Patents by Inventor Hiroyuki Ando

Hiroyuki Ando has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240155952
    Abstract: Embodiments of present invention provide a method of forming a resistive random-access memory (RRAM). The method includes forming a dielectric layer on top of a supporting structure, wherein the dielectric layer has a bottom electrode embedded therein; forming an oxide layer on top of the bottom electrode; treating the oxide layer in a plasma environment; forming a top electrode on top of the oxide layer; forming a first interlevel-dielectric (ILD) layer on top of the top electrode; forming a via contact and a first metal layer in the first ILD layer, wherein the first metal layer is in contact with the top electrode through the via contact; forming a capping layer on top of the first metal layer through a plasma-enhanced deposition process; and causing formation of one or more filaments in the oxide layer during the plasma-enhanced deposition process. A structure of the RRAM is also provided.
    Type: Application
    Filed: November 4, 2022
    Publication date: May 9, 2024
    Inventors: Takashi Ando, Soon-Cheon Seo, Youngseok Kim, HIROYUKI MIYAZOE
  • Patent number: 11975778
    Abstract: An information processing apparatus disclosed has a controller configured to execute the processing of accepting a request for retrieving a target vehicle body unit that is laid at a specific place, selecting a chassis unit for retrieval from among chassis units in the state separated from any vehicle body unit, the chassis unit for retrieval being a chassis unit to be used to retrieve the target vehicle body unit, and sending a retrieval command to the chassis unit for retrieval, the retrieval command being a command to retrieve the target vehicle body unit.
    Type: Grant
    Filed: February 3, 2021
    Date of Patent: May 7, 2024
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Katsuhisa Yoshikawa, Yuji Suzuki, Keita Yamazaki, Kei Matsumoto, Hiroyuki Ito, Takashi Ogawa, Yukiya Sugiyama, Masaru Ando, Yasushi Fujiwara, Azusa Nakagame, Erina Toyama
  • Patent number: 11974587
    Abstract: The present invention provides a water-containing foam-containing chocolate containing 16 wt % or more and 55 wt % or less of water, the water-containing foam-containing chocolate having new texture that is smooth, fluffy, and soft even in a freezing temperature range and having processability at room temperature and an excellent shape retention property at room temperature and in the freezing temperature range.
    Type: Grant
    Filed: April 24, 2019
    Date of Patent: May 7, 2024
    Assignee: LOTTE CO., LTD.
    Inventors: Hiroyuki Takamatsu, Yoko Ichimasa, Shoko Ando, Etsumi Abe
  • Patent number: 11965499
    Abstract: A motor includes: a central shaft; a stator extending in an axial direction around the central shaft; a rotor facing an outer side in a radial direction of the stator and configured to rotate around the central shaft; a substrate located on one side in the axial direction with respect to the rotor and on which a rotation position detection circuit detecting a rotation position of the rotor is mounted; and a case located on one side in the axial direction with respect to the substrate and supporting the stator. The stator includes a restricting portion restricting a position in a circumferential direction of the substrate. The case includes a fixing portion fixing the substrate. The substrate includes a restricted portion whose position in the circumferential direction is restricted by the restricting portion, and a fixed portion fixed to the fixing portion.
    Type: Grant
    Filed: January 27, 2022
    Date of Patent: April 23, 2024
    Assignee: Max Co., Ltd.
    Inventors: Hiroyuki Tanaka, Takashi Ando, Tomohide Tsutsui, Hisami Oguri
  • Patent number: 11956975
    Abstract: Structures and methods are provided for integrating a resistance random access memory (ReRAM) in a back-end-on-the-line (BEOL) fat wire level. In one embodiment, a ReRAM device area contact structure is provided in the BEOL fat wire level that has at least a lower via portion that contacts a surface of a top electrode of a ReRAM device area ReRAM-containing stack. In other embodiments, a tall ReRAM device area bottom electrode is provided in the BEOL fat wire level and embedded in a dielectric material stack that includes a dielectric capping layer and an interlayer dielectric material layer.
    Type: Grant
    Filed: September 16, 2021
    Date of Patent: April 9, 2024
    Assignee: International Business Machines Corporation
    Inventors: Soon-Cheon Seo, Dexin Kong, Takashi Ando, Paul Charles Jamison, Hiroyuki Miyazoe, Youngseok Kim, Nicole Saulnier, Vijay Narayanan, Iqbal Rashid Saraf
  • Patent number: 11954546
    Abstract: Provided is a structure for individual authentication in which a pillar pattern region including a plurality of nanopillars formed of synthetic quartz glass is formed on at least a part of a surface portion of a synthetic quartz glass substrate. In the pillar pattern region, the nanopillars have an indentation elastic modulus of 35 to 100 GPa as measured by a nanoindentation method, and the nanopillars are plastically deformed.
    Type: Grant
    Filed: May 25, 2021
    Date of Patent: April 9, 2024
    Assignees: SHIN-ETSU CHEMICAL CO., LTD., TOHOKU UNIVERSITY
    Inventors: Masao Ando, Hiroyuki Yamazaki, Masaki Takeuchi, Masaru Nakagawa, Shunya Ito
  • Patent number: 11922650
    Abstract: It is possible to estimate a slack level accurately in consideration of a shape of a deformed cable. A point cloud analysis device sets a plurality of regions of interest obtained by window-searching a wire model including a quadratic curve model representing a cable obtained from a point cloud consisting of three-dimensional points on an object, the region of interest being divided into a first region and a second region.
    Type: Grant
    Filed: May 8, 2019
    Date of Patent: March 5, 2024
    Assignee: NIPPON TELEGRAPH AND TELEPHONE CORPORATION
    Inventors: Hitoshi Niigaki, Masaki Waki, Masaaki Inoue, Yasuhiro Yao, Tomoya Shimizu, Hiroyuki Oshida, Kana Kurata, Shingo Ando, Atsushi Sagata
  • Publication number: 20240074207
    Abstract: A semiconductor device includes a ferroelectric random-access memory (FeRAM) cell. The FeRAM includes a ferroelectric dielectric that is annealed to attain its ferroelectric phase by an induced current flow and heating process. The current flow may be induced though a temporary wire that causes heating of the FeRAM cell. The resulting heating or anneal of the ferroelectric dielectric may crystalize the ferroelectric dielectric to embody or result in having ferroelectric properties. The induced current flow and heating process is substantially local to the FeRAM cell, and to ferroelectric dielectric therein, as opposed to a global heating or annealing process in which the entire semiconductor device, or a relatively larger region of semiconductor device, is heated to the requisite annealing temperature of ferroelectric dielectric.
    Type: Application
    Filed: August 25, 2022
    Publication date: February 29, 2024
    Inventors: Nanbo Gong, Takashi Ando, Guy M. Cohen, HIROYUKI MIYAZOE
  • Patent number: 11915926
    Abstract: A porous thin film includes a framework that includes a plurality of pores. The pores extend from an opening located at an upper surface of the framework to a bottom surface contained in the framework. A pore-coating film is formed on sidewalls and the bottom surface of the pores.
    Type: Grant
    Filed: September 27, 2021
    Date of Patent: February 27, 2024
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Leonidas Ernesto Ocola, Eric A. Joseph, Hiroyuki Miyazoe, Takashi Ando, Damon Brooks Farmer
  • Publication number: 20230290888
    Abstract: Provided is a semiconductor element including at least, a semiconductor layer including a crystalline oxide semiconductor as a major component; an electrode layer laminated on the semiconductor layer; and a conductive substrate laminated on the electrode layer directly or with another layer in between, the conductive substrate containing at least a first metal selected from the metals in group 11 in the periodic table and a second metal different from the first metal in coefficient of liner thermal expansion.
    Type: Application
    Filed: February 6, 2023
    Publication date: September 14, 2023
    Inventors: Hideaki YANAGIDA, Shogo MIZUMOTO, Hiroyuki ANDO, Yusuke MATSUBARA
  • Publication number: 20230253462
    Abstract: Provided is a crystalline oxide film including: a plane tilted from a c-plane as a principal plane; gallium; and a metal in Group 9 of the periodic table, the metal in Group 9 of the periodic table among all metallic elements in the film having an atomic ratio of equal to or less than 23%.
    Type: Application
    Filed: February 9, 2023
    Publication date: August 10, 2023
    Inventors: Takashi SHINOHE, Hiroyuki ANDO, Yasushi HIGUCHI, Shinpei MATSUDA, Kazuya TANIGUCHI, Hiroki WATANABE, Hideo MATSUKI
  • Patent number: 11718181
    Abstract: A vehicle includes a regenerative generator on a front wheel. A braking control device includes an actuator that applies a front wheel torque and a rear wheel torque, and a controller that individually adjusts the front wheel torque and the rear wheel torque. The controller is configured to determine the front wheel torque and the rear wheel torque to zero when a regenerative braking force Fg generated by the regenerative generator has not reached a maximum regenerative force Fx which is a generatable maximum value. On the other hand, the controller is configured to increase the rear wheel torque from zero before increasing the front wheel torque from zero when the regenerative braking force Fg reaches the maximum regenerative force Fx.
    Type: Grant
    Filed: February 5, 2019
    Date of Patent: August 8, 2023
    Assignee: ADVICS CO., LTD.
    Inventors: Takayuki Yamamoto, Hiroyuki Kodama, Hiroyuki Ando
  • Publication number: 20230207541
    Abstract: Provided is a semiconductor device including, a plurality of PN junction diodes each having a negative temperature characteristic and connected to each other in series; a plurality of resistance elements connected respectively to the PN junction diodes in parallel and connected to each other in series; and a Schottky barrier diode having a positive temperature characteristic and connected to the PN junction diodes in parallel.
    Type: Application
    Filed: February 17, 2023
    Publication date: June 29, 2023
    Inventors: Hideaki YANAGIDA, Takashi SHINOHE, Hiroyuki ANDO, Yusuke MATSUBARA, Hidehito KITAKADO
  • Publication number: 20230207431
    Abstract: Provided is a semiconductor device including, a plurality of PN junction diodes each having a negative temperature characteristic and connected to each other in series; a Schottky barrier diode having a positive temperature characteristic and connected to the PN junction diodes in parallel; and a die pad on which at least one of the PN junction diodes and the Schottky barrier diode are mounted commonly.
    Type: Application
    Filed: February 17, 2023
    Publication date: June 29, 2023
    Inventors: Hideaki YANAGIDA, Takashi SHINOHE, Hiroyuki ANDO, Yusuke MATSUBARA, Hidehito KITAKADO
  • Patent number: 11666889
    Abstract: Provided is a powder inorganic oxide containing Al, Ce and Zr as constituent elements, that affords a molded product with a density of 1.0 to 1.3 g/ml by placing 4.0 g of the inorganic oxide in a cylindrical container having diameter 20 mm and performing uniaxial molding under conditions of room temperature and pressure of 29.4 MPa for 30 sec., and achieves an average shrinkage percentage of not more than 14.0% as calculated by the following formula: average shrinkage percentage (%)=100×{(1?(c)/(a))+(1?(d)/(b))}/2 wherein each symbol is as defined in the DESCRIPTION.
    Type: Grant
    Filed: February 15, 2019
    Date of Patent: June 6, 2023
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yoshitaka Kawakami, Hiroyuki Ando
  • Patent number: 11578000
    Abstract: Provided is alumina material comprising alumina and zirconium, wherein in a radial distribution function obtained by Fourier-transforming an extended X-ray absorption fine structure (EXAFS) spectrum of a K absorption edge of the zirconium in the alumina material, the value of IB/IA is 0.5 or less where IA is a maximum intensity among the intensities of peaks present at 0.1 nm to 0.2 nm, and IB is a maximum intensity among the intensities of peaks present at 0.28 nm to 0.35 nm.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: February 14, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yoshitaka Kawakami, Hiroyuki Ando
  • Patent number: D1016031
    Type: Grant
    Filed: July 14, 2021
    Date of Patent: February 27, 2024
    Assignee: Mitsubishi Electric Corporation
    Inventors: Hiroyuki Kato, Yorimasa Yasuda, Satoru Kozuka, Hideaki Yamamoto, Nichika Moriguchi, Keisuke Tada, Kenichi Oi, Masaaki Kadoyanagi, Toshio Nakayama, Shinichiro Ando, Akihiro Gonda
  • Patent number: D1016032
    Type: Grant
    Filed: July 23, 2021
    Date of Patent: February 27, 2024
    Assignee: Mitsubishi Electric Corporation
    Inventors: Hiroyuki Kato, Yorimasa Yasuda, Satoru Kozuka, Hideaki Yamamoto, Nichika Moriguchi, Keisuke Tada, Kenichi Oi, Masaaki Kadoyanagi, Toshio Nakayama, Shinichiro Ando, Akihiro Gonda
  • Patent number: D1016033
    Type: Grant
    Filed: July 23, 2021
    Date of Patent: February 27, 2024
    Assignee: Mitsubishi Electric Corporation
    Inventors: Hiroyuki Kato, Yorimasa Yasuda, Satoru Kozuka, Hideaki Yamamoto, Nichika Moriguchi, Keisuke Tada, Kenichi Oi, Masaaki Kadoyanagi, Toshio Nakayama, Shinichiro Ando, Akihiro Gonda
  • Patent number: D1020742
    Type: Grant
    Filed: December 29, 2021
    Date of Patent: April 2, 2024
    Assignee: Mitsubishi Electric Corporation
    Inventors: Hiroyuki Kato, Hiroyuki Onojima, Kazuma Takahata, Takashi Ando, Mitsuhiro Yamada, Atsutomo Hayamizu