Patents by Inventor Hiroo Sekiguchi

Hiroo Sekiguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11615970
    Abstract: Plasma-assisted methods and apparatus are disclosed. The methods and apparatus can be used to provide activated species formed in a remote plasma unit to a reaction chamber to assist ignition of a plasma within a reaction chamber coupled to the remote plasma unit.
    Type: Grant
    Filed: July 15, 2020
    Date of Patent: March 28, 2023
    Assignee: ASM IP Holding B.V.
    Inventor: Hiroo Sekiguchi
  • Publication number: 20210020467
    Abstract: Plasma-assisted methods and apparatus are disclosed. The methods and apparatus can be used to provide activated species formed in a remote plasma unit to a reaction chamber to assist ignition of a plasma within a reaction chamber coupled to the remote plasma unit.
    Type: Application
    Filed: July 15, 2020
    Publication date: January 21, 2021
    Inventor: Hiroo Sekiguchi
  • Patent number: 10559458
    Abstract: A method of forming a nitrogen-incorporated silicon or metal oxide film, includes (i) depositing by a plasma a silicon or metal oxide film on a substrate using a precursor containing a silicon or metal and an oxidizing gas, said plasma having a first plasma density; and (ii) nitriding by a plasma the silicon or metal oxide film using a nitriding gas without using any precursor, said plasma having a second plasma density which is higher than the first plasma density.
    Type: Grant
    Filed: November 26, 2018
    Date of Patent: February 11, 2020
    Assignee: ASM IP Holding B.V.
    Inventors: Hidemi Suemori, Hiroo Sekiguchi, Takashi Yoshida