Abstract: A circuit integrated motor includes: a motor accommodated in a motor housing; a heat sink adjacent to the motor housing in an axis axial direction; a substrate arranged in at least one of the heat sink and the motor housing; and a module mounted on the substrate, and in which a drive circuit for driving that drives the motor is housed. The module has a substantially rectangular cuboid including a bottom surface facing the substrate, and two opposing main side surfaces perpendicular to the bottom surface and having areas larger than an area of the bottom surface. The heat sink includes an insertion portion into which the module is inserted. An inner surface of the insertion unit portion is in direct or indirect contact with at least the two main side surfaces.

Abstract: An image analysis apparatus that analyzes a skin condition from a video of the face of a subject captured with an imaging part includes a tracking part configured to track the amount of changes of multiple tracking points arranged in advance in an analysis region of the face based on a change in the expression of the face included in the video, and obtain the compression ratio of the skin in the analysis region based on the amount of changes, and a skin condition analysis part configured to analyze the skin condition of the subject based on the compression ratio obtained by the tracking part.

Abstract: An image analysis apparatus that analyzes a skin condition from a video of the face of a subject captured with an imaging part includes a tracking part configured to track the amount of changes of multiple tracking points arranged in advance in an analysis region of the face based on a change in the expression of the face included in the video, and obtain the compression ratio of the skin in the analysis region based on the amount of changes, and a skin condition analysis part configured to analyze the skin condition of the subject based on the compression ratio obtained by the tracking part.

Abstract: A failure determination device capable of performing failure determination for a shutter device of a vehicle with accuracy in a short time period. In an engine room of a vehicle, a condenser for a refrigeration cycle for an aircon is provided and at a front grille of the vehicle, a grille shutter device is provided for introducing ambient air for cooling the condenser into the engine room by opening a grille shutter. According to the failure determination device of the shutter device, a pressure of the refrigerant discharged from the condenser is detected as a refrigerant pressure. A failure of the grille shutter device is determined based on the refrigerant pressure, which changes at a large rate according to the opening/closing of the grille shutter, enabling failure determination with accuracy in a short time period.

Abstract: A skin state analyzing method for analyzing the skin state of an examinee using an image of the skin of the examinee includes an analyzing step of analyzing at least one of texture/pores, spots, skin tone, and sebum of the skin from the image, a storing step of storing the image and an analysis result obtained from the analyzing step in association with skin examination date/time information and examinee information, a display screen generating step of generating a screen displaying the image and the analysis result of the examinee stored in the storing step, and an output step of outputting the information generated in the display screen generating step.

Abstract: A failure determination device capable of performing failure determination for a shutter device of a vehicle with accuracy in a short time period. In an engine room of a vehicle, a condenser for a refrigeration cycle for an aircon is provided and at a front grille of the vehicle, a grille shutter device is provided for introducing ambient air for cooling the condenser into the engine room by opening a grille shutter. According to the failure determination device of the shutter device, a pressure of the refrigerant discharged from the condenser is detected as a refrigerant pressure. A failure of the grille shutter device is determined based on the refrigerant pressure, which changes at a large rate according to the opening/closing of the grille shutter, enabling failure determination with accuracy in a short time period.

Abstract: A skin state analyzing method for analyzing the skin state of an examinee using an image of the skin of the examinee includes an analyzing step of analyzing at least one of texture/pores, spots, skin tone, and sebum of the skin from the image, a storing step of storing the image and an analysis result obtained from the analyzing step in association with skin examination date/time information and examinee information, a display screen generating step of generating a screen displaying the image and the analysis result of the examinee stored in the storing step, and an output step of outputting the information generated in the display screen generating step.

Abstract: A data collection system is connected to a data analysis system that carries out analysis processing based on data collected by the data collection system via communication. The data collection system includes collection-side communication, image capturing for capturing an ultra-high resolution digital image that allows an analysis of a skin texture condition, collection-side image data compression for compressing image data by a high compression method with block noises suppressed, and collection-side data display. The data analysis system includes analysis side communication, data analysis for analyzing image data, and analysis-side data compression for compressing the data by a high compression method with block noises suppressed.

Abstract: A positive photosensitive resin composition with favorable heat resistance and transparency is provided. The photosensitive resin composition contains a resin component (A1) having a structural unit (a1?) obtained by substituting at least a portion of hydrogen atoms of phenolic hydroxyl groups within a structural unit represented by a general formula (a1) shown below with a naphthoquinone-1,2-diazide-5-(and/or -4-) sulfonyl group. (In the above general formula, R0 represents a hydrogen atom or methyl group, R1 represents a single bond or an alkylene group of 1 to 5 carbon atoms, R2 represents an alkyl group of 1 to 5 carbon atoms, a represents an integer from 1 to 5, b represents either 0 or an integer from 1 to 4, and a+b is no greater than 5. If two or more R2 groups exist, then these R2 groups may be either the same or mutually different.

Abstract: A positive photosensitive resin composition exhibiting excellent heat resistance is provided, which comprises an alkali-soluble resin component (A) and a photosensitizer (B), the component (A) including a resin component (A1) having a structural unit (a1) represented by general formula (a1) shown below: wherein R0 represents a hydrogen atom or a methyl group; R1 represents a single bond or an alkylene group of 1 to 5 carbon atoms; R2 represents an alkyl group of 1 to 5 carbon atoms; and a represents an integer of 1 to 5, and b represents 0 or an integer of 1 to 4, with the proviso that the sum of a and b is 5 or less, and when two or more R2 are present, R2 may be the same or different.

Abstract: [Problem] To provide a system which can simplify operations at the time of diagnosis at the store, which enables even a beginner to diagnose a customer's skin condition, thereby achieving higher precision diagnostic results. [Solving Means] A data collection system 1 is connected to a data analysis system 11 that carries out analysis processing based on data collected by the data collection system 1 via communication means. The data collection system 1 includes collection-side communication means 7, image capturing means 2 for capturing an ultra-high resolution digital image that allows an analysis of a skin texture conditions collection-side image data compression means 6 for compressing image data by a high compression method with block noises suppressed, and collection-side data display means 3.

Abstract: A positive photosensitive resin composition with favorable heat resistance and transparency is provided. The photosensitive resin composition contains a resin component (A1) having a structural unit (a1?) obtained by substituting at least a portion of hydrogen atoms of phenolic hydroxyl groups within a structural unit represented by a general formula (a1) shown below with a naphthoquinone-1,2-diazide-5-(and/or -4-) sulfonyl group. (In the above general formula, R0 represents a hydrogen atom or methyl group, R1 represents a single bond or an alkylene group of 1 to 5 carbon atoms, R2 represents an alkyl group of 1 to 5 carbon atoms, a represents an integer from 1 to 5, b represents either 0 or an integer from 1 to 4, and a+b is no greater than 5. If two or more R2 groups exist, then these R2 groups may be either the same or mutually different.

Abstract: A skin state analyzing method for analyzing the skin state of an examinee using an image of the skin of the examinee includes an analyzing step of analyzing at least one of texture/pores, spots, skin tone, and sebum of the skin from the image, a storing step of storing the image and an analysis result obtained from the analyzing step in association with skin examination date/time information and examinee information, a display screen generating step of generating a screen displaying the image and the analysis result of the examinee stored in the storing step, and an output step of outputting the information generated in the display screen generating step.

Abstract: A positive photosensitive resin composition exhibiting excellent heat resistance is provided, which comprises an alkali-soluble resin component (A) and a photosensitizer (B), the component (A) including a resin component (A1) having a structural unit (a1) represented by general formula (a1) shown below: wherein R0 represents a hydrogen atom or a methyl group; R1 represents a single bond or an alkylene group of 1 to 5 carbon atoms; R2 represents an alkyl group of 1 to 5 carbon atoms; and a represents an integer of 1 to 5, and b represents 0 or an integer of 1 to 4, with the proviso that the sum of a and b is 5 or less, and when two or more R2 are present, R2 may be the same or different.

Abstract: A method for removing a resist pattern having a resist pattern forming step of forming a resist pattern on a substrate using a chemically amplified positive resist composition and a removing step of removing the resist pattern from the substrate using a solvent, a composition prepared by dissolving (A) an alkali soluble resin having a hydroxyl group in the side chain, (B) a photo acid generator and (C) a compound represented by the following general formula (I): H2C?CH—O—R1—O—CH?CH2??(I) ?wherein R1 represents an alkylene group having 1 to 10 carbon atoms or the like, in an organic solvent being used as the chemically amplified positive resist composition, the method further having a heat treatment step of heat-treating the substrate on which the resist pattern is formed at a temperature of 150 to 400° C. between the resist pattern forming step and the removing step.

Abstract: A novel compound represented by the general formula (I), and a nematic liquid crystal composition incorporating the same. A compound represented by the general formula (I) can be produced industrially extremely easily, as shown in the examples, displays superior compatibility with current general purpose host liquid crystals as a nematic phase, and also shows little crystal precipitation at low temperatures. Moreover, by addition of a small amount of such a compound to a host liquid crystal, the liquid crystal temperature range at low temperatures can be effectively widened without any significant worsening of the various characteristics of the liquid crystal material. Consequently, a compound of the present invention is an extremely useful liquid crystal material which is suitable for various liquid crystal display elements which require a broad operating temperature range.

Abstract: There is provided a method of producing a resist composition which yields a resist composition with good storage stability, and no fluctuation in characteristics between production lots. There are provided: a novolak resin solution formed by adding benzoquinone to a novolak resin solution produced by dissolving a novolak resin in an organic solvent; a positive photoresist composition comprising the novolak resin solution and a photosensitive component; a positive photoresist composition comprising the novolak resin solution, a photosensitive component, and hydroquinone; and a method of producing a positive photoresist composition involving mixing the novolak resin solution described above and a photosensitive component.

Abstract: The present invention discloses a decahydronaphthalene derivative represented by general formula (I): a liquid crystal composition in which it is contained, and a liquid crystal device in which it is used. The novel decahydronaphthalene derivative of the present invention can be produced industrially extremely easily as shown in the examples, and by adding a small amount to a base liquid crystal, it is possible to have effects that expand the nematic phase temperature range, thereby improving its various characteristics as a nematic liquid crystal. Moreover, the novel decahydronaphthalene derivative of the present invention also has superior co-solubility with base liquid crystals generally used at present. Thus, it is suitable for various types of liquid crystal devices requiring a wide operating temperature range, and is extremely useful as a liquid crystal material.

Abstract: A method for removing a resist pattern having a resist pattern forming step of forming a resist pattern on a substrate using a chemically amplified positive resist composition and a removing step of removing the resist pattern from the substrate using a solvent, a composition prepared by dissolving (A) an alkali soluble resin having a hydroxyl group in the side chain, (B) a photo acid generator and (C) a compound represented by the following general formula (I): H2C?CH—O—R1O—CH?CH2??(I) wherein R1 represents an alkylene group having 1 to 10 carbon atoms or the like, in an organic solvent being used as the chemically amplified positive resist composition, the method further having a heat treatment step of heat-treating the substrate on which the resist pattern is formed at a temperature of 150 to 400° C. between the resist pattern forming step and the removing step.

Abstract: There is provided a method of producing a resist composition which yields a resist composition with good storage stability, and no fluctuation in characteristics between production lots. There are provided: a novolak resin solution formed by adding benzoquinone to a novolak resin solution produced by dissolving a novolak resin in an organic solvent; a positive photoresist composition comprising the novolak resin solution and a photosensitive component; a positive photoresist composition comprising the novolak resin solution, a photosensitive component, and hydroquinone; and a method of producing a positive photoresist composition involving mixing the novolak resin solution described above and a photosensitive component.