Patents by Inventor Hirotsugu Nagayama

Hirotsugu Nagayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5415927
    Abstract: An inorganic or organic glass product, or tempered glass product excellent in weatherability, water resistance, moisture resistance and abrasion resistance, which is formed of a) a silicate glass substrate, b) a porous modified layer enriched with silicon oxide through removal of components other than silicon oxide in a surface layer of the silicate glass substrate, and c) a water-repellent layer formed of at least one compound of an organic silicon compound and an organic fluorine compound on a surface of the porous modified layer.
    Type: Grant
    Filed: September 30, 1992
    Date of Patent: May 16, 1995
    Assignees: Nippon Sheet Glass Co., Ltd., Toyota Jidosha Kabushiki Kaisha
    Inventors: Naoto Hirayama, Hirotsugu Nagayama, Akio Takigawa, Kiyotaka Sasaki, Misao Tsutsuki, Yasuhiro Otsuka
  • Patent number: 5132140
    Abstract: A process for depositing a silicon dioxide film on the surface of a substrate such as alkali-containing glass by bringing the substrate into contact with a treating solution comprising a hydrosilicofluoric acid solution supersaturated with silicon dioxide, which is obtained by heating a hydrosilicofluoric acid solution substantially saturated with silicon dioxide which has a temperature of not more than 0.degree. C., to a temperature of not less than 25.degree. C.
    Type: Grant
    Filed: January 29, 1991
    Date of Patent: July 21, 1992
    Assignee: Nippon Sheet Glass Co., Ltd.
    Inventors: Takuji Goda, Hirotsugu Nagayama, Hideo Kawahara, Yasuto Sakai, Akihiro Hishinuma
  • Patent number: 5073408
    Abstract: A method of depositing a silicon dioxide film on the surface of a substrate such as alkali-containing glass by bringing the substrate into contact with a treating solution comprising a hydrosilicofluoric acid solution supersaturated with silicon dioxide, which is obtained by increasing the temperature of a hydrosilicofluoric acid solution substantially saturated with silicon dioxide.
    Type: Grant
    Filed: September 7, 1990
    Date of Patent: December 17, 1991
    Assignee: Nippin Sheet Glass Co., Ltd.
    Inventors: Takuji Goda, Hirotsugu Nagayama, Hideo Kawahara
  • Patent number: 4882183
    Abstract: A film of the oxide of a metal selected from the group consisting of Sn, Zr, In, V, Cr, Mn, Fe, Co, Ni, and Cu is deposited on the surface of a substrate by a method which comprises establishing contact between the substrate and a treating liquid containing fluorine and the metal selected as described above thereby having the oxide of the metal dissolved to supersaturation therein.
    Type: Grant
    Filed: April 6, 1988
    Date of Patent: November 21, 1989
    Assignee: Nippon Sheet Glass Co., Ltd.
    Inventors: Juichi Ino, Akihiro Hishinuma, Hirotsugu Nagayama, Hideo Kawahara
  • Patent number: 4726664
    Abstract: An electrochromic device comprising an oxidation coloring substance coloring in an oxidized state and a reduction coloring substance coloring in a reduced state which are formed on the surfaces of a pair of electrodes, respectively, and an electrolyte held between the two substances, wherein the oxidation coloring substance is a double salt containing an iron hexacyanoferrate and the reduction coloring substance is a tungsten-oxalic acid compound. The electrochromic device has a long life suitable for actual applications and a short response time and can operate at low applied voltages.
    Type: Grant
    Filed: March 24, 1986
    Date of Patent: February 23, 1988
    Assignee: Nippon Sheet Glass Co., Ltd.
    Inventors: Hiroaki Tada, Hirotsugu Nagayama, Hideo Kawahara
  • Patent number: 4693916
    Abstract: A method of depositing a silicon dioxide film by bringing a substrate into contact with a hydrosilicofluoric acid solution supersaturated with silicon dioxide by the addition of an additive to deposit silicon dioxide film on the surface of the substrate, wherein the additive is at least one compound selected from the group consisting of an aluminum compound, a calcium compound, a magnesium compound, a barium compound, a nickel compound, a cobalt compound, a zinc compound, and a copper compound, and/or a metal or metals.
    Type: Grant
    Filed: July 7, 1986
    Date of Patent: September 15, 1987
    Assignee: Nippon Sheet Glass Co., Ltd.
    Inventors: Hirotsugu Nagayama, Hisao Honda, Hideo Kawahara
  • Patent number: 4468420
    Abstract: A method for making a silicon dioxide coating on a surface of a substrate such as, for example, an alkali metal-containing glass sheet by dipping the substrate in a treatment liquid obtained by adding boric acid to an aqueous silicon dioxide-saturated solution of hydrosilicofluoric acid.
    Type: Grant
    Filed: October 3, 1983
    Date of Patent: August 28, 1984
    Assignee: Nippon Sheet Glass Co., Ltd.
    Inventors: Hideo Kawahara, Hirotsugu Nagayama, Hisao Honda