Patents by Inventor Hiroyuki Kawasaki
Hiroyuki Kawasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240143958Abstract: The present invention includes: an identification code generation unit that generates, from information of a company code including a first code that uniquely identifies a management target in a part of a company in the part of the company and a second code that identifies the part of the company, an identification code including a history of the management target; a hash processing unit that hashes the identification code generated by the identification code generation unit according to a hash function and converts the hashed identification code into a meaningless code; and a reference code generation unit that generates a reference code unified for the entire company based on the meaningless code converted by the hash processing unit.Type: ApplicationFiled: February 25, 2022Publication date: May 2, 2024Inventors: Tomohisa KOHIYAMA, Sadao SATOU, Atsushi SAGARA, Yoshiyasu WATANABE, Hideaki YOKOTA, Kazuaki IKARASHI, Hiroyuki KAWASAKI, Katsunori MAEDA, Keigo FUJIWARA, Kazunobu HISATSUNE
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Publication number: 20240119502Abstract: An information notification device includes a longitudinal-data storage unit that accumulates, for a plurality of samples, longitudinal data indicating a temporal change in foot size of one sample, a user-data storage unit that stores user data containing a gender, an age, and a past foot size of a prediction target person, a foot-size prediction unit that predicts, based on a current foot size of the prediction target person and the longitudinal data, a change in foot size of the prediction target person in a period from a current point in time to a future point in time, and a notification processing unit that displays, on a display unit, the prediction of the change in foot size of the prediction target person in the period from the current point in time to the future point in time.Type: ApplicationFiled: February 16, 2022Publication date: April 11, 2024Applicant: ASICS CORPORATIONInventors: Ken KUSANO, Ippei SHIINA, Masaru ICHIKAWA, Hiroyuki KUSUMI, Toshiaki KAWASAKI
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Publication number: 20240111358Abstract: An information processing apparatus including circuitry that acquires information indicating a spatial relationship between a real object and a virtual object, and initiate generation of a user feedback based on the acquired information, the user feedback being displayed to be augmented to a generated image obtained based on capturing by an imaging device, or augmented to a perceived view of the real world, and wherein a characteristic of the user feedback is changed when the spatial relationship between the real object and the virtual object changes.Type: ApplicationFiled: December 6, 2023Publication date: April 4, 2024Inventors: ATSUSHI ISHIHARA, TSUYOSHI ISHIKAWA, HIROYUKI AGA, KOICHI KAWASAKI, MITSURU NISHIBE, YUJI KUSANO
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Patent number: 11929579Abstract: An electrical connector contains a first contact group arranged on a first contact plane, a second contact group arranged on a second contact plane and a ground plate located on a ground plane. The ground plate is located between horizontally extending portions of the contacts of the first contact group and horizontally extending portions, downwardly extending portions and terminal portions of the contacts of the second contact group in addition to between contacting portions and the horizontally extending portions of the contacts of the first contact group and contacting portions and the horizontally extending portions of the contacts of the second contact group.Type: GrantFiled: April 20, 2023Date of Patent: March 12, 2024Assignee: MITSUMI ELECTRIC CO., LTD.Inventors: Takashi Kawasaki, Hiroyuki Sadohara, Taro Mizue
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Patent number: 11835047Abstract: The present invention relates to a pump apparatus for delivering a liquid. The pump apparatus includes a pump (1) having an impeller (5), an electric motor (7) for rotating the impeller (5), and an inverter (10) for driving the electric motor (7) at variable speed. The impeller (5) has a non-limit load characteristic in a predetermined discharge flow-rate range (R). The inverter (10) is configured to drive the electric motor (7) at a preset target operating point (TO) with a rotation speed higher than a rotation speed corresponding to a power frequency of a commercial power source.Type: GrantFiled: June 10, 2020Date of Patent: December 5, 2023Assignee: Ebara CorporationInventors: Hiroyuki Kawasaki, Takayuki Miyamoto, Miwa Hidekura, Hoechun Kim, Satoshi Yamazaki, Xinshuai Fan
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Publication number: 20220333615Abstract: A vertical multi-stage pump includes a rotation shaft extending in a vertical direction, a plurality of impellers fixed to the rotation shaft, a multi-stage pump chamber accommodating the plurality of impellers and comprising a suction port for a first-stage impeller at a lower end, a lower casing comprising a suction nozzle extending in a horizontal direction and forming a communication space communicating the suction nozzle and the suction port, and an inner cylinder member interposed between the multi-stage pump chamber and a lower casing and expanding the communication space in a vertical direction.Type: ApplicationFiled: September 25, 2020Publication date: October 20, 2022Inventors: Masaki WATANABE, Hiroyuki KAWASAKI, Shuyu HSU
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Publication number: 20220290675Abstract: The present invention relates to a pump apparatus for delivering a liquid. The pump apparatus includes a pump (1) having an impeller (5), an electric motor (7) for rotating the impeller (5), and an inverter (10) for driving the electric motor (7) at variable speed. The impeller (5) has a non-limit load characteristic in a predetermined discharge flow-rate range (R). The inverter (10) is configured to drive the electric motor (7) at a preset target operating point (TO) with a rotation speed higher than a rotation speed corresponding to a power frequency of a commercial power source.Type: ApplicationFiled: June 10, 2020Publication date: September 15, 2022Applicant: Ebara CorporationInventors: Hiroyuki KAWASAKI, Takayuki MIYAMOTO, Miwa HIDEKURA, Hoechun KIM, Satoshi YAMAZAKI, Xinshuai FAN
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Patent number: 11441576Abstract: The present invention relates to a reinforcing structure for a casing accommodating an impeller. A double-suction centrifugal pump includes: a rotational shaft (1); an impeller (2) secured to the rotational shaft (1); a casing (3) that accommodates the impeller (2) therein; and legs (5) secured to the casing (3). The casing (3) includes a suction volute (20) that communicates with a suction port (6), the casing (3) includes an upper casing (3a) and a lower casing (3b) fastened to each other, at least one rib (28A, 28B, 28C) is provided on each of both side surfaces of the lower casing (3b) constituting the suction volute (20), the rib (28A, 28B, 28C) extends in a radial direction of the rotational shaft (1) when viewed from an axial direction of the rotational shaft (1), and the rib (28A, 28B, 28C) is separated from the legs (5).Type: GrantFiled: May 29, 2019Date of Patent: September 13, 2022Assignee: EBARA CORPORATIONInventors: Soichiro Ogawa, Hiroyuki Kawasaki, Takayuki Miyamoto
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Patent number: 11192147Abstract: A substrate processing apparatus removes foreign substances from a substrate at high removal efficiency. The substrate processing apparatus includes: a scrubber to perform surface processing of the substrate by bringing a scrubbing member into sliding contact with a first surface of the substrate, a hydrostatic support mechanism for supporting a second surface of the substrate via fluid pressure without contacting the substrate, the second surface being an opposite surface of the first surface, a cleaner to clean the processed substrate, and a dryer to dry the cleaned substrate. The scrubber brings the scrubbing member into sliding contact with the first surface while rotating the scrubbing member about a central axis of the scrubber.Type: GrantFiled: May 7, 2019Date of Patent: December 7, 2021Assignee: EBARA CORPORATIONInventors: Yu Ishii, Hiroyuki Kawasaki, Kenichi Nagaoka, Kenya Ito
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Patent number: 11143186Abstract: The present invention relates to a two-stage liquid ring vacuum pump in which two-stage impellers are attached to an axial end portion of a main shaft (rotating shaft) of a motor. The two-stage liquid ring vacuum pump includes a first-stage impeller (4) provided in a first-stage pump chamber (1), a second-stage impeller (5) provided in a second-stage pump chamber (2), a single rotating shaft (7) to which the first-stage impeller (4) and the second-stage impeller (5) are fixed, and an exhaust port (Pd) of the first-stage pump chamber (1) and an intake port (Ps) of the second-stage pump chamber (2) which communicate with each other. An outer diameter of the first-stage impeller (4) is larger than an outer diameter of the second-stage impeller (5).Type: GrantFiled: December 8, 2017Date of Patent: October 12, 2021Assignee: Ebara CorporationInventors: Hiroyuki Kawasaki, Nozomu Sasaki
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Publication number: 20210115940Abstract: The present invention relates to a reinforcing structure for a casing accommodating an impeller. A double-suction centrifugal pump includes: a rotational shaft (1); an impeller (2) secured to the rotational shaft (1); a casing (3) that accommodates the impeller (2) therein; and legs (5) secured to the casing (3). The casing (3) includes a suction volute (20) that communicates with a suction port (6), the casing (3) includes an upper casing (3a) and a lower casing (3b) fastened to each other, at least one rib (28A, 28B, 28C) is provided on each of both side surfaces of the lower casing (3b) constituting the suction volute (20), the rib (28A, 28B, 28C) extends in a radial direction of the rotational shaft (1) when viewed from an axial direction of the rotational shaft (1), and the rib (28A, 28B, 28C) is separated from the legs (5).Type: ApplicationFiled: May 29, 2019Publication date: April 22, 2021Inventors: Soichiro OGAWA, Hiroyuki KAWASAKI, Takayuki MIYAMOTO
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Patent number: 10799917Abstract: A substrate processing apparatus removes foreign substances from a substrate at high removal efficiency. The substrate processing apparatus includes: a scrubber to perform surface processing of the substrate by bringing a scrubbing member into sliding contact with a first surface of the substrate, a hydrostatic support mechanism for supporting a second surface of the substrate via fluid pressure without contacting the substrate, the second surface being an opposite surface of the first surface, a cleaner to clean the processed substrate, and a dryer to dry the cleaned substrate. The scrubber brings the scrubbing member into sliding contact with the first surface while rotating the scrubbing member about a central axis of the scrubber.Type: GrantFiled: May 7, 2019Date of Patent: October 13, 2020Assignees: EBARA CORPORATION, Toshiba Memory CorporationInventors: Yu Ishii, Hiroyuki Kawasaki, Kenichi Nagaoka, Kenya Ito, Masako Kodera, Hiroshi Tomita, Takeshi Nishioka
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Publication number: 20200141410Abstract: The present invention relates to a two-stage liquid ring vacuum pump in which two-stage impellers are attached to an axial end portion of a main shaft (rotating shaft) of a motor. The two-stage liquid ring vacuum pump includes a first-stage impeller (4) provided in a first-stage pump chamber (1), a second-stage impeller (5) provided in a second-stage pump chamber (2), a single rotating shaft (7) to which the first-stage impeller (4) and the second-stage impeller (5) are fixed, and an exhaust port (Pd) of the first-stage pump chamber (1) and an intake port (Ps) of the second-stage pump chamber (2) which communicate with each other. An outer diameter of the first-stage impeller (4) is larger than an outer diameter of the second-stage impeller (5).Type: ApplicationFiled: December 8, 2017Publication date: May 7, 2020Applicant: Ebara CorporationInventors: Hiroyuki KAWASAKI, Nozomu SASAKI
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Patent number: 10569369Abstract: A flux-cored wire for gas-shielded arc welding has a steel outer sheath filled with a flux. The flux-cored wire includes specific amounts, relative to a total mass of the wire, of TiO2, at least one of Si, an Si oxide and an Si compound, C, Mn, Mo, Ni, at least one of metal Mg and an Mg alloy, an F compound, a K compound, an Na compound, B and a B compound, and Fe, respectively. A total content of each of Ti and a Ti alloy, metal Al and an Al alloy, and V is restricted to the specific range, respectively. A content of Ti is also restricted to the specific range relative to the total mass of the steel outer sheath.Type: GrantFiled: October 15, 2015Date of Patent: February 25, 2020Assignee: Kobe Steel, Ltd.Inventors: Masafumi Yamakami, Hiroyuki Kawasaki, Masayuki Nagami
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Patent number: 10449637Abstract: Provided is a flux-cored wire with excellent welding workability, AW performance, and SR performance that can use both 100% CO2 gas and Ar—CO2 mixed gas as the shield gas in an initial layer welding for a structure body, particularly, a pipeline. The flux-cored wire with a flux filled into a steel outer sheath, includes, relative to the total mass of the wire: Mn: 1.5 to 3.1% by mass; Ni: 0.2% or more by mass and less than 1.00% by mass; at least one kind of Si, a Si alloy, and a Si oxide: 0.3 to 1.0% by mass in terms of Si; Ti: 0.05 to 0.29% by mass; C: 0.06 to 0.30% by mass; at least one kind of B, a B alloy, and a B oxide: 0.0030 to 0.0090% by mass in terms of B; and Fe: 91 to 97% by mass.Type: GrantFiled: August 8, 2014Date of Patent: October 22, 2019Assignee: Kobe Steel, Ltd.Inventors: Peng Han, Hiroyuki Kawasaki
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Publication number: 20190262869Abstract: A substrate processing apparatus removes foreign substances from a substrate at high removal efficiency. The substrate processing apparatus includes: a scrubber to perform surface processing of the substrate by bringing a scrubbing member into sliding contact with a first surface of the substrate, a hydrostatic support mechanism for supporting a second surface of the substrate via fluid pressure without contacting the substrate, the second surface being an opposite surface of the first surface, a cleaner to clean the processed substrate, and a dryer to dry the cleaned substrate. The scrubber brings the scrubbing member into sliding contact with the first surface while rotating the scrubbing member about a central axis of the scrubber.Type: ApplicationFiled: May 7, 2019Publication date: August 29, 2019Inventors: Yu Ishii, Hiroyuki Kawasaki, Kenichi Nagaoka, Kenya Ito, Masako Kodera, Hiroshi Tomita, Takeshi Nishioka
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Publication number: 20190262870Abstract: A substrate processing apparatus removes foreign substances from a substrate at high removal efficiency. The substrate processing apparatus includes: a scrubber to perform surface processing of the substrate by bringing a scrubbing member into sliding contact with a first surface of the substrate, a hydrostatic support mechanism for supporting a second surface of the substrate via fluid pressure without contacting the substrate, the second surface being an opposite surface of the first surface, a cleaner to clean the processed substrate, and a dryer to dry the cleaned substrate. The scrubber brings the scrubbing member into sliding contact with the first surface while rotating the scrubbing member about a central axis of the scrubber.Type: ApplicationFiled: May 7, 2019Publication date: August 29, 2019Inventors: Yu Ishii, Hiroyuki Kawasaki, Kenichi Nagaoka, Kenya Ito, Masako Kodera, Hiroshi Tomita, Takeshi Nishioka
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Patent number: 10328465Abstract: A substrate processing apparatus removes foreign substances from a substrate at high removal efficiency. The substrate processing apparatus includes: a scrubber to perform surface processing of the substrate by bringing a scrubbing member into sliding contact with a first surface of the substrate, a hydrostatic support mechanism for supporting a second surface of the substrate via fluid pressure without contacting the substrate, the second surface being an opposite surface of the first surface, a cleaner to clean the processed substrate, and a dryer to dry the cleaned substrate. The scrubber brings the scrubbing member into sliding contact with the first surface while rotating the scrubbing member about a central axis of the scrubber.Type: GrantFiled: February 20, 2013Date of Patent: June 25, 2019Assignee: EBARA CORPORATIONInventors: Yu Ishii, Hiroyuki Kawasaki, Kenichi Nagaoka, Kenya Ito, Masako Kodera, Hiroshi Tomita, Takeshi Nishioka
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Patent number: 10029709Abstract: A railcar includes: an underframe including a pair of side sills located at both respective ends of the underframe in a car width direction and extending in a car longitudinal direction and a plurality of cross beams coupling the pair of side sills to each other in a car width direction; and an underfloor cover covering an underfloor portion of the underframe. The underfloor cover includes upper and lower plate-shaped members (a shielding plate and a closing plate) made of stainless steel, and the upper and lower plate-shaped members are at least partially spaced apart from each other.Type: GrantFiled: November 12, 2013Date of Patent: July 24, 2018Assignee: KAWASAKI JUKOGYO KABUSHIKI KAISHAInventors: Go Tateishi, Hiroyuki Kawasaki, Hiroyuki Sakurai, Ryoji Negi, Osamu Muragishi, Yuji Kamei, Shuichi Mizuma
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Patent number: 10016875Abstract: A method for fabricating an abrasive firm includes preparing a base film, coating the base film with a first paint which contains no abrasive grain but contains a binder resin, and drying the paint to form a first layer. The method further includes coating the first layer with a second paint which contains the abrasive grains and the binder resin, and drying the paint to form a second layer. The method further includes heating the first layer and the second layer for imidization.Type: GrantFiled: May 24, 2016Date of Patent: July 10, 2018Assignee: EBARA CORPORATIONInventors: Yu Ishii, Hiroyuki Kawasaki, Masayuki Nakanishi, Kenya Ito