Patents by Inventor Hisanori Ueno

Hisanori Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD OF EXPOSING A SEMICONDUCTOR WAFER AND EXPOSURE APPARATUS
    Publication number: 20140036244
    Abstract: An exposure apparatus includes an autofocus scan processor configured to generate a detection signal indicating a defocused portion of a resist film over a semiconductor substrate, an exposure scan processor configured to perform an exposure process for the resist film, and a controller configured to feed back the detection signal from the autofocus scan processor to the exposure scan processor.
    Type: Application
    Filed: October 8, 2013
    Publication date: February 6, 2014
    Applicant: ELPIDA MEMORY, INC.
    Inventors: Masayoshi SAMMI, Hisanori UENO
  • Method of exposing a semiconductor wafer and exposure apparatus
    Patent number: 8558990
    Abstract: An exposure method includes the following processes. An autofocus scan process is performed to detect a defocused portion of a first resist film over a semiconductor wafer and to generate a detection signal that indicates the defocused portion detected. A first exposure scan process is performed while selectively blinding the first resist film, with reference to a detection signal related to the defocused portion detected.
    Type: Grant
    Filed: May 11, 2011
    Date of Patent: October 15, 2013
    Assignee: Elpida Memory, Inc.
    Inventors: Masayoshi Danbata, Hisanori Ueno
  • Method of exposing a semiconductor wafer and exposure apparatus
    Publication number: 20110279798
    Abstract: An exposure method includes the following processes. An autofocus scan process is performed to detect a defocused portion of a first resist film over a semiconductor wafer and to generate a detection signal that indicates the defocused portion detected. A first exposure scan process is performed while selectively blinding the first resist film, with reference to a detection signal related to the defocused portion detected.
    Type: Application
    Filed: May 11, 2011
    Publication date: November 17, 2011
    Applicant: Elpida Memory, Inc.
    Inventors: Masayoshi Danbata, Hisanori Ueno
  • Reticle having accessory pattern divided into sub-patterns
    Patent number: 6610461
    Abstract: In a reticle for transferring a pattern onto a photosensitive layer by a photolithography process, the reticle has a principal pattern and an accessory pattern, and the accessory pattern is divided into a set of continuously arranged sub-patterns.
    Type: Grant
    Filed: November 30, 2001
    Date of Patent: August 26, 2003
    Assignee: NEC Electronics Corporation
    Inventor: Hisanori Ueno
  • Reticle having accessory pattern divided into sub-patterns
    Patent number: 6399256
    Abstract: In a reticle for transferring a pattern onto a photosensitive layer by a photolithography process, the reticle has a principal pattern and an accessory pattern, and the accessory pattern is divided into a set of continuously arranged sub-patterns.
    Type: Grant
    Filed: December 3, 1999
    Date of Patent: June 4, 2002
    Assignee: NEC Corporation
    Inventor: Hisanori Ueno
  • Reticle having accessory pattern divided into sub-patterns
    Publication number: 20020055048
    Abstract: In a reticle for transferring a pattern onto a photosensitive layer by a photolithography process, the reticle has a principal pattern and an accessory pattern, and the accessory pattern is divided into a set of continuously arranged sub-patterns.
    Type: Application
    Filed: November 30, 2001
    Publication date: May 9, 2002
    Inventor: Hisanori Ueno