Abstract: In one embodiment, there are provided: a substrate; a data area disposed on the substrate and having a plurality of first magnetic dots arrayed in lines in mutually different first, second, and third directions; and a boundary magnetic part having a plurality of first magnetic portions arrayed in a line in the third direction and each having a length longer than that of the first magnetic dot in the third direction, and a second magnetic dot disposed between the first magnetic portions and disposed on extensions in the first and second directions of the first magnetic dots, and disposed along with the data area on the substrate.

Abstract: According to one embodiment, a magnetic recording medium includes a data region and a servo region adjacent to the data region and including a magnetic recording layer, the magnetic recording layer including first and second patterned regions adjacent to each other, the first patterned region including a first nonmagnetic matrix and first magnetic particles dispersed in the first nonmagnetic matrix and having magnetization oriented in a first direction, the second patterned region includes a second nonmagnetic matrix and second magnetic particles dispersed in the second nonmagnetic matrix and having magnetization oriented in a second direction opposite to the first direction, sizes of the first magnetic particles being smaller than sizes of the second magnetic particles.

Abstract: In one embodiment, there are provided: a substrate; a data area disposed on the substrate and having a plurality of first magnetic dots arrayed in lines in mutually different first, second, and third directions; and a boundary magnetic part having a plurality of first magnetic portions arrayed in a line in the third direction and each having a length longer than that of the first magnetic dot in the third direction, and a second magnetic dot disposed between the first magnetic portions and disposed on extensions in the first and second directions of the first magnetic dots, and disposed along with the data area on the substrate.

Abstract: A self-assembled pattern forming method in an embodiment includes: forming a guide pattern on a substrate; forming a layer of a first polymer; filling a first block copolymer; and phase-separating the first block copolymer. The guide pattern includes a first recessed part having a depth T and a diameter D smaller than the depth T, and a second recessed part having a width larger than double of the diameter D. The first block copolymer has the first polymer and a second polymer which are substantially the same in volume fraction. By phase-separating the first block copolymer, a cylinder structure and a lamellar structure are obtained.

Abstract: In one embodiment, there are provided: a substrate; a data area disposed on the substrate and having a plurality of first magnetic dots arrayed in lines in mutually different first, second, and third directions; and a boundary magnetic part having a plurality of first magnetic portions arrayed in a line in the third direction and each having a length longer than that of the first magnetic dot in the third direction, and a second magnetic dot disposed between the first magnetic portions and disposed on extensions in the first and second directions of the first magnetic dots, and disposed along with the data area on the substrate.

Abstract: In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.

Abstract: A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.

Abstract: In one embodiment, a pattern forming method includes: forming a functional layer having a functional group to cross-link a first polymer on a substrate; forming a diblock copolymer layer having the first polymer and a second polymer on the functional layer; self-assembling the diblock copolymer layer to form a self-assembled layer, the self-assembled layer having a first domain corresponding to the first polymer, and a plurality of second domains corresponding to the second polymer and surrounded by or interposed in the first domain; cross-linking the first polymer in the self-assembled layer with the functional group in the functional layer to form a bonding layer disposed in the self-assembled layer and bonded to the functional layer; and washing or etching the self-assembled layer to remain the bonding layer.

Abstract: A method for manufacturing a patterned medium of an embodiment includes forming a perpendicular magnetic recording layer on a substrate, forming a mask on the perpendicular magnetic recording layer, milling the perpendicular magnetic recording layer, and depositing a protective layer on the perpendicular magnetic recording layer. The perpendicular magnetic recording layer includes a first element selected from Fe and Co and a second element selected from Pt and Pd, and has a hard magnetic alloy material having an L10 or L11 structure. A temperature of the substrate during the milling is higher than or equal to 250° C. and lower than or equal to 500° C.

Abstract: A self-assembled pattern forming method in an embodiment includes: forming a guide pattern on a substrate; forming a layer of a first polymer; filling a first block copolymer; and phase-separating the first block copolymer. The guide pattern includes a first recessed part having a depth T and a diameter D smaller than the depth T, and a second recessed part having a width larger than double of the diameter D. The first block copolymer has the first polymer and a second polymer which are substantially the same in volume fraction. By phase-separating the first block copolymer, a cylinder structure and a lamellar structure are obtained.

Abstract: In one embodiment, there are provided: a substrate; a data area disposed on the substrate and having a plurality of first magnetic dots arrayed in lines in mutually different first, second, and third directions; and a boundary magnetic part having a plurality of first magnetic portions arrayed in a line in the third direction and each having a length longer than that of the first magnetic dot in the third direction, and a second magnetic dot disposed between the first magnetic portions and disposed on extensions in the first and second directions of the first magnetic dots, and disposed along with the data area on the substrate.

Abstract: A magnetic recording medium of an embodiment includes: a substrate; a nonmagnetic base layer disposed on the substrate; a perpendicular magnetic recording layer disposed on the nonmagnetic base layer, having a hard magnetic recording layer, a nonmagnetic intermediate layer, and a soft magnetic recording layer, and divided into mutually separated plural regions; and a protective layer disposed on the perpendicular magnetic recording layer. The hard magnetic recording layer has an easy magnetization axis directed to a stack direction of the hard magnetic recording layer. The nonmagnetic intermediate layer contains one of C, ZnO, a carbide of Si, Ti, Ta or W, and a nitride of Si, Ti, Ta or W.

Abstract: In one embodiment, a pattern forming method includes: forming a functional layer having a functional group to cross-link a first polymer on a substrate; forming a diblock copolymer layer having the first polymer and a second polymer on the functional layer; self-assembling the diblock copolymer layer to form a self-assembled layer, the self-assembled layer having a first domain corresponding to the first polymer, and a plurality of second domains corresponding to the second polymer and surrounded by or interposed in the first domain; cross-linking the first polymer in the self-assembled layer with the functional group in the functional layer to form a bonding layer disposed in the self-assembled layer and bonded to the functional layer; and washing or etching the self-assembled layer to remain the bonding layer.

Abstract: According to one embodiment, a magnetic recording medium includes a data region and a servo region adjacent to the data region and including a magnetic recording layer, the magnetic recording layer including first and second patterned regions adjacent to each other, the first patterned region including a first nonmagnetic matrix and first magnetic particles dispersed in the first nonmagnetic matrix and having magnetization oriented in a first direction, the second patterned region includes a second nonmagnetic matrix and second magnetic particles dispersed in the second nonmagnetic matrix and having magnetization oriented in a second direction opposite to the first direction, sizes of the first magnetic particles being smaller than sizes of the second magnetic particles.

Abstract: A simulation method includes obtaining an execution log generated while a predetermined processing is executed by simulating a series of operations in a test model that is a modeled version of a test target device by causing a predetermined processing to be executed in the test model, extracting a processing unit log constituted by a predetermined processing unit from the execution log obtained in the obtaining, and simulating an operation in which processing corresponding to the processing unit log extracted in the extracting is executed in a test model in which a part of function of the test target device is modified, the operation being simulated on the basis of a setting condition set by a user.

Abstract: A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.

Abstract: In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.

Abstract: A magnetic recording medium includes a disk substrate, and recording cells arrayed on the disk substrate in a track direction, the recording cells includes a ferromagnetic pattern and a magnetic pattern formed on one of two sidewalls of the ferromagnetic pattern in the track direction and having a lower crystalline magnetic anisotropy constant Ku than that of the ferromagnetic pattern.

Abstract: The present invention relates to a technique for executing performance evaluation simulation of a system to be implemented by software or hardware. A simulation apparatus includes a first acquisition section for executing existing tentative software to acquire a first execution log, a division section for dividing the first execution log into a plurality of basic processing units, a basic processing execution log production section for modifying some of the plural basic processing units to produce a basic processing execution log to be used for simulation, and a simulation execution section for inputting the basic processing execution log to a hardware model to execute the simulation to acquire information required for the performance evaluation.

Abstract: A performance evaluation simulation apparatus divides a process into basic process units based on an execution log, calculates a throughput of each basic process unit from information held in the execution log, changes an arrangement structure so that a basic process unit with the calculated throughput exceeding a predetermined threshold is disposed in a hardware model, and performs a performance evaluation simulation on the hardware model and a software model to generate statistical information on which performance evaluation is based.