Abstract: An applicator head for a curtain applicator for coating a continuous material web with liquid or pasty application medium. The applicator head has an outlet edge extending substantially over the width of the applicator head. The application medium passes out of the applicator head in a free-falling curtain. A rinsing device allows the outlet edge to be supplied with a flowing gaseous rinsing medium. There is also described a method for coating a continuous material web by way of such a curtain applicator. The application medium passes out of the applicator head in the form of a free-falling curtain and subsequently comes into contact with the material web. The region of at least one of the outlet edges can be supplied with a flowing gaseous rinsing medium.

Abstract: A curtain applicator for applying a liquid or pasty application medium to at least one surface of a running material web, in particular a fibrous web. The curtain applicator has an applicator nozzle, in particular a slotted nozzle, which under the effect of gravity, and optionally with further forces, is suitable for dispensing a single-tier or multi-tier curtain onto the surface of the material web. The curtain applicator further has a wiping device which is suitable for keeping entrained air carried by the material web away from the curtain. Moreover, there is provided at least one further blocking device which is suitable for keeping air movements of the ambient air away from the curtain.

Abstract: An applicator head for a curtain applicator for coating a continuous material web with liquid or pasty application medium. The applicator head has an outlet edge extending substantially over the width of the applicator head. The application medium passes out of the applicator head in a free-falling curtain. A rinsing device allows the outlet edge to be supplied with a flowing gaseous rinsing medium. There is also described a method for coating a continuous material web by way of such a curtain applicator. The application medium passes out of the applicator head in the form of a free-falling curtain and subsequently comes into contact with the material web. The region of at least one of the outlet edges can be supplied with a flowing gaseous rinsing medium.

Abstract: A curtain applicator for applying a liquid or pasty application medium to at least one surface of a running material web, in particular a fibrous web. The curtain applicator has an applicator nozzle, in particular a slotted nozzle, which under the effect of gravity, and optionally with further forces, is suitable for dispensing a single-tier or multi-tier curtain onto the surface of the material web. The curtain applicator further has a wiping device which is suitable for keeping entrained air carried by the material web away from the curtain. Moreover, there is provided at least one further blocking device which is suitable for keeping air movements of the ambient air away from the curtain.

Abstract: Curtain-type coater and process for coating a web with curtain-type coater. Curtain-type coater includes a curtain head having a slit structured and arranged to supply a coating liquid curtain onto a surface of a web and outside of the edges of the web. At least a portion of the slit forming the coating liquid curtain outside the edges of the web has a width greater than a portion of the slit forming the coating liquid curtain supplied onto the web.

Abstract: This invention relates to a curtain applicator on which a two-layer curtain is formed by dispensing two types of coating medium, for example color, from a medium feeder positioned to the upper side of a moving web in order to apply two layers of coating medium onto the web surface. The medium feeder has a middle lip, which is arranged in the flow channels for the two types of medium and has a pointed part projecting toward the web side from the pointed parts of the two side lips which are arranged on the outer side of the flow channels for the two types of medium on the outer side in the width direction of the web. The curtain applicator also includes a convexly formed medium separation device, which adjoins the pointed part of the middle lip and individually separates the two types of surplus medium, for example, color, which are dispensed from the medium feeder.

Abstract: The present invention provides a 2-layer curtain coater that supplies a 2-layered paint curtain formed from a first paint curtain and a second paint curtain to the surface of a transported web to overcoat a first paint and a second paint in two layers on the surface of the web, the 2-layer curtain coater being able to prevent paint loss during coating preparation.

Abstract: This invention relates to a curtain applicator on which a two-layer curtain is formed by dispensing two types of coating medium, for example color, from a medium feeder positioned to the upper side of a moving web in order to apply two layers of coating medium onto the web surface. The medium feeder has a middle lip, which is arranged in the flow channels for the two types of medium and has a pointed part projecting toward the web side from the pointed parts of the two side lips which are arranged on the outer side of the flow channels for the two types of medium on the outer side in the width direction of the web. The curtain applicator also includes a convexly formed medium separation device, which adjoins the pointed part of the middle lip and individually separates the two types of surplus medium, for example, color, which are dispensed from the medium feeder.

Abstract: Curtain-type coater and process for coating a web with curtain-type coater. Curtain-type coater includes a curtain head having a slit structured and arranged to supply a coating liquid curtain onto a surface of a web and outside of the edges of the web. At least a portion of the slit forming the coating liquid curtain outside the edges of the web has a width greater than a portion of the slit forming the coating liquid curtain supplied onto the web.

Abstract: In a method for evaluation of abrasion of a forming mold, abrasion amounts of divided pieces which are divided from a mold piece constituting a cavity are measured with the divided pieces removed or not removed from a forming mold body. A layer, a marking-off line or satin is formed on the surfaces of the divided pieces, which are observed visually every predetermined shot to judge a degree of abrasion of the respective divided pieces.

Abstract: A semiconductor wafer or a film formed thereon is polished by using a polishing agent comprising abrasive containing silica particles as the main component, water as a solvent, and a water-soluble cellulose, an alkali metal impurity content of the polishing agent being 5C ppm or less where the polishing agent contains C % by weight of the water-soluble cellulose, so as to flatten the semiconductor wafer without doing damage to the wafer or the film formed thereon and without bringing about a dishing problem in the polished surface.

Abstract: An abrasive material is prepared by dispersing silicon nitride particles acting as abrasive particles in a solvent such as a pure water or an ultra pure water, followed by adding an adsorptive stickable to the abrasive particles to the dispersion. The resultant abrasive material permits diminishing the polishing rate of a silicon nitride film used as a stopper film, with the result that a CVD SiO.sub.2 film to be polished is selectively polished relative to the Si.sub.3 N.sub.4 film used as the stopper film. This makes it possible to make the stopper film as thin as possible and permits the CVD SiO.sub.2 film to be flattened efficiently without bringing about a dishing problem.

Abstract: A polishing slurry is formed of a silica-dispersed solution obtained by dispersing, in an aqueous solvent, a fumed silica having an average primary particle size of from 5 to 30 nm, the silica-dispersed solution exhibiting a light scattering index (n) of from 3 to 6 at a silica concentration of 1.5% by weight, and the fumed silica dispersed therein having an average secondary particle size of from 30 to 100 nm on the weight basis. The polishing slurry is produced by pulverizing, using a high-pressure homogenizer, a silica-dispersed solution obtained by dispersing a fumed silica in an aqueous solvent, so that the fumed silica possesses an average secondary particle size of from 30 to 100 nm on the weight basis. The polishing slurry is used for polishing semiconductor wafers and inter-layer dielectric in an IC process.

Abstract: A current source and a semiconductor integrated circuit device for suppressing fluctuations occured in an output current of current sources composed MOS transistors for switching. A back gate voltage of MOS transistors M1, M3 for switching connected in series to a constant current generator 9 is supplied through a power source line 5d independent of a power source line 4d which supplies a driving voltage. The stabilization of the back gate voltage leads the operation of the MOS transistors M1, M3 to be stabilized, thereby suppressing the fluctuations occured in the output currents I.sub.out and I.sub.out current sources.

Abstract: Disclosed herein is a method of suppressing and masking the grassy smell and acid taste characteristic of vegetables and fruits, thereby making food and drink more palatable, by adding erythritol to food and drink in their production from vegetables and fruits having a strong grassy smell and acid taste. The thus added erythritol also improves the taste of food and drink without adversely affecting the natural taste of vegetables and fruits and without increasing their sweetness. The method comprises adding to food and drink erythritol in an amount of 0.2 to 3.0 wt % of their weight.

Abstract: A bar graph decoder includes input terminals to which 5-bit digital data is input, a logic circuit for outputting a thermometer code changing continuously at a constant ratio in response to the input data, and output terminals connected to the logic circuit for outputting switch select signals according to the digital input. The logic circuit is configured only of 2-input OR circuits and 2-input AND circuits. As a result, a bar graph decoder having a simple configuration and a reduced number of elements can be provided.

Abstract: Driving circuits (6) output driving signals to drive switching transistors (Q 15, Q16). A potential as the high level of the driving signal can be set lower than a power supply voltage (V.sub.DD) by connecting the sources of transistors (Q18, Q20) to a node (X). This configuration prevents an overshoot at a switching time and allows an improvement in a settling time. Therefore, a complementary current source circuit for a high-speed D/A converter can be provided.