Patents by Inventor Hisanori TANSHO

Hisanori TANSHO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE
    Publication number: 20150376464
    Abstract: The present invention provides a polishing composition comprising an abrasive, a water-soluble polymer and water. The polishing composition has a volume average particle diameter DA of grains in the polishing composition of 20 nm to 60 nm measured by dynamic light scattering at a concentration equivalent to 0.2% abrasive content by mass.
    Type: Application
    Filed: February 10, 2014
    Publication date: December 31, 2015
    Applicant: FUJIMI INCORPORATED
    Inventors: Kohsuke TSUCHIYA, Hisanori TANSHO, Maki ASADA, Yusuke SUGA
  • Polishing composition and polishing method using the same
    Patent number: 8703007
    Abstract: A polishing composition of the present invention contains an oxidant, an anticorrosive, and a surfactant comprising a compound represented by Chemical Formula 1: One to three of R1 to R5 in Chemical Formula 1 are alkyl groups, alkynyl groups, alkenyl groups, aryl groups, or arylalkylene groups, one is a hydrogen atom or an alkyl group having 1 to 9 carbon atoms, and the remainder are hydrogen atoms. O—R6 is oxyethylene, oxypropylene, or a random or block conjugate of oxyethylene and oxypropylene. n is an integer of 1 or more. X is an OSO3? group, an OPO32? group, or an OH group.
    Type: Grant
    Filed: January 20, 2011
    Date of Patent: April 22, 2014
    Assignee: Fujimi Incorporated
    Inventors: Tomohiko Akatsuka, Yasuto Ishida, Kanako Fukuda, Yoshihiro Kachi, Hisanori Tansho
  • Polishing Composition and Polishing Method Using the Same
    Publication number: 20110180511
    Abstract: A polishing composition of the present invention contains an oxidant, an anticorrosive, and a surfactant comprising a compound represented by Chemical Formula 1: One to three of R1 to R5 in Chemical Formula 1 are alkyl groups, alkynyl groups, alkenyl groups, aryl groups, or arylalkylene groups, one is a hydrogen atom or an alkyl group having 1 to 9 carbon atoms, and the remainder are hydrogen atoms. O—R6 is oxyethylene, oxypropylene, or a random or block conjugate of oxyethylene and oxypropylene. n is an integer of 1 or more. X is an OSO3? group, an OPO32? group, or an OH group.
    Type: Application
    Filed: January 20, 2011
    Publication date: July 28, 2011
    Applicant: FUJIMI INCORPORATED
    Inventors: Tomohiko AKATSUKA, Yasuto ISHIDA, Kanako FUKUDA, Yoshihiro KACHI, Hisanori TANSHO