Abstract: A semiconductor device of embodiments includes: a first electrode; a second electrode; a gate electrode extending in a first direction; a silicon carbide layer between the first electrode and the second electrode and including a first silicon carbide region of a first conductive type having a first region facing the gate electrode and a second region in contact with the first electrode, a second silicon carbide region of a second conductive type, and a third silicon carbide region of a second conductive type, the first region being interposed between the second silicon carbide region and the third silicon carbide region. A first width of the first region in a second direction perpendicular to the first direction is 0.5 ?m or more than and 1.2 ?m or less. A second width of the second region in the second direction 0.5 ?m or more than and 1.5 ?m or less.

Abstract: A semiconductor device includes a first electrode, a second electrode, a third electrode located between the first electrode and the second electrode, a first semiconductor layer connected to the first electrode, a second semiconductor layer connected to the second electrode, a third semiconductor layer of a second conductivity type, and a fourth semiconductor layer of the second conductivity type. The third electrode includes first and second portions. The first semiconductor layer faces the first portion via an insulating layer. The first and second semiconductor layers are of a first conductivity type and include silicon and carbon. A carrier concentration of the fourth semiconductor layer is greater than a carrier concentration of the third semiconductor layer.

Abstract: A semiconductor device includes a first electrode, a first semiconductor layer connected to the first electrode, a second semiconductor layer located on a portion of the first semiconductor layer, a third semiconductor layer located on a portion of the second semiconductor layer, a second electrode connected to the third semiconductor layer, and a third electrode located in a region directly above at least a portion of the second semiconductor layer between the first semiconductor layer and the third semiconductor layer. The third semiconductor layer faces the first semiconductor layer via the second semiconductor layer. A side surface of the third semiconductor layer facing the first semiconductor layer has a shape that approaches the first semiconductor layer upward. The third semiconductor layer is of a first conductivity type and includes silicon and carbon. The third electrode faces the portion via a first insulating film.

Abstract: A semiconductor device according to an embodiment includes a semiconductor chip having a transistor region and a diode region, and a conductor. The semiconductor chip includes a first electrode, a second electrode, a silicon carbide layer between the first electrode and the second electrode, and a gate electrode. The first electrode includes a first region in the transistor region and a second region in the diode region. A first contact area between the conductor and the first region is larger than a second contact area between the conductor and the second region.

Abstract: A semiconductor device according to an embodiment includes a semiconductor chip having a transistor region and a diode region, a first conductor, and a second conductor. The semiconductor chip includes a first electrode, a second electrode, a silicon carbide layer between the first electrode and the second electrode, and a gate electrode. The transistor region is provided with a third electrode spaced apart from the first electrode and close to the diode region. One end of the first conductor is in contact with the first electrode, and one end of the second conductor is in contact with the third electrode.

Abstract: A semiconductor device according to an embodiment includes a transistor region and a diode region. The transistor region includes n-type first SiC region having a first portion contacting a first plane, p-type second SiC region, n-type third SiC region, and a gate electrode. The diode region includes the first SiC region having a second portion contacting the first plane and p-type fourth SiC region. The semiconductor device includes a first electrode contacting the first portion and the second portion and a second electrode contacting a second plane. An occupied area per unit area of the fourth SiC region is larger than an occupied area per unit area of the second SiC region. In addition, a first diode region is provided between a first transistor region and a second transistor region. An inorganic insulating layer is provided between the first electrode and a gate wiring adjacent to the first electrode.

Abstract: A semiconductor device according to an embodiment includes a transistor region and a diode region. The transistor region includes a first silicon carbide region of n-type having a first portion in contact with a first plane, a second silicon carbide region of p-type, a third silicon carbide region of n-type, and a gate electrode. The diode region includes the first silicon carbide region of n-type having a second portion in contact with the first plane and a fourth silicon carbide region of p-type. The semiconductor device includes a gate wiring electrically connected to the gate electrode. A distance between a high-concentration portion included in the fourth silicon carbide region and the gate wiring is larger than a distance between a high-concentration portion included in the second silicon carbide region and the gate wiring.

Abstract: According to an embodiment, provided is a semiconductor device includes a semiconductor layer; a first electrode; a second electrode; an electrode pad; a wiring layer electrically connected to the gate electrode; a first polycrystalline silicon layer electrically connected to the electrode pad and the wiring layer; and an insulating layer provided between the first polycrystalline silicon layer and the electrode pad and between the first polycrystalline silicon layer and the wiring layer and having a first opening and a second opening. The electrode pad and the first polycrystalline silicon layer are electrically connected via an inside of the first opening. The wiring layer and the first polycrystalline silicon layer are electrically connected via an inside of the second opening, A first opening area of the first opening is larger than a second opening area of the second opening.

Abstract: A semiconductor device includes: a first conductive type first silicon carbide region including a first region, a second region and a third region both on the first region, the second region having impurity concentration equal to or higher than the first region, and the third region having impurity concentration higher than the second region; a second conductive type second silicon carbide region on the first silicon carbide region, the second silicon carbide region including a fourth region in contact with the second region and a fifth region in contact with the third region, and the fifth region having impurity concentration higher than the fourth region; a third silicon carbide region of a first conductive type on the second silicon carbide region; a first gate electrode; a first electrode having a first portion in contact with the second silicon carbide region and the third silicon carbide region; and a second electrode.

Abstract: A semiconductor device includes a first electrode, a first semiconductor layer, a second semiconductor layer, a third semiconductor layer, a second electrode, a third electrode, and a fourth semiconductor layer. The third electrode is located among the first semiconductor layer, the second semiconductor layer, and the third semiconductor layer via an insulating film. The fourth semiconductor layer is located between the insulating film and the first semiconductor layer and between the insulating film and the second semiconductor layer. An impurity concentration of the fourth semiconductor layer is less than an impurity concentration of the first semiconductor layer and an impurity concentration of the second semiconductor layer.

Abstract: According to one embodiment, a silicon carbide semiconductor device includes a first electrode, a second electrode, a first semiconductor layer, a plurality of first semiconductor pillar regions of a first conductivity type, a second semiconductor pillar region of a second conductivity type. The first semiconductor pillar regions include a first region has a first impurity concentration and second region has a second impurity concentration higher than the first impurity concentration. The second semiconductor pillar regions include a third region has a third impurity concentration and a fourth region has a fourth impurity concentration higher than the third impurity concentration.

Abstract: A semiconductor device of an embodiment includes a trench in a silicon carbide layer and extending in a first direction, a gate electrode in the trench, first, second, third and fourth silicon carbide regions disposed in the silicon carbide layer in the first direction in this order, first and third silicon carbide regions having first conductive type, second and fourth silicon carbide regions having second conductive type, fifth, sixth, seventh and eighth silicon carbide regions disposed in the silicon carbide layer in the first direction in this order above the first to fourth silicon carbide regions, fifth and seventh silicon carbide regions having first conductive type higher than first and third silicon carbide regions, sixth and eighth silicon carbide regions having second conductive type higher than second and fourth silicon carbide regions, a ninth silicon carbide region of a first conductive type above the fifth to eighth silicon carbide regions.

Abstract: A semiconductor device includes a first electrode, a first semiconductor region of a first conductivity type having first and second regions, a second semiconductor region of a second conductivity type, a third semiconductor region of the first conductivity type, a gate electrode, a fourth semiconductor region of the second conductivity type between the first region and the gate electrode, fifth semiconductor regions of the second conductivity type, each having a first concentration of impurities of the second conductivity type, sixth semiconductor regions of the second conductivity type, each having a second concentration of impurities of the second conductivity type that is lower than the first concentration, and a second electrode. The fifth semiconductor regions are located around the fourth semiconductor region in a first plane perpendicular to the first direction. The sixth semiconductor regions are located around the second semiconductor region in a second plane perpendicular to the first direction.

Abstract: A semiconductor device includes a first semiconductor layer of a first conductivity type, second to fifth semiconductor layers of a second conductivity type, and first and second electrodes. The first semiconductor layer is provided between the first and second electrodes, and includes a termination region. The second semiconductor layer is provided between the first semiconductor layer and the second electrode, and has a first thickness in a first direction from the first electrode toward the second electrode. The third to fifth semiconductor layers are provided in the termination region. The third semiconductor layer surrounds the second semiconductor layer, and has a second thickness in the first direction. The fourth semiconductor layer surrounds the third semiconductor layer, and has a third thickness in the first direction. The second thickness is greater than the first and third thicknesses. The fifth semiconductor layer is connected to the second to fourth semiconductor layers.

Abstract: A semiconductor device of embodiments includes a first gate electrode, a second gate electrode, a third gate electrode extending in a first direction, and a gate wiring line extending in a second direction crossing the first direction and to which the first to the third gate electrodes are connected. Assuming distance between the first and the second gate electrode in the second direction in a first region is S1, distance between the first and the second gate electrode in the second direction in a second region closer to the gate wiring line than the first region is S2, distance between the second and the third gate electrode in the second direction in the first region is S3, and distance between the second and the third gate electrode in the second direction in the second region is S4, following Expressions are satisfied, S1<S3, S1<S2, S3>S4.

Abstract: According to one embodiment, a semiconductor device includes first and second electrodes, first to fifth semiconductor regions, and a gate electrode. The first semiconductor region is located on the first electrode. The first semiconductor region includes a first region. The gate electrode is located on the first semiconductor region with a gate insulating layer interposed. The second semiconductor region faces the gate electrode via the gate insulating layer in a second direction perpendicular to a first direction. The third semiconductor region is located between the first and second semiconductor regions. A length in the second direction of a lower portion of the third semiconductor region is greater than a length in the second direction of an upper portion of the third semiconductor region. The fourth semiconductor region is located between the third semiconductor region and the gate electrode. The fifth semiconductor region is located on the second semiconductor region.

Abstract: A semiconductor device includes a first electrode, a first semiconductor layer, a second semiconductor layer, a third semiconductor layer, a fourth semiconductor layer, a fifth semiconductor layer, and a second electrode. The fourth semiconductor layer is located in a second region on the first semiconductor layer. The fourth semiconductor layer is separated from the second semiconductor layer with a portion of the first semiconductor layer interposed. An impurity concentration of the fourth semiconductor layer is greater than an impurity concentration of the first semiconductor layer and less than an impurity concentration of the second semiconductor layer.

Abstract: A semiconductor device includes first, second and control electrodes, and a semiconductor part between the first and second electrode. The semiconductor part includes first and third layers of a first conductive type, and second, fourth and fifth layers of a second conductive type. The first layer extends between the first and second electrodes. The second layer is provided between the first layer and the second electrode. The third layer is partially provided on the second layer between the second layer and the second electrode. A first fourth layer and a second fourth layer are provided in the first layer. The fifth layer is provided between the first layer and the second layer. The fifth layer is partially provided on the first layer between the first fourth layer and the second fourth layer. The control electrode is provided between the second electrode and each of the fourth layers.

Abstract: According to one embodiment, a semiconductor device includes first and second electrodes, first to sixth semiconductor regions, a gate electrode, and a conductive part. The first semiconductor region is located on the first electrode. The first semiconductor region includes first and second regions. The second semiconductor region is located on the first region. The gate electrode is located on the second semiconductor region with a gate insulating layer interposed. The third semiconductor region is located on the first region and is separated from the second semiconductor region. The conductive part is located on the third semiconductor region with an insulating layer interposed. The fourth semiconductor region is located on the second region. The fifth semiconductor region is located on a portion of the fourth semiconductor region. The sixth semiconductor region contacts the third semiconductor region. The second electrode is located on the fourth and fifth semiconductor regions.

Abstract: According to an embodiment, provided is a semiconductor device includes a semiconductor layer; a first electrode; a second electrode; an electrode pad; a wiring layer electrically connected to the gate electrode; a first polycrystalline silicon layer electrically connected to the electrode pad and the wiring layer; and an insulating layer provided between the first polycrystalline silicon layer and the electrode pad and between the first polycrystalline silicon layer and the wiring layer and having a first opening and a second opening. The electrode pad and the first polycrystalline silicon layer are electrically connected via an inside of the first opening. The wiring layer and the first polycrystalline silicon layer are electrically connected via an inside of the second opening, A first opening area of the first opening is larger than a second opening area of the second opening.