sputtering source that has a target as a cathode, performs magnetron sputtering by pulse discharge, and generates plasma; a pulse power source that supplies pulsed power to the sputtering source; a first inert gas supply section that supplies a first inert gas to the sputtering source; a nanocluster growth cell that is contained in the vacuum container; and a second inert gas introduction section that introduces a second inert gas into the nanocluster growth cell. A multitude of supports are rolled in the gas phase and each of the supports is sprinkled with a multitude of nanoclusters to cause each support to support the multitude of nanoclusters.
    Type: Application
    Filed: June 8, 2021
    Publication date: June 29, 2023
    Inventors: Atsushi NAKAJIMA, Hironori TSUNOYAMA, Mika UNO, Hiroyuki GUNJI, Toshihiro ANDO, Keizo TSUKAMOTO, Masahide TONA, Naoyuki HIRATA
  • Nanocluster liquid dispersion, nanocluster film, nanocluster solid dispersion, method for producing nanocluster liquid dispersion, and device for producing nanocluster liquid dispersion
    Patent number: 11059014
    Abstract: The present invention relates to a nanocluster liquid dispersion where nanoclusters with a predetermined number of atoms are dispersed.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: July 13, 2021
    Assignees: JAPAN SCIENCE AND TECHNOLOGY AGENCY, AYABO CORPORATION
    Inventors: Atsushi Nakajima, Hironori Tsunoyama, Hiroki Akatsuka, Keizo Tsukamoto
  • Nanocluster production device
    Patent number: 10283333
    Abstract: Improvement of control of size and structure of nanoclusters with a nanocluster production apparatus is intended. Increase of an obtained amount and a yield of nanoclusters having size and structure, at least one of which is selected, is intended. A nanocluster production apparatus has a vacuum chamber, a sputtering source that generates plasma by pulse discharge, a pulse power supply that supplies a pulsed power to the sputtering source, a first inert gas supply device that supplies a first inert gas to the sputtering source, a cluster growth cell stored in the vacuum chamber and a second inert gas introduction device that introduces a second inert gas into the cluster growth cell.
    Type: Grant
    Filed: May 26, 2014
    Date of Patent: May 7, 2019
    Assignees: JAPAN SCIENCE AND TECHNOLOGY AGENCY, AYABO CORPORATION
    Inventors: Atsushi Nakajima, Hironori Tsunoyama, Chuhang Zhang, Hiroki Akatsuka, Keizo Tsukamoto
  • LIQUID NANOCLUSTER DISPERSION, NANOCLUSTER FILM, SOLID NANOCLUSTER DISPERSION, METHOD FOR PRODUCING LIQUID NANOCLUSTER DISPERSION, AND DEVICE FOR PRODUCING LIQUID NANOCLUSTER DISPERSION
    Publication number: 20180361340
    Abstract: The present invention relates to a nanocluster liquid dispersion where nanoclusters with a predetermined number of atoms are dispersed.
    Type: Application
    Filed: August 12, 2016
    Publication date: December 20, 2018
    Applicants: JAPAN SCIENCE AND TECHNOLOGY AGENCY, AYABO CORPORATION
    Inventors: Atsushi NAKAJIMA, Hironori TSUNOYAMA, Hiroki AKATSUKA, Keizo TSUKAMOTO
  • Nanocluster Production Device
    Publication number: 20160111262
    Abstract: Improvement of control of size and structure of nanoclusters with a nanocluster production apparatus is intended. Increase of an obtained amount and a yield of nanoclusters having size and structure, at least one of which is selected, is intended. A nanocluster production apparatus has a vacuum chamber, a sputtering source that generates plasma by pulse discharge, a pulse power supply that supplies a pulsed power to the sputtering source, a first inert gas supply device that supplies a first inert gas to the sputtering source, a cluster growth cell stored in the vacuum chamber and a second inert gas introduction device that introduces a second inert gas into the cluster growth cell.
    Type: Application
    Filed: May 26, 2014
    Publication date: April 21, 2016
    Applicants: Japan Science and Technology Agency, Ayabo Corporation
    Inventors: Atsushi Nakajima, Hironori Tsunoyama, Chuhang Zhang, Hiroki Akatsuka, Keizo Tsukamoto