Patents by Inventor Hisao Oikawa
Hisao Oikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240087487Abstract: A semiconductor device having favorable display quality is provided. The semiconductor device is provided with a display portion, a line-of-sight sensor portion, a control portion, and an arithmetic portion. The line-of-sight sensor portion has a function of obtaining first information showing a direction of a user's line of sight. The arithmetic portion has a function of determining a first region including a gaze point of the user on the display portion with use of the first information and a function of increasing a definition of an image displayed on the first region. Light emitted from the display portion may be used to obtain the first information showing the direction of the line of sight.Type: ApplicationFiled: January 18, 2022Publication date: March 14, 2024Inventors: Shunpei YAMAZAKI, Yosuke TSUKAMOTO, Koji KUSUNOKI, Hisao IKEDA, Akio ENDO, Yoshiaki OIKAWA, Hideki UOCHI
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Publication number: 20230295427Abstract: A siloxane polymer contains a silsesquioxane unit and a linear siloxane unit in its main chain and has a cage-type silsesquioxane structure in its side chain. A highly transparent and flexible film having a small linear thermal expansion coefficient is produced by utilizing the cohesion force (physical crosslinking) of the cage-type silsesquioxane in the side chain. The siloxane polymer has repeating units respectively represented by formulae (1) and (4), and has terminal groups respectively represented by formulae (5L) and (5R) at its right and left terminals, wherein A represents a structure shown below.Type: ApplicationFiled: July 29, 2021Publication date: September 21, 2023Applicant: JNC CORPORATIONInventors: Nobuo ENOKI, Kazuya SUWA, Ayaka KIYA, Mikio YAMAHIRO, Takeshi MATSUSHITA, Taro ISHIKAWA, Hisao OIKAWA
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Publication number: 20230151237Abstract: A photocurable composition is capable of forming a cured product that has good reliability in a high-temperature constant-humidity environment, especially good ion migration resistance in a temperature range of 100° C. or higher. The photocurable composition (Z) is obtained by adding an ion scavenger (Y) to a composition (X) containing a monofunctional acrylic monomer (A) and a multifunctional acrylic monomer (B), wherein the content of the monofunctional acrylic monomer (A) relative to 100 wt% of the composition (X) is from 40 wt% to 80 wt%, and the content of the multifunctional acrylic monomer (B) relative to 100 wt% of the composition (X) is from 10 wt% to 50 wt%. An inkjet ink composition contains the photocurable composition (Z); a cured product; and an electronic component.Type: ApplicationFiled: June 17, 2021Publication date: May 18, 2023Applicant: JNC CORPORATIONInventors: Masaaki YOHDA, Takayuki HIROTA, Kohsuke YOSHITOMI, Katsuyuki SUGIHARA, Hisao OIKAWA
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Publication number: 20200048480Abstract: An object of the invention is to provide a photocurable inkjet ink useful for producing microlenses and electronic components, and having low volatility. The photocurable inkjet ink of the invention contains polyfunctional (meth)acrylate (A), monofunctional (meth)acrylate (B) having nonvolatility of 75% or more and viscosity (25° C.) of 1 to 70 mPa·s in evaluation method 1, and photopolymerization initiator (C); and having viscosity (at 25° C.) of 1 to 100 mPa·s.Type: ApplicationFiled: April 25, 2018Publication date: February 13, 2020Applicant: JNC CORPORATIONInventors: Kohsuke YOSHITOMI, Shinta MOROKOSHI, Toshiyuki TAKAHASHI, Hisao OIKAWA
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Patent number: 8445613Abstract: A polymer and a treating agent (such as a surface-treating agent) are provided that have excellent characteristics in such properties as water repellency, oil repellency, antifouling property and charge controlling property. The polymer contains a structural unit derived from fluorosilsesquioxane having an addition polymerizable group, or contains a structural unit derived from fluorosilsesquioxane having an addition polymerizable group and a structural unit derived from organopolysiloxane having an addition polymerizable group. The treating agent contains the polymer. An article treated with the treating agent is also provided.Type: GrantFiled: March 21, 2008Date of Patent: May 21, 2013Assignee: JNC CorporationInventors: Kenya Ito, Hisao Oikawa, Koji Ohguma, Mikio Yamahiro
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Patent number: 7989560Abstract: A polymer containing: a constitutional unit A that is derived from fluorosilsesquioxane having one addition polymerizable functional group in a molecule; a constitutional unit B that is derived from organopolysiloxane having an addition polymerizable functional group; and a constitutional unit C that is derived from an addition polymerizable functional monomer containing a group having active hydrogen, and optionally containing a constitutional unit D that is derived from an addition polymerizable monomer other than the fluorosilsesquioxane having one addition polymerizable functional group in a molecule, the organopolysiloxane having an addition polymerizable functional group and the addition polymerizable monomer containing a group having active hydrogen.Type: GrantFiled: December 17, 2007Date of Patent: August 2, 2011Assignee: Chisso CorporationInventors: Hisao Oikawa, Koji Ohguma, Kenya Ito, Mikio Yamahiro
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Patent number: 7964692Abstract: A polymer represented by Formula (7): wherein all variables are defined in the specification, including P1 which is a polymer chain obtained by polymerizing an addition-polymerizable monomer, which makes it possible to control the structure of the polymer as a molecular aggregate.Type: GrantFiled: January 7, 2009Date of Patent: June 21, 2011Assignee: JNC CorporationInventors: Mikio Yamahiro, Hisao Oikawa, Kenya Ito, Yasuhiro Yamamoto, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
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Patent number: 7868112Abstract: A polymer containing: a constitutional unit A that is derived from fluorosilsesquioxane having one addition polymerizable functional group in a molecule; a constitutional unit B that is derived from organopolysiloxane having an addition polymerizable functional group; and a constitutional unit C that is derived from an addition polymerizable monomer and has a group having a polymerizable unsaturated bond on a side chain, and optionally containing a constitutional unit D that is derived from an addition polymerizable monomer other than the fluorosilsesquioxane having one addition polymerizable functional group in a molecule, the organopolysiloxane having an addition polymerizable functional group and the addition polymerizable monomer having a functional group capable of introducing a group having a polymerizable unsaturated bond.Type: GrantFiled: December 17, 2007Date of Patent: January 11, 2011Assignee: Chisso CorporationInventors: Hisao Oikawa, Koji Ohguma, Kenya Ito, Minoru Nakayama, Shin Koga, Mikio Yamahiro, Hiroyuki Sato
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Patent number: 7863396Abstract: The present invention provides a silicon compound represented by Formula (1) and a polymer obtained by using the same, and this makes it possible not only to obtain an organic-inorganic composite material having a distinct structure but also to control the structure of the above polymer as a molecular aggregate. wherein R1 is a group independently selected from hydrogen, alkyl having a carbon atom number of 1 to 40, substituted or non-substituted aryl and substituted or non-substituted arylalkyl; in this alkyl having a carbon atom number of 1 to 40, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O—, —CH?CH—, cycloalkylene or cycloalkenylene; in alkylene in this arylalkyl, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O— or —CH?CH—; and A1 is a group having an ?-haloester group.Type: GrantFiled: March 5, 2004Date of Patent: January 4, 2011Assignee: Chisso CorporationInventors: Mikio Yamahiro, Hisao Oikawa, Kenya Ito, Yasuhiro Yamamoto, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
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Publication number: 20100137540Abstract: A polymer and a treating agent (such as a surface-treating agent) are provided that have excellent characteristics in such properties as water repellency, oil repellency, antifouling property and charge controlling property. The polymer contains a structural unit derived from fluorosilsesquioxane having an addition polymerizable group, or contains a structural unit derived from fluorosilsesquioxane having an addition polymerizable group and a structural unit derived from organopolysiloxane having an addition polymerizable group. The treating agent contains the polymer. An article treated with the treating agent is also provided.Type: ApplicationFiled: March 21, 2008Publication date: June 3, 2010Applicant: CHISSO CORPORATIONInventors: Kenya Ito, Hisao Oikawa, Koji Ohguma, Mikio Yamahiro
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Publication number: 20100093951Abstract: A polymer containing: a constitutional unit A that is derived from fluorosilsesquioxane having one addition polymerizable functional group in a molecule; a constitutional unit B that is derived from organopolysiloxane having an addition polymerizable functional group; and a constitutional unit C that is derived from an addition polymerizable functional monomer containing a group having active hydrogen, and optionally containing a constitutional unit D that is derived from an addition polymerizable monomer other than the fluorosilsesquioxane having one addition polymerizable functional group in a molecule, the organopolysiloxane having an addition polymerizable functional group and the addition polymerizable monomer containing a group having active hydrogen.Type: ApplicationFiled: December 17, 2007Publication date: April 15, 2010Inventors: Hisao Oikawa, Koji Ohguma, Kenya Ito, Mikio Yamahiro
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Patent number: 7687593Abstract: Provided are: an addition polymer of fluorosilsesquioxane (a) having one addition polymerizable functional group or an addition copolymer of the fluorosilsesquioxane (a) having one addition polymerizable functional group and an addition polymerizable monomer (b); a coating film including the polymer or the copolymer; and an addition copolymer of the fluorosilsesquioxane (a) having one addition polymerizable functional group and organopolysiloxane (c) having an addition polymerizable functional group, or an addition copolymer of the fluorosilsesquioxane (a) having one addition polymerizable functional group, the organopolysiloxane (c) having an addition polymerizable functional group, and the addition polymerizable monomer (b).Type: GrantFiled: September 28, 2006Date of Patent: March 30, 2010Assignee: Chisso CorporationInventors: Mikio Yamahiro, Koji Ohguma, Hisao Oikawa, Hisanobu Minamizawa, Hiroyuki Sato, Kenichi Watanabe
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Publication number: 20100063222Abstract: A polymer containing: a constitutional unit A that is derived from fluorosilsesquioxane having one addition polymerizable functional group in a molecule; a constitutional unit B that is derived from organopolysiloxane having an addition polymerizable functional group; and a constitutional unit C that is derived from an addition polymerizable monomer and has a group having a polymerizable unsaturated bond on a side chain, and optionally containing a constitutional unit D that is derived from an addition polymerizable monomer other than the fluorosilsesquioxane having one addition polymerizable functional group in a molecule, the organopolysiloxane having an addition polymerizable functional group and the addition polymerizable monomer having a functional group capable of introducing a group having a polymerizable unsaturated bond.Type: ApplicationFiled: December 17, 2007Publication date: March 11, 2010Applicant: Chisso CorporationInventors: Hisao Oikawa, Koji Ohguma, Kenya Ito, Minoru Nakayama, Shin Koga, Mikio Yamahiro, Hiroyuki Sato
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Patent number: 7662985Abstract: A production process for a silicon compound represented by Formula (6), characterized by reacting a compound represented by Formula (4) with a compound represented by Formula (5): wherein all of the variables are defined in the specification.Type: GrantFiled: January 7, 2009Date of Patent: February 16, 2010Assignee: Chisso CorporationInventors: Mikio Yamahiro, Hisao Oikawa, Kenya Ito, Yasuhiro Yamamoto, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
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Patent number: 7563917Abstract: The object of the present invention is to provide a new kind of silicon compound having an ester-type organic functional group and a new method for providing a T8-silsesquioxane compound having a hydroxyl group by using said silicon compound as the starting material. A silicon compound represented by formula (1) is obtained through the production process characterized by using a silicon compound represented by formula (2). wherein: in formula (1), each of seven R1 group is independently selected from the group consisting of hydrogen, alkyl, substituted or unsubstituted aryl, and substituted or unsubstituted arylalkyl and A2 is a hydroxyl-terminal organic functional group, and in formula (2), each of R1 group is the same as R1 in formula (1), and A1 is an organic functional group containing an acyloxy group.Type: GrantFiled: September 8, 2006Date of Patent: July 21, 2009Assignee: Chisso CorporationInventors: Mikio Yamahiro, Hisao Oikawa, Kenya Ito, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe
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Publication number: 20090143606Abstract: The present invention provides a silicon compound represented by Formula (1) and a polymer obtained by using the same, and this makes it possible not only to obtain an organic-inorganic composite material having a distinct structure but also to control the structure of the above polymer as a molecular aggregate. wherein R1 is a group independently selected from hydrogen, alkyl having a carbon atom number of 1 to 40, substituted or non-substituted aryl and substituted or non-substituted arylalkyl; in this alkyl having a carbon atom number of 1 to 40, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O—, —CH?CH—, cycloalkylene or cycloalkenylene; in alkylene in this arylalkyl, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O— or —CH?CH—; and A1 is a group having an ?-haloester bond.Type: ApplicationFiled: January 7, 2009Publication date: June 4, 2009Inventors: Mikio Yamahiro, Hisao Oikawa, Kenya Ito, Yasuhiro Yamamoto, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
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Publication number: 20090137765Abstract: The present invention provides a silicon compound represented by Formula (1) and a polymer obtained by using the same, and this makes it possible not only to obtain an organic-inorganic composite material having a distinct structure but also to control the structure of the above polymer as a molecular aggregate. wherein R1 is a group independently selected from hydrogen, alkyl having a carbon atom number of 1 to 40, substituted or non-substituted aryl and substituted or non-substituted arylalkyl; in this alkyl having a carbon atom number of 1 to 40, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O—, —CH?CH—, cycloalkylene or cycloalkenylene; in alkylene in this arylalkyl, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O— or —CH?CH—; and A1 is a group having an ?-haloester bond.Type: ApplicationFiled: January 7, 2009Publication date: May 28, 2009Inventors: Mikio Yamahiro, Hisao Oikawa, Kenya Ito, Yasuhiro Yamamoto, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
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Patent number: 7399819Abstract: A large part of conventional organic-inorganic composite materials is obtained by mechanical blending silsesquioxanes with organic polymers, and therefore it has been very difficult to control the structure thereof as the molecular aggregate of the composite materials. An object of the present invention is to provide a novel silicon compound having a living radical polymerization-initiating ability for an addition-polymerizable monomer and a polymer obtained using the same to thereby solve the problem described above regarding the conventional organic-inorganic composite materials. The present inventors have found that a novel silsesquioxane derivative to which a group having an ability to initiate polymerization of a monomer is useful as means for solving the problem described above.Type: GrantFiled: September 17, 2003Date of Patent: July 15, 2008Assignee: Chisso CorporationInventors: Mikio Yamahiro, Hisao Oikawa, Kazuhiro Yoshida, Kenya Ito, Yasuhiro Yamamoto, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
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Patent number: 7375170Abstract: Since the majority of conventional organic/inorganic composite materials are obtained by mechanical blending of a silsesquioxane and an organic polymer or other means, it was extremely difficult to control the structure of the composite as a molecular agglomerate. In order to solve such a problem, the invention is to provide a silicon compound represented by Formula (1). This novel silicon compound has a living radical polymerization initiating ability for addition polymerizable monomers of a wide range.Type: GrantFiled: December 27, 2005Date of Patent: May 20, 2008Assignees: Chisso Corporation, Chisso Petrochemical CorporationInventors: Hisao Oikawa, Mikio Yamahiro, Koji Ohguma, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda
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Patent number: 7291747Abstract: An organic silicon compound, having high reactivity, represented by the following Formula (1): wherein R and M are defined in the specification. The organic silicon compound is produced by reacting polysilsesquioxane, which is obtained by hydrolyzing a silane compound having three hydrolyzable groups and represented by the following Formula (2), with a monovalent alkaline metal hydroxide in an organic solvent, or by subjecting the silane compound having three hydrolyzable groups to hydrolysis and polycondensation in the presence of an organic solvent and an alkaline metal hydroxide: R—Si X3??(2) wherein R is the same as in Formula (1) and X represents a hydrolyzable group.Type: GrantFiled: May 17, 2002Date of Patent: November 6, 2007Assignee: Chisso CorporationInventors: Hisao Oikawa, Kenichi Watanabe, Nobumasa Ootake, Kazuhiro Yoshida, Keizou Iwatani