Abstract: This invention relates to a sealing apparatus for use in heat treating apparatuses, ion injection apparatuses, etching apparatuses and other devices which require air sealing. Such devices may be used in semiconductor manufacturing. Mounting portions are formed in the sealing apparatus so as to separate an inner-side portion and an outer-side portion of a flange contact portion of a manifold and a process tube of a process container. Air is exhausted from the area between the inner-side portion and the outer-side portion of the flange contact portion of the manifold and the process tube. Two metal seal members are mounted to the mounting portions. These metal seal members have different surface processing thereon. The middle portion between the metal seal members is connected to an air exhaust source and air is exhausted to create a vacuum therein. This provides the sealing function to seal the process tube and the manifold.

Abstract: A sealing device of this invention is designed to prevent entering of the open air through a coupling of a process tube of a CVD apparatus. The sealing device includes a first flange having a mirror-finished face, a second flange having a face which is brought into contact with the face of the first flange, at least one gas guide which is open to at least one of the faces of the first and second flanges and an evacuation system for evacuating a region, in which the first and second flanges are brought into contact with each other, through the gas guide.