Patents by Inventor Hiroshi Mihira

Hiroshi Mihira has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5377616
    Abstract: A method for vaporizing an organometal compound and supplying the resulting vapor thereof to a crystal growth chamber which comprises the steps of heating an organometal compound to a predetermined temperature to obtain vapor of the compound at a predetermined vapor pressure and supplying, in a constant flow rate, the vapor to the surface of a substrate heated under a reduced pressure: an apparatus for vaporizing an organometal compound and supplying the resulting vapor thereof to a crystal growth chamber 11 comprising a first gas flow path for the vapor of the organometal compound which connects a container 20, in which the organometal compound is charged, to a crystal growth chamber heated under a reduced pressure through a first valve 21, a first massflow controller 22 and a second valve 23 in this order; and a constant temperature oven 24 and 25 for controlling the temperature of the container 20 and the first gas flow path extending from the container 20 to the second valve 23, are herein disclosed.
    Type: Grant
    Filed: November 9, 1993
    Date of Patent: January 3, 1995
    Assignees: Stec, Inc., Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshi Mihira, Tetsuo Shimizu, Kazuhiro Hirahara, Toshinobu Ishihara, Seiki Takaya
  • Patent number: 5160542
    Abstract: An apparatus for vaporizing and supplying an organometal compound comprising a gas flow path for starting gas which connects a container filled with the organometal compound to a crystal growth chamber heated under reduced pressure through a main valve, a massflow controller for the starting gas and a valve for supplying the starting gas; and a flow path for a carrier gas which connects a carrier gas source to the discharge outlet of the valve for supplying the starting gas through a massflow controller for carrier gas and a heat exchanger. The container, the flow path for the starting gas and the flow path for the carrier gas are arranged in a constant temperature oven.
    Type: Grant
    Filed: September 11, 1990
    Date of Patent: November 3, 1992
    Assignees: Stec Inc., Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroshi Mihira, Tetsuo Shimizu, Kazuhiro Hirahara, Toshinobu Ishihara, Seiki Takaya
  • Patent number: 5048332
    Abstract: A part of a tube, through which a fluid passes, is cooled by means of an electronic cooling element and a flow rate of the fluid is measured on the basis of a temperature of a surface of the tube cooled. Not only can the flow rate of the liquid flowing through the tube be determined in a noncontacting manner and a very small flow rate of the liquid be determined, but also the tube is cooled so that no bubbles are generated, and thus the measurement of the liquid, which is apt to generate gases, such as low boiling point liquid, is possible. In addition, the measurement is not influenced by the gases dissolved in the liquid and merely the temperature difference resulting from the flow of the fluid, that is, the rise of the temperature of the fluid, is detected to prevent the measurement from being influenced by the installing posture of the flow meter, so that a highly accurate measurement is possible. Consequently, stable and sure controlling flow rate of liquid is possible.
    Type: Grant
    Filed: January 5, 1990
    Date of Patent: September 17, 1991
    Assignee: Stec Inc.
    Inventors: Kouichi Ishikawa, Hiroshi Mihira, Noriyuki Kimura, Masao Yamaguchi
  • Patent number: 4947889
    Abstract: A part of a tube, through which a fluid passes, is cooled by means of an electronic cooling element and a flow rate of the fluid is measured on the basis of a temperature of a surface of the tube cooled. Not only can the flow rate of the liquid flowing through the tube be determined in a noncontacting manner and a very small flow rate of the liquid be determined, but also the tube is cooled so that no bubbles are generated, and thus the measurment of the liquid, which is apt to generate gases, such as low boiling point liquid, is possible. In addition, the measurement is not influenced by the gases dissolved in the liquid and merely the temperature difference resulting from the flow of the fluid, that is, the rise of the temperature of the fluid, is detected to prevent the measurement from being influenced by the installing posture of the flow meter, so that a highly accurate measurement is possible. Consequently, stable and sure controlling flow rate of liquid is possible.
    Type: Grant
    Filed: April 14, 1989
    Date of Patent: August 14, 1990
    Assignee: Stec Inc.
    Inventors: Kouichi Ishikawa, Hiroshi Mihira, Noriyuki Kimura, Masao Yamaguchi
  • Patent number: 4921005
    Abstract: A mass flow container wherein the resistive wires wound about the conduit of a flow meter portion are provided with a current in a direction such that the magnetic field produced by the current is opposite in direction to the flow of fluid through the conduit and wherein a flow rate-controlling portion includes a valve assembly that is mirror-finished.
    Type: Grant
    Filed: June 15, 1989
    Date of Patent: May 1, 1990
    Inventors: Tadahiro Ohmi, Hiroshi Mihira, Kiyoshi Satoh