Abstract: Provided is a cleaning member, comprising an elastic member that includes polyurethane, wherein: when tan ? of a test piece sampled from the elastic member is measured in the temperature range of ?20° C. to +60° C., the peak temperature of a peak indicating the maximum value of tan ? is at 15.0° C. or below; the maximum value of tan ? is 0.20 to 0.55; tan ? at a temperature of 55° C. is 0.13 or larger; and where the detected quantity of all ions obtained when the test piece is heated at a rate of temperature increase of 10° C./second to 1000° C. using a direct-sampling mass spectrometer is M1 and the integrated intensity of a peak in a derived ion thermogram that corresponds to a range of m/z values originating in multifunctional isocyanate with at least three isocyanate groups is M2, M2/M1 is at least 0.001.

Abstract: Provided is a display device with extremely high resolution, a display device with higher display quality, a display device with improved viewing angle characteristics, or a flexible display device. Same-color subpixels are arranged in a zigzag pattern in a predetermined direction. In other words, when attention is paid to a subpixel, another two subpixels exhibiting the same color as the subpixel are preferably located upper right and lower right or upper left and lower left. Each pixel includes three subpixels arranged in an L shape. In addition, two pixels are combined so that pixel units including subpixel are arranged in matrix of 3×2.

Abstract: An exhaust gas containing a perfluoride compound (PFC) and SiF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 by the catalyst. The exhaust gas containing HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer.

Abstract: An exhaust gas containing a perfluoride component (PFC) and SiIF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.

Abstract: An exhaust gas containing a perfluoride component (PFC) and SiF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.

Abstract: An exhaust gas containing a perfluoride component (PFC) and SiIF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.

Abstract: An apparatus for processing an organohalogen compounds includes a catalyst container containing a catalyst layer, a supplying path for supplying a carrier gas containing organohalogen compounds and steam through the catalyst container, a cooling chamber arranged at a lower portion of the catalyst container, a spraying apparatus mounted in the cooling chamber for spraying a cooling liquid to cool exhaust gas containing a decomposed gas of the organohalogen compounds exhausted from the catalyst layer and a baffle member forming a bent path which introduces the exhaust gas containing the decomposed gas into the cooling chamber from the catalyst layer and mounted in the cooling chamber for preventing mists generated by spraying cooling liquid from the spraying apparatus from back flowing into the catalyst container.

Abstract: An exhaust gas containing a perfluoride compound (PFC) and SiF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 by the catalyst. The exhaust gas containing HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer.

Abstract: An exhaust gas containing a perfluoride component (PFC) and SiF4 is conducted into a silicon remover and brought into contact with water. A reaction water supplied from a water supplying piping and air supplied from an air supplying piping are mixed with the exhaust gas exhausted from the silicon remover. The exhaust gas containing water, air, and CF4 is heated at 700° C. by a heater. The exhaust gas containing PFC is conducted to a catalyst layer filled with an alumina group catalyst. The PFC is decomposed to HF and CO2 at a high temperature exhausted from the catalyst layer is cooled in a cooling apparatus. Subsequently, the exhaust gas is conducted to an acidic gas removing apparatus to remove HF. In this way, the silicon component is removed from the exhaust gas before introducing the exhaust gas into the catalyst layer. Therefore, the surface of the catalyst can be utilized effectively, and the decomposition reaction of the perfluoride compound can be improved.

Abstract: A process is provided for the destruction of organohalogen compounds, such as methyl chloride, chloroform, carbon tetrachloride, etc., by mixing the organohalogen compounds with a heated carrier gas, such as nitrogen, argon or air, and either steam or water to form a mixture; supplying the mixture to a catalyst, such as titanium oxide/tungsten oxide, to decompose the organohalogen compounds into halogens and hydrogen halides, such as chlorine, hydrochloric acid, fluorine and hydrofluoric acid; conducting the halogen and hydrogen halide contaminated gas through a bent path, created by a baffle that prevents the entry of mist or droplets into the catalyst chamber, into a cooling section where the halogen and hydrogen halide contaminated gas is sprayed with water to cool the gas to a temperature low enough to prevent the formation of dioxines. An alkaline agent, such as sodium hydroxide, can be added to the cooling water to neutralize the halides and hydrogen halides.