Abstract: A vacuum glass panel including a vacuum glass, a sash, and a grazing gasket is provided. The vacuum glass includes a first glass plate, a second glass plate having substantially the same area as the area of the first glass plate in a front view, and a depressurized layer arranged between the first glass plate and the second glass plate opposed to the first glass plate. The lower face of the first glass plate and the lower face of the second glass plate are misaligned relative to each other in the vertical direction. The sash includes two groove walls that define a groove for receiving the upper, lower, right, and left peripheral edge portions of the vacuum glass in a front view.

Abstract: A vacuum glass panel including a vacuum glass, a sash, and a grazing gasket is provided. The vacuum glass includes a first glass plate, a second glass plate having substantially the same area as the area of the first glass plate in a front view, and a depressurized layer arranged between the first glass plate and the second glass plate opposed to the first glass plate. The lower face of the first glass plate and the lower face of the second glass plate are misaligned relative to each other in the vertical direction. The sash includes two groove walls that define a groove for receiving the upper, lower, right, and left peripheral edge portions of the vacuum glass in a front view.

Abstract: The glass sheet production method of the present invention is a method for producing a surface-modified glass sheet, including a gas contact step of bringing hydrogen fluoride (HF) gas, hydrogen chloride (HCl) gas, and water vapor into contact with at least one principal surface of a glass sheet. A gas containing the hydrogen fluoride (HF) gas is used in the gas contact step, and in the gas containing the hydrogen fluoride (HF) gas, a volume ratio of the water vapor to the hydrogen fluoride (HF) gas (volume of water vapor/volume of HF gas) is 8 or more.

Abstract: The present invention provides a glass composition that allows holes with a circular contour and a smooth inner wall to be formed by a collective micro-hole-forming process using a combination of modified portion formation by ultraviolet laser irradiation and etching, the glass composition being adapted for practical continuous production. The present invention relates to a glass for laser processing, the glass having a glass composition including, in mol %: 45.0%?SiO2?70.0%; 2.0%?B2O3?20.0%; 3.0%?Al2O3?20.0%; 0.1%?CuO?2.0%; 0%?TiO2?15.0%; and 0%?ZnO?9.0%, wherein a relationship of 0?Li2O+Na2O+K2O<2.0% is satisfied.

Abstract: The glass sheet production method of the present invention includes the steps of: (I) bringing a first acid gas into contact with at least one principal surface of a sheet-shaped glass material, the first acid gas containing hydrogen fluoride (HF) gas but not containing hydrogen chloride (HCl) gas and having a volume ratio of water vapor to HF gas of less than 8, the glass material containing at least sodium as a component and having a temperature in a range from a glass transition temperature to a temperature 250° C.

Abstract: The present invention provides a glass composition that allows holes with a circular contour and a smooth inner wall to be formed by a collective micro-hole-forming process using a combination of modified portion formation by ultraviolet laser irradiation and etching, the glass composition being adapted for practical continuous production. The present invention relates to a glass for laser processing, the glass having a glass composition including, in mol %: 45.0%?SiO2?70.0%; 2.0%?B2O3?20.0%; 3.0%?Al2O3?20.0%; 0.1%?CuO?2.0%; 0%?TiO2?15.0%; and 0%?ZnO?9.0%, wherein a relationship of 0?Li2O+Na2O+K2O<2.0% is satisfied.

Abstract: The glass sheet production method of the present invention is a method for producing a surface-modified glass sheet, including a gas contact step of bringing hydrogen fluoride (HF) gas, hydrogen chloride (HCl) gas, and water vapor into contact with at least one principal surface of a glass sheet. A gas containing the hydrogen fluoride (HF) gas is used in the gas contact step, and in the gas containing the hydrogen fluoride (HF) gas, a volume ratio of the water vapor to the hydrogen fluoride (HF) gas (volume of water vapor/volume of HF gas) is 8 or more.

Abstract: The glass sheet production method of the present invention is a method for producing a surface-modified glass sheet. This method includes a gas contact step of bringing hydrogen fluoride (HF) gas and hydrogen chloride (Cl) gas into contact with at least one principal surface of a glass sheet having a temperature in a range of 450° C. to 630° C. A gas containing the hydrogen fluoride (HF) gas is used in the gas contact step, and in the gas containing the hydrogen fluoride (HF) gas, a volume ratio of water vapor to the hydrogen fluoride (HF) gas (volume of water vapor/volume of HF gas) is less than 8.

Abstract: The glass sheet production method of the present invention includes the steps of: (I) bringing a first acid gas into contact with at least one principal surface of a sheet-shaped glass material, the first acid gas containing hydrogen fluoride (HF) gas but not containing hydrogen chloride (HCl) gas and having a volume ratio of water vapor to HF gas of less than 8, the glass material containing at least sodium as a component and having a temperature in a range from a glass transition temperature to a temperature 250° C.

Abstract: The glass sheet production method of the present invention includes the steps of; (I) bringing a mixed gas into contact with at least one surface of a sheet-shaped glass material so as to change a surface morphology of the glass material to an extent that light scattering properties of the glass material are changed, the mixed gas containing a fluorine element (F)-containing acid A and a chlorine element (Cl)-containing acid B and having a molar ratio of water to the acid A (molar concentration of water/molar concentration of acid A) of less than 5, the glass material containing at least sodium as a component and having a temperature in a range from a glass transition temperature to a temperature 300° C. higher than the glass transition temperature; and (II) cooling the sheet-shaped glass material obtained in the step (I) so as to obtain a glass sheet.

Abstract: A glass substrate processing method includes irradiating laser light L onto a glass substrate 1 such that the laser light L is focused within the glass substrate 1, thereby forming a high density area 3 that has a higher density than areas where the laser light L is not irradiated around the portion where the laser light L is focused; and performing chemical etching on the glass substrate 1 using an etching solution such that at least a portion of the high density area is allowed to remain, thereby forming a projection 2 on a surface 1a of the glass substrate 1.

Abstract: A glass for laser processing that is processed through laser beam irradiation, wherein the glass for laser processing has a composition that satisfies the following relationships: 40?M[NFO]?70; 5?(M[TiO2])?45; and 5?M[NMO]?40, where M[NFO], M[TiO2], and M[NMO] denote the content by percentage of network forming oxides (mol %), that of TiO2 (mol %), and that of network modifying oxides (mol %), respectively. With this structure, a glass for laser processing is obtained in which not only the vicinity of the surface thereof but also the inner portion thereof can be laser-processed.

Abstract: The present invention provides a glass for anodic bonding having a low thermal expansion coefficient and capable of being subjected to laser beam micromachining. The present invention is a glass for anodic bonding having a base glass composition containing 1 to 6 mol % of Li2O+Na2O+K2O and having an average linear expansion coefficient of 32×10?7 K?1 to 39×10?7 K?1 in a temperature range of room temperature to 450° C. This glass further contains 0.01 to 5 mol % of a metal oxide as a colorant relative to the base glass composition, and has an absorption coefficient of 0.5 to 50 cm?1 at a particular wavelength within 535 nm or less.

Abstract: A glass substrate processing method includes irradiating laser light L onto a glass substrate 1 such that the laser light L is focused within the glass substrate 1, thereby forming a high density area 3 that has a higher density than areas where the laser light L is not irradiated around the portion where the laser light L is focused; and performing chemical etching on the glass substrate 1 using an etching solution such that at least a portion of the high density area is allowed to remain, thereby forming a projection 2 on a surface 1a of the glass substrate 1.

Abstract: Titanium is added in the form of atoms, a colloid, or ions to a glass to be subjected to laser processing in which the ablation or vaporization caused by the energy of an absorbed laser light is utilized. Since titanium can be incorporated into the glass through melting, the threshold value for processing can be easily regulated by changing the amount titanium to be added and a material having evenness in processability can be obtained.

Abstract: A glass processing method comprising steps (i), (ii) carried out in the order mentioned. In step (i), a laser pulse (11) with a wavelength ? is condensed by a lens and is applied to a glass plate (12) to form an altered portion (13) at the portion, irradiated with a laser pulse (11), of the glass plate (12). In step (ii), the altered portion (13) is etched by using an etchant having an etching rate larger for the altered portion (13) than that for the glass plate (12). The laser beam used includes the following conditions: The pulse width of a laser pulse (11) ranges from ins to 200 ns, with a wavelength ? being up to 535 nm. The absorption coefficient of the glass plate (12) at a wavelength ? is up to 50 cm?1. A value obtained from a lens focal distance L (mm) divided by the beam diameter D (mm) of the laser pulse (11) when entering the lens is at least 7.

Abstract: A processing method for glass substrate of the present invention includes: applying heat and external force to a glass substrate and then cooling it down to thereby form a compression stressed part having a different etching rate from that of other parts with respect to an etching reagent to be used, on the surface of the glass substrate and in the vicinity thereof; and performing chemical etching using the etching reagent on the glass substrate having the compression stressed part formed thereon, so as to form a relief on the surface of the glass substrate.

Abstract: The present invention improves a method of forming a surface unevenness using a difference in etching rates, and relaxes limitations on substrates in this method. In a method of the present invention, an uneven surface is formed by a method including applying pressure to a predetermined region in a surface of a thin film formed on a substrate, and etching a region including at least a portion of the predetermined region and at least a portion of the reminder of the surface that excludes the predetermined region. An etching rate difference within the thin film increases freedom in selecting a substrate material.

Abstract: A glass for laser processing of the present invention can be laser-processed by causing ablation or evaporation by laser beam energy absorbed therein, wherein the glass for laser processing has a composition that satisfies the following conditions: 60?SiO2+B2O3?79 mol %; 5?Al2O3+TiO2?20 mol %; and 5?Li2O+Na2O+K2O+Rb2O+Cs2O+MgO+CaO+SrO+BaO?20 mol %, where 5?TiO2?20 mol %. The present invention can provide a glass for laser processing that has a low laser processing threshold value as well as a low thermal expansion coefficient.

Abstract: A processing method for glass substrate of the present invention includes: applying heat and external force to a glass substrate and then cooling it down to thereby form a compression stressed part having a different etching rate from that of other parts with respect to an etching reagent to be used, on the surface of the glass substrate and in the vicinity thereof, and performing chemical etching using the etching reagent on the glass substrate having the compression stressed part formed thereon, so as to form a relief on the surface of the glass substrate.