Patents by Inventor Hiroshi Sobukawa
Hiroshi Sobukawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230173636Abstract: To terminate polishing at an appropriate position, an end point position of the polishing is sensed. According to one embodiment, a method that chemomechanically polishes a substrate including a functional chip is provided. The method includes: a step of disposing the functional chip on the substrate; a step of disposing an end point sensing element on the substrate; a step of sealing the substrate on which the functional chip and the end point sensing element are disposed with an insulating material; a step of polishing the insulating material; and a step of sensing an end point of the polishing based on the end point sensing element while the insulating material is polished.Type: ApplicationFiled: January 30, 2023Publication date: June 8, 2023Inventors: Tetsuji TOGAWA, Hiroshi SOBUKAWA, Masahiro HATAKEYAMA
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Patent number: 11607769Abstract: A CMP polishing apparatus for flattening a quadrate substrate is provided. A polishing apparatus for polishing a quadrate substrate is provided. The polishing apparatus includes a substrate holding portion configured to hold the quadrate substrate. The substrate holding portion includes a quadrate substrate supporting surface that supports the substrate, and an attachment mechanism that attaches a retainer member to be disposed at an outside of at least one corner portion of the substrate supporting surface.Type: GrantFiled: April 23, 2018Date of Patent: March 21, 2023Assignee: EBARA CORPORATIONInventors: Tetsuji Togawa, Hiroshi Sobukawa, Masahiro Hatakeyama
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Patent number: 11597051Abstract: To terminate polishing at an appropriate position, an end point position of the polishing is sensed. According to one embodiment, a method that chemomechanically polishes a substrate including a functional chip is provided. The method includes: a step of disposing the functional chip on the substrate; a step of disposing an end point sensing element on the substrate; a step of sealing the substrate on which the functional chip and the end point sensing element are disposed with an insulating material; a step of polishing the insulating material; and a step of sensing an end point of the polishing based on the end point sensing element while the insulating material is polished.Type: GrantFiled: August 22, 2018Date of Patent: March 7, 2023Assignee: EBARA CORPORATIONInventors: Tetsuji Togawa, Hiroshi Sobukawa, Masahiro Hatakeyama
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Patent number: 10995765Abstract: A magnetic levitated pump that does not cause pulsation of a pumped liquid and can suppress the generation of particles, which are liable to be produced by contact of a sliding part, is disclosed. The magnetic levitated pump for magnetically levitating an impeller housed in a pump casing includes a motor configured to rotate the impeller, and an electromagnet configured to magnetically support the impeller. The motor and the electromagnet are arranged so as to face each other across the impeller, and the motor is arranged on the opposite side of a suction port of the pump casing.Type: GrantFiled: October 30, 2015Date of Patent: May 4, 2021Assignee: EBARA CORPORATIONInventors: Ichiju Sato, Hiroshi Sobukawa, Toshimitsu Barada, Tomonori Ohashi, Satoshi Mori
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Publication number: 20200391341Abstract: To terminate polishing at an appropriate position, an end point position of the polishing is sensed. According to one embodiment, a method that chemomechanically polishes a substrate including a functional chip is provided. The method includes: a step of disposing the functional chip on the substrate; a step of disposing an end point sensing element on the substrate; a step of sealing the substrate on which the functional chip and the end point sensing element are disposed with an insulating material; a step of polishing the insulating material; and a step of sensing an end point of the polishing based on the end point sensing element while the insulating material is polished.Type: ApplicationFiled: August 22, 2018Publication date: December 17, 2020Applicant: Ebara CorporationInventors: Tetsuji TOGAWA, Hiroshi SOBUKAWA, Masahiro HATAKEYAMA
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Publication number: 20200130131Abstract: A CMP polishing apparatus for flattening a quadrate substrate is provided. A polishing apparatus for polishing a quadrate substrate is provided. The polishing apparatus includes a substrate holding portion configured to hold the quadrate substrate. The substrate holding portion includes a quadrate substrate supporting surface that supports the substrate, and an attachment mechanism that attaches a retainer member to be disposed at an outside of at least one corner portion of the substrate supporting surface.Type: ApplicationFiled: April 23, 2018Publication date: April 30, 2020Inventors: Tetsuji Togawa, Hiroshi Sobukawa, Masahiro Hatakeyama
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Publication number: 20160131141Abstract: A magnetic levitated pump that does not cause pulsation of a pumped liquid and can suppress the generation of particles, which are liable to be produced by contact of a sliding part, is disclosed. The magnetic levitated pump for magnetically levitating an impeller housed in a pump casing includes a motor configured to rotate the impeller, and an electromagnet configured to magnetically support the impeller. The motor and the electromagnet are arranged so as to face each other across the impeller, and the motor is arranged on the opposite side of a suction port of the pump casing.Type: ApplicationFiled: October 30, 2015Publication date: May 12, 2016Applicant: EBARA CORPORATIONInventors: Ichiju SATO, Hiroshi SOBUKAWA, Toshimitsu BARADA, Tomonori OHASHI, Satoshi MORI
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Patent number: 9105444Abstract: An electro-optical inspection apparatus is provided that is capable of preventing adhesion of dust or particles to the sample surface as much as possible. A stage (100) on which a sample (200) is placed is disposed inside a vacuum chamber (112) that can be evacuated to vacuum, and a dust collecting electrode (122) is disposed to surround a periphery of the sample (200). The dust collecting electrode (122) is applied with a voltage having the same polarity as a voltage applied to the sample (200) and an absolute value that is the same or larger than an absolute value of the voltage. Thus, because dust or particles such as particles adhere to the dust collecting electrode (122), adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber containing the stage, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied.Type: GrantFiled: December 4, 2013Date of Patent: August 11, 2015Assignee: EBARA CORPORATIONInventors: Kenji Watanabe, Masahiro Hatakeyama, Yoshihiko Naito, Tatsuya Kohama, Kenji Terao, Takeshi Murakami, Takehide Hayashi, Kiwamu Tsukamoto, Hiroshi Sobukawa, Norio Kimura
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Publication number: 20140091215Abstract: An electro-optical inspection apparatus is provided that is capable of preventing adhesion of dust or particles to the sample surface as much as possible. A stage (100) on which a sample (200) is placed is disposed inside a vacuum chamber (112) that can be evacuated to vacuum, and a dust collecting electrode (122) is disposed to surround a periphery of the sample (200). The dust collecting electrode (122) is applied with a voltage having the same polarity as a voltage applied to the sample (200) and an absolute value that is the same or larger than an absolute value of the voltage. Thus, because dust or particles such as particles adhere to the dust collecting electrode (122), adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber containing the stage, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied.Type: ApplicationFiled: December 4, 2013Publication date: April 3, 2014Applicant: Ebara CorporationInventors: Kenji WATANABE, Masahiro HATAKEYAMA, Yoshihiko NAITO, Tatsuya KOHAMA, Kenji TERAO, Takeshi MURAKAMI, Takehide HAYASHI, Kiwamu TSUKAMOTO, Hiroshi SOBUKAWA, Norio KIMURA
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Patent number: 8624182Abstract: An electro-optical inspection apparatus prevents adhesion of dust or particles to a sample surface, wherein a stage on which a sample is placed is disposed inside a vacuum chamber that can be evacuated, and a dust collecting electrode is disposed to surround a periphery of the sample. The dust collecting electrode is applied with a voltage having the same polarity as a voltage applied to the sample and an absolute value that is the same or larger than an absolute value of the voltage. Because dust or particles adhere to the dust collecting electrode, adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied.Type: GrantFiled: August 2, 2011Date of Patent: January 7, 2014Assignee: Ebara CorporationInventors: Kenji Watanabe, Masahiro Hatakeyama, Yoshihiko Naito, Tatsuya Kohama, Kenji Terao, Takeshi Murakami, Takehide Hayashi, Kiwamu Tsukamoto, Hiroshi Sobukawa, Norio Kimura
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Publication number: 20130259712Abstract: The present invention relates to a vacuum evacuation apparatus which can be mounted in a posture that can freely be selected a vacuum evacuation apparatus for evacuating a container from an atmospheric pressure to a high vacuum or less includes a first vacuum pump for evacuating the container to a high vacuum or less, and a second vacuum pump for evacuating the container from an atmospheric pressure to a medium or low vacuum the first vacuum pump and the second vacuum pump are integrally connected to each other into an integral unit.Type: ApplicationFiled: March 25, 2013Publication date: October 3, 2013Applicant: EBARA CORPORATIONInventors: Hiroyuki Kawasaki, Hiroshi Sobukawa, Atsushi Oyama
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Patent number: 8530869Abstract: An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.Type: GrantFiled: July 15, 2011Date of Patent: September 10, 2013Assignees: Gigaphoton Inc., Ebara Corporation, Kabushiki Kaisha TopconInventors: Shinji Nagai, Takanobu Ishihara, Kouji Kakizaki, Hiroshi Sobukawa, Takeshi Murakami, Masahiro Inoue
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Publication number: 20120074316Abstract: An electro-optical inspection apparatus is provided that is capable of preventing adhesion of dust or particles to the sample surface as much as possible. A stage (100) on which a sample (200) is placed is disposed inside a vacuum chamber (112) that can be evacuated to vacuum, and a dust collecting electrode (122) is disposed to surround a periphery of the sample (200). The dust collecting electrode (122) is applied with a voltage having the same polarity as a voltage applied to the sample (200) and an absolute value that is the same or larger than an absolute value of the voltage. Thus, because dust or particles such as particles adhere to the dust collecting electrode (122), adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber containing the stage, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied.Type: ApplicationFiled: August 2, 2011Publication date: March 29, 2012Inventors: Kenji WATANABE, Masahiro HATAKEYAMA, Yoshihiko NAITO, Tatsuya KOHAMA, Kenji TERAO, Takeshi MURAKAMI, Takehide HAYASHI, Kiwamu TSUKAMOTO, Hiroshi SOBUKAWA, Norio KIMURA
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Patent number: 8109744Abstract: An oil-free turbo vacuum pump is capable of evacuating gas in a chamber from atmospheric pressure to high vacuum. The turbo vacuum pump includes a pumping section having rotor blades and stator blades which are disposed alternately in a casing, a main shaft for supporting the rotor blades, and a bearing and motor section having a motor for rotating the main shaft and a bearing mechanism for supporting the main shaft rotatably. A gas bearing is used as a bearing for supporting the main shaft in a thrust direction, spiral grooves are formed in both surfaces of a stationary part of the gas bearing, and the stationary part having the spiral grooves is placed between an upper rotating part and a lower rotating part which are fixed to the main shaft.Type: GrantFiled: March 25, 2009Date of Patent: February 7, 2012Assignee: Ebara CorporationInventors: Hiroyuki Kawasaki, Hiroaki Ogamino, Hiroshi Sobukawa
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Patent number: 8067732Abstract: An electron beam emitted from an electron gun (G) forms a reduced image on a sample (S) through a non-dispersion Wien-filter (5-1), an electromagnetic deflector (11-1), a beam separator (12-1), and a tablet lens (17-1) as an objective lens. The beam separator (12-1) is configured such that a distance by which a secondary electron beam passes through the beam separator is approximately three times longer than a distance by which a primary electron beam passes through the beam separator. Therefore, even if a magnetic field in the beam separator is set to deflect the primary electron beam by a small angle equal to or less than approximately 10 degrees, the secondary electron beam can be deflected by approximately 30 degrees, so that the primary and secondary electron beams are sufficiently separated. Also, since the primary electron beam is deflected by a small angle, less aberration occurs in the primary electron beam.Type: GrantFiled: July 24, 2006Date of Patent: November 29, 2011Assignees: Ebara Corporation, Kabushiki Kaisha ToshibaInventors: Mamoru Nakasuji, Takeshi Murakami, Tohru Satake, Tsutomi Karimata, Toshifumi Kimba, Matsutaro Miyamoto, Hiroshi Sobukawa, Satoshi Mori, Yuichiro Yamazaki, Ichirota Nagahama
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Publication number: 20110266468Abstract: An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.Type: ApplicationFiled: July 15, 2011Publication date: November 3, 2011Applicants: Gigaphoton Inc., Kabushiki Kaisha Topcon, Ebara CorporationInventors: Shinji NAGAI, Takanobu Ishihara, Kouji Kakizaki, Hiroshi Sobukawa, Takeshi Murakami, Masahiro Inoue
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Patent number: 8003963Abstract: An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.Type: GrantFiled: October 26, 2009Date of Patent: August 23, 2011Assignees: Gigaphton Inc., Ebara Corporation, Kabushiki Kaisha TopconInventors: Shinji Nagai, Takanobu Ishihara, Kouji Kakizaki, Hiroshi Sobukawa, Takeshi Murakami, Masahiro Inoue
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Publication number: 20100108918Abstract: An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.Type: ApplicationFiled: October 26, 2009Publication date: May 6, 2010Inventors: Shinji Nagai, Takanobu Ishihara, Kouji Kakizaki, Hiroshi Sobukawa, Takeshi Murakami, Masahiro Inoue
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Publication number: 20090246038Abstract: An oil-free turbo vacuum pump is capable of evacuating gas in a chamber from atmospheric pressure to high vacuum. The turbo vacuum pump includes a pumping section having rotor blades and stator blades which are disposed alternately in a casing, a main shaft for supporting the rotor blades, and a bearing and motor section having a motor for rotating the main shaft and a bearing mechanism for supporting the main shaft rotatably. A gas bearing is used as a bearing for supporting the main shaft in a thrust direction, spiral grooves are formed in both surfaces of a stationary part of the gas bearing, and the stationary part having the spiral grooves is placed between an upper rotating part and a lower rotating part which are fixed to the main shaft.Type: ApplicationFiled: March 25, 2009Publication date: October 1, 2009Applicant: EBARA CORPORATIONInventors: Hiroyuki KAWASAKI, Hiroaki OGAMINO, Hiroshi SOBUKAWA
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Publication number: 20090218506Abstract: An electron beam emitted from an electron gun (G) forms a reduced image on a sample (S) through a non-dispersion Wien-filter (5-1), an electromagnetic deflector (11-1), a beam separator (12-1), and a tablet lens (17-1) as an objective lens. The beam separator (12-1) is configured such that a distance by which a secondary electron beam passes through the beam separator is approximately three times longer than a distance by which a primary electron beam passes through the beam separator. Therefore, even if a magnetic field in the beam separator is set to deflect the primary electron beam by a small angle equal to or less than approximately 10 degrees, the secondary electron beam can be deflected by approximately 30 degrees, so that the primary and secondary electron beams are sufficiently separated. Also, since the primary electron beam is deflected by a small angle, less aberration occurs in the primary electron beam.Type: ApplicationFiled: July 24, 2006Publication date: September 3, 2009Applicant: EBARA CORPORATIONInventors: Mamoru Nakasuji, Takeshi Murakami, Tohru Satake, Tsutomu Karimata, Toshifumi Kimba, Matsutaro Miyamoto, Hiroshi Sobukawa, Satoshi Mori