Patents by Inventor Hiroshi Kakibayashi

Hiroshi Kakibayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5362972
    Abstract: A field effect transistor and a ballistic transistor using semiconductor whiskers each having a desired diameter and formed at s desired location, a semiconductor vacuum microelectronic device using the same as electron emitting materials, a light emitting device using the same as quantum wires and the like are disclosed.
    Type: Grant
    Filed: April 17, 1991
    Date of Patent: November 8, 1994
    Assignees: Hitachi, Ltd., Hitachi VLSI Engineering Corporation
    Inventors: Masamitsu Yazawa, Kenji Hiruma, Toshio Katsuyama, Nobutaka Futigami, Hidetoshi Matsumoto, Hiroshi Kakibayashi, Masanari Koguchi, Gerard P. Morgan, Kensuke Ogawa
  • Patent number: 5332910
    Abstract: A semiconductor light-emitting device includes a plurality of semiconductor rods, each of which has a pn junction. The semiconductor rods are formed on a semiconductor substrate such that the plurality of semiconductor rods are arranged at a distance substantially equal to an integer multiple of the wavelength of light emitted from the semiconductor rod. With such devices, various novel optical devices such as a micro-cavity laser of which the threshold current is extremely small and a coherent light-emitting device having no threshold value can be realized.
    Type: Grant
    Filed: November 30, 1993
    Date of Patent: July 26, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Keiichi Haraguchi, Kenji Hiruma, Kensuke Ogawa, Toshio Katsuyama, Ken Yamaguchi, Toshiyuki Usagawa, Masamits Yazawa, Toshiaki Masuhara, Gerard P. Morgan, Hiroshi Kakibayashi
  • Patent number: 5278408
    Abstract: 3-dimensional observation is carried out on the atomic arrangement and atomic species in a thin-film specimen at an atomic level in order to clarify the existence states of defects and impure atoms in the crystals. For that purposes, the present invention provides an instrument and a method for 3-dimensional observation of an atomic arrangement which are implemented by a system comprising a scanning transmission electron microscope equipped with a field emission electron gun operated at an acceleration voltage of greater than 200 kV, a specimen goniometer/tilting system having a control capability of the nanometer order, a multi-channel electron detector and a computer for executing software for controlling these components and 3-dimensional image-processing software. Point defects and impure atoms, which exist in joint interfaces and contacts in a ULSI device, can thereby be observed. As a result, the causes of bad devices such as current leak and poor voltage resistance can be analyzed at a high accuracy.
    Type: Grant
    Filed: May 14, 1992
    Date of Patent: January 11, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Hiroshi Kakibayashi, Yasuhiro Mitsui, Hideo Todokoro, Katsuhiro Kuroda