Patents by Inventor Hiroshi Samukawa
Hiroshi Samukawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8076437Abstract: A light-emitting device is provided which uses an encapsulant material made from a polymer having a high relative light output. The light-emitting device includes a light-emitting element and a member sealing the light-emitting element. The encapsulant material has one or more than two kinds of units given by the following formula (1) and a refractive index of 1.55 or more. where R is a hydrogen atom, alkyl group or phenyl group, Y is an alkyl group of which the carbon number is 1 to 6 or an alkyloxy group of which the carbon number is 1 to 6 and Z is an aromatic compound that meets predetermined requirements.Type: GrantFiled: June 9, 2008Date of Patent: December 13, 2011Assignee: Sony Chemical & Information Device CorporationInventors: Kouki Hatsuda, Hiroshi Samukawa, Katsuhiko Komuro
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Patent number: 8072139Abstract: Disclosed is a method for sealing a light-emitting device wherein formation of air bubbles in a light-emitting device module can be prevented by performing no gelation after fitting of a cover member. This method also enables to seal a light-emitting device by using a gel sealing material composed of a gel precursor which uses a solvent. Also disclosed is a light-emitting module formed by such a sealing method. In this method for sealing a light-emitting device, gelation of the gel precursor of a gel sealing material is performed before placing the precursor on the light-emitting device, and thus no gelation is necessary after fitting of a cover member. Consequently, a gel precursor having high viscosity that is difficult to be used in an injection method can be used in this method. Furthermore, a substance which requires use of a solvent can be used as a gel precursor of a gel sealing material.Type: GrantFiled: March 9, 2006Date of Patent: December 6, 2011Assignees: Sony Corporation, Sony Chemical & Information DeviceInventors: Kouki Hatsuda, Hiroshi Samukawa
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Patent number: 8022126Abstract: An encapsulating resin composition is provided, which gives a cured product having heat resistance, light resistance, and flexibility equivalent to those of silicone resins and having a refractive index of 1.57 or greater which is larger than that of epoxy resins. The encapsulating resin composition contains: a high refractive index acrylic-based or methacrylic-based monomer having a refractive index of 1.55 or greater; and a nonfunctional fluorene compound. In a preferred form, each of the high refractive index acrylic-based or methacrylic-based monomer and the nonfunctional fluorene compound has a 9,9-bisphenylfluorene skeleton.Type: GrantFiled: October 29, 2007Date of Patent: September 20, 2011Assignees: Sony Corporation, Sony Chemical & Information Device CorporationInventors: Kouki Hatsuda, Hiroshi Samukawa
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Patent number: 7868109Abstract: A curable resin composition is provided which has an appropriate viscosity suitable for encapsulating a light-emitting device. The cured product of the curable resin composition has a refractive index equal to or larger than that of epoxy resins, is excellent in heat resistance and light resistance, and has thermal stress relaxation properties. The curable resin composition contains a high refractive index acrylic-based monomer having a refractive index of 1.52 or more and a non-polymerizable carbazole, and further contains a polymerizable carbazole in accordance with need. An acrylate or methacrylate having a fluorene skeleton, a bisphenol-A skeleton, a biphenyl skeleton, a naphthalene skeleton, or an anthracene skeleton is used as the high refractive index acrylic-based monomer.Type: GrantFiled: March 14, 2007Date of Patent: January 11, 2011Assignees: Sony Corporation, Sony Chemical & Information Device CorporationInventors: Hiroshi Samukawa, Kouki Hatsuda
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Publication number: 20100140654Abstract: Disclosed is a method for sealing a light-emitting device wherein formation of air bubbles in a light-emitting device module can be prevented by performing no gelation after fitting of a cover member. This method also enables to seal a light-emitting device by using a gel sealing material composed of a gel precursor which uses a solvent. Also disclosed is a light-emitting module formed by such a sealing method. In this method for sealing a light-emitting device, gelation of the gel precursor of a gel sealing material is performed before placing the precursor on the light-emitting device, and thus no gelation is necessary after fitting of a cover member. Consequently, a gel precursor having high viscosity that is difficult to be used in an injection method can be used in this method. Furthermore, a substance which requires use of a solvent can be used as a gel precursor of a gel sealing material.Type: ApplicationFiled: March 9, 2006Publication date: June 10, 2010Applicant: SONY CHEMICAL & INFORMATION DEVICE CORPORATIONInventors: Kouki Hatsuda, Hiroshi Samukawa
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Patent number: 7732078Abstract: A liquid-absorbent composition, which has a liquid-absorbent crosslinked resin that exhibits excellent absorption of the nonaqueous electrolyte of nonaqueous electrolyte secondary cells that constitute a nonaqueous electrolyte battery pack (and particularly a lithium ion nonaqueous electrolyte rechargeable battery pack), contains a powder of a liquid-absorbent crosslinked resin produced by crosslinking a methyl vinyl ether/maleic anhydride copolymer with a polyfunctional isocyanate compound, and a binder resin. Also, a liquid-absorbent sheet for a nonaqueous electrolyte battery pack contains supporting substrate and formed on one side of a supporting substrate a liquid-absorbent crosslinked resin layer, produced by crosslinking a methyl vinyl ether/maleic anhydride copolymer with a polyfunctional isocyanate compound.Type: GrantFiled: December 19, 2003Date of Patent: June 8, 2010Assignees: Sony Corporation, Sony Chemical & Information Device CorporationInventors: Mamiko Nomura, Hiroshi Samukawa
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Publication number: 20100059774Abstract: A light-emitting device is provided which uses an encapsulant material made from a polymer having a high relative light output. The light-emitting device includes a light-emitting element and a member sealing the light-emitting element. The encapsulant material has one or more than two kinds of units given by the following formula (1) and a refractive index of 1.55 or more. where R is a hydrogen atom, alkyl group or phenyl group, Y is an alkyl group of which the carbon number is 1 to 6 or an alkyloxy group of which the carbon number is 1 to 6 and Z is an aromatic compound that meets predetermined requirements.Type: ApplicationFiled: June 9, 2008Publication date: March 11, 2010Applicant: SONY CHEMICAL & INFORMATION DEVICE CORPORATIONInventors: Kouki Hatsuda, Hiroshi Samukawa, Katsuhiko Komuro
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Publication number: 20090143505Abstract: A curable resin composition is provided which has an appropriate viscosity suitable for encapsulating a light-emitting device. The cured product of the curable resin composition has a refractive index equal to or larger than that of epoxy resins, is excellent in heat resistance and light resistance, and has thermal stress relaxation properties. The curable resin composition contains a high refractive index acrylic-based monomer having a refractive index of 1.52 or more and a non-polymerizable carbazole, and further contains a polymerizable carbazole in accordance with need. An acrylate or methacrylate having a fluorene skeleton, a bisphenol-A skeleton, a biphenyl skeleton, a naphthalene skeleton, or an anthracene skeleton is used as the high refractive index acrylic-based monomer.Type: ApplicationFiled: March 14, 2007Publication date: June 4, 2009Applicant: SONY CHEMICAL & INFORMATION DEVICE CORPORATIONInventors: Hiroshi Samukawa, Kouki Hatsuda
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Patent number: 7446159Abstract: A resin composition having a viscosity suitable for encapsulating optical devices such as light-emitting devices is provided. Specifically, the cured product of the resin composition has a refractive index greater than or equal to that of epoxy resins, exhibits excellent heat resistance and light resistance, and has thermal stress relaxation properties. The curable resin composition contains a fluorene group-containing acrylate or methacrylate represented by the following formula and a specific monofunctional acrylate or methacrylate: wherein X is —(CH2CH2O)n— or —(CH2CH2O)—CH2CH(OH)CH2O— with n being 1 to 5 and R is an acrylic or methacrylic group.Type: GrantFiled: September 20, 2007Date of Patent: November 4, 2008Assignees: Sony Corporation, Sony Chemical & Information Device CorporationInventors: Hiroshi Samukawa, Kouki Hatsuda, Yoshito Ikeda, Hisashi Ando, Norikazu Yamamoto
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Publication number: 20080269457Abstract: A process for producing polyimide fine particles that involves subjecting a polyamic acid solution to a thermal imidization process to directly produce polyimide fine particles. In the process, relatively monodisperse, non-aggregating fine polyimide particles can be directly obtained without using thermal imidization catalysts that are difficult to remove from the reaction mixture or without using an azeotropic solvent to remove the water produced. Specifically, the process for producing polyimide fine particles comprises the step of subjecting a polyamic acid solution to a thermal imidization process to crystallize polyimide as fine particles. The thermal imidization step comprises heating the polyamic acid solution while the solution is irradiated with ultrasound.Type: ApplicationFiled: April 11, 2006Publication date: October 30, 2008Applicant: Sony Chemical & Information Device CorporationInventor: Hiroshi Samukawa
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Publication number: 20080114100Abstract: An encapsulating resin composition is provided, which gives a cured product having heat resistance, light resistance, and flexibility equivalent to those of silicone resins and having a refractive index of 1.57 or greater which is larger than that of epoxy resins. The encapsulating resin composition contains: a high refractive index acrylic-based or methacrylic-based monomer having a refractive index of 1.55 or greater; and a nonfunctional fluorene compound. In a preferred form, each of the high refractive index acrylic-based or methacrylic-based monomer and the nonfunctional fluorene compound has a 9,9-bisphenylfluorene skeleton.Type: ApplicationFiled: October 29, 2007Publication date: May 15, 2008Applicant: SONY CHEMICAL & INFORMATION DEVICE CORPORATIONInventors: Kouki Hatsuda, Hiroshi Samukawa
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Publication number: 20070039921Abstract: An etching solution of the invention includes 3-65% by weight of a diol containing 3 to 6 carbon atoms or a triol containing 4 to 6 carbon atoms, 10-55% by weight of an alkali compound, and water in an amount of 0.75-3.0 times the amount of the alkali compound. Such a solution may be used at 65° C. or higher to rapidly etch a polyimide resin layer having an imidation degree of 50-98% without unfavorably affecting the working atmosphere.Type: ApplicationFiled: October 30, 2006Publication date: February 22, 2007Applicants: Sony Corporation, Sony Chemical & Information Device CorporationInventor: Hiroshi Samukawa
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Patent number: 7144817Abstract: The disclosure relates to methods and solutions for precisely and rapidly etching a polyimide resin layer. Etching solutions of the present invention include 3–65% by weight of a diol containing 3 to 6 carbon atoms or a triol containing 4 to 6 carbon atoms, 10–55 % by weight of an alkali compound and water in an amount of 0.75–3.0 times the amount of the alkali compound, and can be used at 65° C. or more to rapidly etch a polyimide resin layer having an imidation degree of 50–98 % without unfavorably affecting the working atmosphere. Even if the resin layer is completely imidated after etching, the etching pattern of the resulting resin layer is not deformed with a decreased contamination by impurity ions as compared with those obtained using conventional etching solutions.Type: GrantFiled: July 12, 2001Date of Patent: December 5, 2006Assignees: Sony Corporation, Sony Chemicals Corp.Inventor: Hiroshi Samukawa
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Publication number: 20060022634Abstract: A liquid-absorbent composition, which has a liquid-absorbent crosslinked resin that exhibits excellent absorption of the nonaqueous electrolyte of nonaqueous electrolyte secondary cells that constitute a nonaqueous electrolyte battery pack (and particularly a lithium ion nonaqueous electrolyte rechargeable battery pack), contains a powder of a liquid-absorbent crosslinked resin produced by crosslinking a methyl vinyl ether/maleic anhydride copolymer with a polyfunctional isocyanate compound, and a binder resin. Also, a liquid-absorbent sheet for a nonaqueous electrolyte battery pack contains supporting substrate and formed on one side of a supporting substrate a liquid-absorbent crosslinked resin layer, produced by crosslinking a methyl vinyl ether/maleic anhydride copolymer with a polyfunctional isocyanate compound.Type: ApplicationFiled: December 19, 2003Publication date: February 2, 2006Inventors: Mamiko Nomura, Hiroshi Samukawa
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Patent number: 6566439Abstract: The present invention provides a lowly-adhesive coating material comprising 99 to 33% by weight of a fluorine-containing acrylic polymer obtained by polymerizing a monomer composition mainly comprising acrylate or methacrylate having C6-16 perfluoroalkyl groups and 1 to 67% by weight of a fluorine-type oil.Type: GrantFiled: February 4, 2000Date of Patent: May 20, 2003Assignee: Sony Chemicals CorporationInventor: Hiroshi Samukawa
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Publication number: 20030049441Abstract: The present invention provides a lowly-adhesive coating material comprising 99 to 33% by weight of a fluorine-containing acrylic polymer obtained by polymerizing a monomer composition mainly comprising acrylate or methacrylate having C6-16 perfluoroalkyl groups and 1 to 67% by weight of a fluorine-type oil.Type: ApplicationFiled: February 4, 2000Publication date: March 13, 2003Inventor: Hiroshi Samukawa
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Patent number: 6489417Abstract: A process for producing a fluorine-containing acrylic or methacrylic polymer, comprises polymerizing a fluorine-containing acrylate or methacrylate in a solution phase formed of an organic solvent and dissolved therein a monomer containing a fluorine-containing acrylate or methacrylate having a polyfluoroalkyl group having 6 to 16 carbon atoms. A non-halogen type solvent is used as the organic solvent and the fluorine-containing acrylate or methacrylate is so polymerized that a polymer-containing liquid phase comprised of the fluorine-containing acrylic or methacrylic polymer formed with progress of polymerization and the organic solvent is separated from the solution phase. This process enables production of a fluorine-containing acrylic or methacrylic polymer having a fluorine monomer in a high proportion by the use of a commonly available general-purpose solvent, without using any fluorine type solvent.Type: GrantFiled: June 4, 1998Date of Patent: December 3, 2002Assignee: Sony Chemicals CorporationInventor: Hiroshi Samukawa
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Publication number: 20020030178Abstract: The disclosure relates to methods and solutions for precisely and rapidly etching a polyimide resin layer. Etching solutions of the present invention include 3-65% by weight of a diol containing 3 to 6 carbon atoms or a triol containing 4 to 6 carbon atoms, 10-55 % by weight of an alkali compound and water in an amount of 0.75-3.0 times the amount of the alkali compound, and can be used at 65° C. or more to rapidly etch a polyimide resin layer having an imidation degree of 50-98 % without unfavorably affecting the working atmosphere. Even if the resin layer is completely imidated after etching, the etching pattern of the resulting resin layer is not deformed with a decreased contamination by impurity ions as compared with those obtained using conventional etching solutions.Type: ApplicationFiled: July 12, 2001Publication date: March 14, 2002Inventor: Hiroshi Samukawa
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Patent number: 6288148Abstract: Acrylic emulsions are obtained by carrying out a polymerization reaction of a first acrylic monomer dispersion, adding a second acrylic monomer dispersion, and carrying out a further polymerization reaction wherein the first acrylic monomer dispersion contains acrylic monomer and tackifier in a first proportion to acrylic monomer contained in the first acrylic monomer dispersion and wherein the second acrylic monomer dispersion contains acrylic monomer and tackifier in a second proportion to acrylic monomer contained in the second acrylic monomer dispersion, and wherein the proportion of tackifier in the first acrylic monomer dispersion is lower than the proportion of tackifier in the second acrylic monomer dispersion. A high molecular weight acrylic polymer is obtained when the first acrylic monomer dispersion is polymerization reacted. The second acrylic monomer dispersion is added to the first acrylic monomer dispersion after the first acrylic monomer dispersion is polymerization reacted.Type: GrantFiled: July 30, 1999Date of Patent: September 11, 2001Assignee: Sony Chemicals Corp.Inventors: Hiroshi Samukawa, Kazuki Shibata
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Patent number: 5869220Abstract: Highly versatile stable photoresist emulsions can be prepared using low levels of neutralization while minimizing the use of surfactants and associative thickeners. High solids, low viscosity waterborne photoresist emulsion compositions are prepared by mixing and comminuting a partially neutralized acid functional latex polymer resin with photopolymerizable monomers and photoinitiators under conditions sufficient to produce a stable emulsion.Type: GrantFiled: June 6, 1997Date of Patent: February 9, 1999Assignee: MacDermid Acumen, Inc.Inventors: John Scott Hallock, Hiroshi Samukawa