Abstract: A wafer exchange apparatus is provided that is compact with excellent accessibility. The wafer exchange apparatus of the present invention includes a first and a second hands (10), (20), a first lifting means (30), a casing (40), a horizontal moving means (50) and a second lifting means (60). The first and the second hands (10), (20) are formed in shapes segmented in the left and right direction with generally line symmetry, and support a wafer (100). The first lifting means (30) moves the second hand (20) upward and downward. The casing (40) has the first lifting means (30) built-in, and supports the first hand (10) at a constant position in height while supporting the second hand (20) movably upward and downward. The horizontal moving means (50) moves the casing (40) horizontally. The second lifting means (60) moves the casing (40) upward and downward.

Abstract: The object of the present invention is to provide an apparatus suitable for forming a thick film having a thickness on a surface of a substrate such as a glass substrate, a semiconductor wafer or the like. In the apparatus according to the present invention, a stock station for a substrate and a treatment station for a substrate are adjacent to each other, portions for coating, film-forming, cleaning and drying are provided in the treatment station, a tray having a concave portion for accommodating a substrate defined on the surface thereof is provided, and a transfer device circulates the tray around the portions for coating, film-forming, cleaning and drying.

Abstract: The object of the present invention is to provide an apparatus suitable for forming a thick film having a thickness on a surface of a substrate such as a glass substrate, a semiconductor wafer or the like. In the apparatus according to the present invention, a stock station for a substrate and a treatment station for a substrate are adjacent to each other, portions for coating, film-forming, cleaning and drying are provided in the treatment station, a tray having a concave portion for accommodating a substrate defined on the surface thereof is provided, and a transfer device circulates the tray around the portions for coating, film-forming, cleaning and drying.