Abstract: In a chamber, first processing is performed as preliminary processing. After the first processing has been finished, the temperature in a predetermined target region in the chamber is measured with a thermographic camera. Then, whether or not to start second processing on a substrate is determined in accordance with the acquired measured temperature information. If it is determined as a result that the second processing can be started, the second processing is performed. In this case, the second processing on the substrate can be started, with the temperature of the target region in the chamber having reached its stability. Accordingly, the second processing can be performed uniformly on a plurality of substrates. That is, it is possible to reduce variations in processing caused by temperature environments in the chamber.

Abstract: A determination value calculated based on a distance from a work point of a tip of robot arm (10) to virtual straight line (30) passing through an axis of second joint (J2) and an axis of third joint (J3) is compared with a predetermined threshold. A method of calculating deflection compensation amounts for second joint (J2) and third joint (J3) is changed depending on whether the determination value is larger or smaller than the threshold. Second joint (J2) and third joint (J3) are caused to pivot based on the calculated deflection compensation amounts.

Abstract: An information management method according to an aspect of the present disclosure includes disclosing, by a computer, a second parameter obtained by irreversibly converting a first parameter and disclosing, by the computer, the first parameter simultaneously with disclosing the second parameter or after disclosing the second parameter.

Abstract: A sliding component includes at least one of a pair of sliding members and provided with: a group of recessed portions including a plurality of recessed portions formed in a sliding surface of the sliding member; and a plurality of hollow portions formed inside the sliding member and out of alignment with the recessed portions in a thickness direction of the sliding member. The sliding member is further provided with the hollow portions disposed so as to generate at least part of a new group of recessed portions until the sliding member is worn by the thickness of deepest one of the recessed portions.

Abstract: A processing apparatus includes a processing unit, a control unit, and a temperature detecting unit. The processing unit includes a cutting blade and a spindle assembly, the spindle assembly including a spindle having the cutting blade mounted on a distal end of the spindle and a spindle housing through which the spindle is inserted. A cooling fluid passage is formed in the spindle housing, the cooling fluid passage cooling the spindle assembly, and having one end connected to a cooling fluid supply source and having another end communicating with a cooling fluid outlet of the spindle housing. The temperature detecting unit detects the temperature of the spindle housing. The control unit determines whether a state of cooling of the spindle assembly is normal or abnormal on the basis of the temperature detected by the temperature detecting unit.

Abstract: A semiconductor device includes a syndrome generation circuit configured to generate a syndrome code based on data and an error correction code corresponding to the data, an error determination circuit configured to detect a 1-bit error in the data based on the syndrome code, and multi-bit error detection circuit configured to determine whether the data detected to have 1-bit error includes a multi-bit error by using an error address of the data detected to have 1-bit error and an error syndrome code of the data detected to have 1-bit error.

Abstract: Low-torque sliding components have sliding surfaces rotated relative to each other with an annular mating ring and an annular seal ring facing each other. The sliding surface of at least one of the mating ring and the seal ring has therein a plurality of multi-stepped recess portions formed in a circumferential direction. Relative rotation and sliding of the mating ring and the seal ring causes the multi-stepped recess portions to generate a dynamic pressure, and the multi-stepped recess portion is formed in a stepwise shape in a cross-sectional view by a dynamic pressure recess portion and a static pressure recess portion with the dynamic pressure recess portion surrounding the static pressure recess portion deeper than the dynamic pressure recess portion.

Abstract: A semiconductor device includes a syndrome generation circuit configured to generate a syndrome code based on data and an error correction code corresponding to the data, an error determination circuit configured to detect a 1-bit error in the data based on the syndrome code, and multi-bit error detection circuit configured to determine whether the data detected to have 1-bit error includes a multi-bit error by using an error address of the data detected to have 1-bit error and an error syndrome code of the data detected to have 1-bit error.

Abstract: The present invention relates to a process for the decontamination of radioactively contaminated material comprising the steps of a) providing radioactively contaminated material in a decontamination bath (200), b) providing a reactor unit (107) comprising a first reactor chamber (102) connected to a second reactor chamber (103), c) electrolyzing water with a ph>7 in the first reactor chamber (102) and generating (H3O2)n, d) generating nanobubbles in the electrolyzed water of the second reactor chamber (103), e) optionally repeating steps c) and d), f) applying pressure to the water which contains nanobubbles, g) transferring the pressurized water which contains nanobubbles to a decontamination bath (200) containing an ?-ray generator and the radioactively contaminated materiel, h) charging the nanobubbles with the ?-particles emitted by the ?-ray generator, and i) bringing the charged nanobubbles in contact with the radioactively contaminated material in the decontamination bath (200).

Abstract: A heat measurement device includes: a high-heat portion disposed on a first end portion in the power storage device; a low-heat portion disposed on a second end portion in the power storage device; a first temperature sensor disposed on the first end portion in the power storage device; a second temperature sensor disposed on the second end portion in the power storage device; and a cover member that is provided to cover at least a portion of a side surface of the power storage device located between the first end portion and the second end portion and that holds the power storage device. The cover member includes an inner surface facing the side surface of the power storage device, and a rib that protrudes from the inner surface and that is in abutment with the side surface of the power storage device.

Abstract: Low-torque sliding components have sliding surfaces rotated relative to each other with an annular mating ring and an annular seal ring facing each other. The sliding surface of at least one of the mating ring and the seal ring has therein a plurality of multi-stepped recess portions formed in a circumferential direction. Relative rotation and sliding of the mating ring and the seal ring causes the multi-stepped recess portions to generate a dynamic pressure, and the multi-stepped recess portion is formed in a stepwise shape in a cross-sectional view by a dynamic pressure recess portion and a static pressure recess portion with the dynamic pressure recess portion surrounding the static pressure recess portion deeper than the dynamic pressure recess portion.

Abstract: Low-torque sliding components have sliding surfaces rotated relative to each other with an annular mating ring and an annular seal ring facing each other. The sliding surface of at least one of the mating ring and the seal ring has therein a plurality of multi-stepped recess portions formed in a circumferential direction. Relative rotation and sliding of the mating ring and the seal ring causes the multi-stepped recess portions to generate a dynamic pressure, and the multi-stepped recess portion is formed in a stepwise shape in a cross-sectional view by a dynamic pressure recess portion and a static pressure recess portion with the dynamic pressure recess portion surrounding the static pressure recess portion deeper than the dynamic pressure recess portion.

Abstract: A sliding component includes at least one of a pair of sliding members and provided with: a group of recessed portions including a plurality of recessed portions formed in a sliding surface of the sliding member; and a plurality of hollow portions formed inside the sliding member and out of alignment with the recessed portions in a thickness direction of the sliding member. The sliding member is further provided with the hollow portions disposed so as to generate at least part of a new group of recessed portions until the sliding member is worn by the thickness of deepest one of the recessed portions.

Abstract: A processing apparatus includes a processing unit. The processing unit includes a spindle, a spindle housing having an air bearing for rotatably supporting the spindle by using air, and a tool mounted on the front end of the spindle. The spindle housing has an air supply passage for supplying air to the air bearing, an air supply port connected to the air supply passage, an air discharge passage, and an air discharge port. The air supply port is connected through an air supply line to an air source. The air supply line is provided with a pressure gauge and a flowmeter. A first allowable value is previously set for the pressure to be detected by the pressure gauge, and a second allowable value is previously set for the flow rate to be detected by the flowmeter.

Abstract: A method of forming a silicon film on a substrate having a fine pattern includes performing surface treatment with an adhesion promoter on the substrate having the fine pattern, forming a coating film by applying a silane polymer solution to the substrate on which the surface treatment has been performed, and heating the coating film.

Abstract: A medical manipulator system including: a placement table on which a patient is placed; at least one manipulator configured to support a treatment tool which is configured to treat the patient, the manipulator configured to adjust a position and an orientation of the treatment tool; a base portion configured to support the manipulator; a sensor configured to detect objects which are present in a predetermined area including the manipulator and the placement table; and a controller including at least one processor, wherein the processor is configured to: calculate degrees of proximity between the objects detected by the sensor and the manipulator, and generate, in case that the calculated degrees of proximity exceed a predetermined threshold, a control signal for preventing interference between the objects and the manipulator.

Abstract: There is provided a method of fabricating a semiconductor device by performing a process on a substrate, which includes: forming a masking film made of a polymer having a urea bond by supplying polymerizing raw materials to a surface of the substrate on which an etching target film formed; forming an etching pattern on the masking film; subsequently, etching the etching target film with a processing gas using the etching pattern; and subsequently, removing the masking film by heating the substrate to depolymerize the polymer.

Abstract: An electronic apparatus connectable with an external apparatus includes: a communication unit which communicates with the external apparatus; an interface where a plurality of devices can be connected; and a control unit which controls plug and play for a device connected to the interface. The control unit does not cause the external apparatus to execute plug and play accompanying the connection between the electronic apparatus and the external apparatus when a first device is connected to the interface, the first device is not a specific type. The control unit causes the external apparatus to execute plug and play accompanying the connection between the electronic apparatus and the external apparatus when a second device is connected to the interface, the second device is the specific type.

Abstract: A power generation planning system for controlling on/off sequence of generators according to operational parameters includes an interface to receive the operational parameters including a power demand, state-data of the generators and operational histories of the generators from a power control system, a memory to store an objective function, a mixed-integer programming solver, generator parameters of each the generators and planning modules including a state-space representation module, a variable assignment module, a network flow module and a tight constraint module, a processor to perform the planning modules based on the operational parameters received by the interface.

Abstract: A film forming apparatus includes: a film forming gas discharge part; an exhaust port; a rotation mechanism; a heating part configured to heat the interior of a reaction container to a temperature lower than a temperature of a film forming gas discharged from the film forming gas discharge part; first gas discharge holes opened, in the film forming gas discharge part, toward a gas temperature reducing member so that the film forming gas is cooled by colliding with the gas temperature reducing member inside the reaction container before the film forming gas is supplied to substrates; and second gas discharge holes opened, in the film forming gas discharge part, in a direction differing from an opening direction of the first gas discharge holes so that the film forming gas does not collide with the gas temperature reducing member before the film forming gas is supplied to the substrates.