Abstract: A mounting table structure arranged in a processing chamber is provided for mounting a target object to be processed on the upper surface. The mounting table structure is characterized in having a mounting table wherein a heating unit are embedded to heat the target object to perform a specified heat treatment to the target object, and a supporting column which stands on the bottom portion of the processing chamber and supports the mounting table. The mounting table structure is also characterized in that a heat-equalizing member spread in a planar direction is embedded above the heating unit in the mounting table.

Abstract: To provide a plane heater, including a carbon wire heating element CW, in which surface arrangement density of the heating element CW in an outer area is denser than that in an inner area. A power supply terminal unit having connection wires for supplying electricity to the heating element CW is arranged in the center on the back side of a silica glass plate-like member 2. Connection wires 4a and 4b connected with the heating element CW in the inner area are connected with the heating element in the inner area in the center of the silica glass plate-like member. Connection wires 3a and 3b connected with the heating element in the outer area are extended from the center of the silica glass plate-like member toward the outer area and connected with the heating element CW in the outer area, without intersecting the heating element CW in the inner area.

Abstract: A loading table structure which is adapted, in order to prevent damage to the loading table, so that large thermal stress does not occur in the loading table and so that the amount of supply of a purge gas for corrosion prevention to the loading table is minimized. The loading table structure is formed in a processing container capable of discharging gas contained therein and is used to load thereon an object to be processed. The loading table structure is provided with a loading table on which the object to be processed is loaded and which consists of a dielectric, a heating means which is provided to the loading table and which heats the object to be processed loaded on the loading table, and protective strut tubes which are mounted so as to vertically rise from the bottom section of the processing container, which have upper ends joined to the lower surface of the loading table to support the loading table, and which consist of a dielectric.

Abstract: A risk monitoring system is formed of a client terminal, a risk management apparatus, and a security device. A risk calculation portion in the risk management apparatus calculates the vulnerability of each room inside the workplace quantitatively in terms of three viewpoints: individuals, assets, and space, and calculates a risk value of an internal crime in each room in real time by multiplying the vulnerability by the internal crime probability and the asset value. A risk analysis portion analyzes a risk state on the basis of the risk value thus calculated and the analysis result is displayed on a display portion of the client terminal. It is thus possible to understand a risk situation of an internal crime against assets to protect in real time for enabling an action to be taken appropriately according to the situation.

Abstract: [Problem to be Solved] To provide a plane heater including a carbon wire heating element which has an arrangement pattern allowing a heating surface to be a substantially uniform heating temperature plane. [Means to Solve Problem] Surface arrangement densities of a carbon wire heating element CW are different in an inner area and an outer area located in the periphery. The surface arrangement density in the above-mentioned outer area is denser than the surface arrangement density in the inner area. A power supply terminal unit 8 having connection wires for supplying electricity to the above-mentioned heating element CW is arranged in the center on the back side of the above-mentioned silica glass plate-like member 2. The connection wires 4a and 4b connected with the carbon wire heating element in the above-mentioned inner area are connected with the carbon wire heating element CW in the inner area in the center of the above-mentioned silica glass plate-like member.

Abstract: States of security and risk are accurately recognized and an appropriate measure can be taken. Therefore, in a security monitoring device connected to a security device for securing security of an asset and monitoring the security, information from the security device is monitored and collected in real time on the basis of a set monitoring condition. On the basis of the monitored and collected information, a security risk change is analyzed and estimated, and the analyzed and estimated results are displayed, etc., and outputted.

Abstract: A mounting table structure 54, provided within a processing chamber 22 of a processing apparatus 20 so as to mount thereon a target object to be processed, includes a mounting table 58 made of a dielectric material and having a heating unit 64; and a cylindrical supporting column 56 which is extended upward from a bottom of the processing chamber and is made of a dielectric material and is configured to detachably support the mounting table 58. A cylindrical protection pipe 60 is fixed to a bottom surface of the mounting table 58 and is made of a dielectric material having a diameter smaller than a diameter of the supporting column. A functional rod member 62 is inserted through an inside of the protection pipe 60 and has an upper end in contact with the mounting table 58.

Abstract: A mounting table structure includes a mounting table provided with a heating unit having heaters respectively arranged in concentrically divided heating zones and on which an object to be heat-treated is placed, a temperature measurement units respectively arranged in the heating zones, and a hollow column for supporting the mounting table in an upstanding state. The diameter of the column is gradually expanded from its bottom to its top, and the upper end of the column is bonded to the bottom surface of the mounting table. A measurement unit main body of each temperature measurement unit is inserted into the hollow column and an insertion passageway provided at a sidewall of the column.

Abstract: A thermal processing system has a processing vessel 4, a support post 30 stood on the bottom wall of the processing vessel 4, and a support table 32 internally provided with a heating means 38 and supported on the support post 30. A workpiece W is placed on the upper surface of the support table 32 and is subjected to a predetermined thermal process. The upper, the side and the lower surface of the support table 32 are covered with heat-resistant covering members 72, 74 and 76 to prevent the thermal diffusion of metal atoms causative of contamination from the support table 32. thus, various types of contamination, such as metal and organic contamination, can be prevented.

Abstract: A mounting table structure for use in a processing chamber for performing a heat treatment by using a microwave, includes a mounting table for mounting thereon a target object, the mounting table including therein a heating unit having a heating element made of a non-metal material and a supporting column standing up on a bottom portion of the processing chamber to support the mounting table. A shield member for blocking the microwave is provided on a top surface of the mounting table.

Abstract: A plane heater and a semiconductor heat treatment apparatus having the heater which suppress high frequency induction heating by having an earth electrode therein for suppressing high frequency induction and do not corrode with an excited reaction gas is provided. A plane heater 1 includes a carbon wire heating element CW arranged and sealed two-dimensionally inside a silica glass plate-like member 2 and an earth electrode 3 arranged and sealed two-dimensionally inside the silica glass plate-like member 2 above the above-mentioned carbon wire heating element CW.

Abstract: A mounting table structure arranged in a processing chamber is provided for mounting a target object to be processed on the upper surface. The mounting table structure is characterized in having a mounting table wherein a heating unit are embedded to heat the target object to perform a specified heat treatment to the target object, and a supporting column which stands on the bottom portion of the processing chamber and supports the mounting table. The mounting table structure is also characterized in that a heat-equalizing member spread in a planar direction is embedded above the heating unit in the mounting table.

Abstract: A risk monitoring system is formed of a client terminal, a risk management apparatus, and a security device. A risk calculation portion in the risk management apparatus calculates the vulnerability of each room inside the workplace quantitatively in terms of three viewpoints: individuals, assets, and space, and calculates a risk value of an internal crime in each room in real time by multiplying the vulnerability by the internal crime probability and the asset value. A risk analysis portion analyzes a risk state on the basis of the risk value thus calculated and the analysis result is displayed on a display portion of the client terminal. It is thus possible to understand a risk situation of an internal crime against assets to protect in real time for enabling an action to be taken appropriately according to the situation.

Abstract: States of security and risk are accurately recognized and an appropriate measure can be taken. Therefore, in a security monitoring device connected to a security device for securing security of an asset and monitoring the security, information from the security device is monitored and collected in real time on the basis of a set monitoring condition. On the basis of the monitored and collected information, a security risk change is analyzed and estimated, and the analyzed and estimated results are displayed, etc., and outputted.

Abstract: A thermal processing system has a processing vessel 4, a support post 30 stood on the bottom wall of the processing vessel 4, and a support table 32 internally provided with a heating means 38 and supported on the support post 30. A workpiece W is placed on the upper surface of the support table 32 and is subjected to a predetermined thermal process. The upper, the side and the lower surface of the support table 32 are covered with heat-resistant covering members 72, 74 and 76 to prevent the thermal diffusion of metal atoms causative of contamination from the support table 32. thus, various types of contamination, such as metal and organic contamination, can be prevented.