Patents by Inventor Hisashi Sakaitani

Hisashi Sakaitani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7601323
    Abstract: The present invention provides a method for producing hydrogen peroxide, comprising the steps of: alternately reducing and oxidizing a working solution containing anthraquinone compounds as a reaction medium, wherein a mixture of alkyl-substituted anthraquinones and alkyl-substituted tetrahydroanthraquinones in a molar ratio of from 2:1 to 8:1 is used as the anthraquinone compounds in the working solution, in the reduction step all of the tetrahydroanthraquinones and some or all of the anthraquinones in the working solution are reduced; and keeping the content of alkyl-substituted anthrahydroquinones in the working solution after the reduction step and before the oxidation step higher than the content of alkyl-substituted tetrahydroanthrahydroquinones, wherein ethylanthraquinone and ethyltetrahydroanthraquinone are used as anthraquinone compounds in the working solution in a total proportion of both of from 10 to 45 mol % of all of the anthraquinone compounds in the working solution.
    Type: Grant
    Filed: July 13, 2007
    Date of Patent: October 13, 2009
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Hisashi Sakaitani, Katsuhiro Iura, Isao Hagiwara, Hiroshi Hasegawa, Hisashi Matsuda
  • Publication number: 20090169469
    Abstract: Provided is a provides a method for producing hydrogen peroxide, comprising a step of reducing and then oxidizing a working solution containing an organic solvent, anthraquinone having an alkyl substituent, and tetrahydroanthraquinone having an alkyl substituent to produce hydrogen peroxide; and a working solution regeneration step of removing an inert substance, generated as a sub product by the production of hydrogen peroxide, from the working solution and re-circulating the working solution deprived of the inert substance back into the step of producing hydrogen peroxide; wherein the working solution regeneration step includes i) a first distillation step of recovering the organic solvent by distillation performed at an atmospheric or a lower pressure; and ii) a second distillation step of, following the first distillation step, recovering the anthraquinone and the tetrahydroanthraquinone by distillation performed at a still lower pressure at 200° C. or higher for a residence time of 1 hour or longer.
    Type: Application
    Filed: May 7, 2007
    Publication date: July 2, 2009
    Inventors: Hisashi Sakaitani, Katsuhiro Iura, Isao Hagiwara, Tsutomu Matsui, Daisuke Kitada
  • Publication number: 20080213164
    Abstract: The present invention provides a method for producing hydrogen peroxide, comprising the steps of: alternately reducing and oxidizing a working solution containing anthraquinone compounds as a reaction medium, wherein a mixture of alkyl-substituted anthraquinones and alkyl-substituted tetrahydroanthraquinones in a molar ratio of from 2:1 to 8:1 is used as the anthraquinone compounds in the working solution, in the reduction step all of the tetrahydroanthraquinones and some or all of the anthraquinones in the working solution are reduced; and keeping the content of alkyl-substituted anthrahydroquinones in the working solution after the reduction step and before the oxidation step higher than the content of alkyl-substituted tetrahydroanthrahydroquinones, wherein ethylanthraquinone and ethyltetrahydroanthraquinone are used as anthraquinone compounds in the working solution in a total proportion of both of from 10 to 45 mol % of all of the anthraquinone compounds in the working solution.
    Type: Application
    Filed: July 13, 2007
    Publication date: September 4, 2008
    Inventors: Hisashi Sakaitani, Katsuhiro Iura, Isao Hagiwara, Hiroshi Hasegawa, Hisashi Matsuda
  • Patent number: 6130328
    Abstract: There is herein disclosed a process for preparing a carboxypolysaccharide by oxidizing a polysaccharide with a combination of a transition metal compound and an oxidizing agent, said process comprising the step of separating the transition metal from a reaction mixture with a chelating agent. According to the present invention, the transition metal can be removed to a low concentration of less than 100 ppm from an aqueous solution including the transition metal and the tricarboxypolysaccharide. The process of the present invention is important to reduce the loss of a transition metal catalyst such as the ruthenium catalyst and to industrially manufacture a purified tricarboxypolysaccharide.
    Type: Grant
    Filed: November 5, 1998
    Date of Patent: October 10, 2000
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masafumi Shimpo, Hisashi Sakaitani, Hidechika Wakabayashi, Toshiaki Kozaki
  • Patent number: 6111097
    Abstract: In a process of producing a carboxypolysaccharide by oxidizing a polysaccharide in the presence of a ruthenium compound and an oxidizing agent, the expensive ruthenium is easily and efficiently recovered. Ruthenium dissolved in a reaction mixture after the oxidation of the polysaccharide is converted, after or without being subjected to a heat. treatment, to high oxidation sate, which is then recovered by the extraction with a water-insoluble organic solvent. The recovered ruthenium is reduced to low oxidation state and reused in a subsequent production of the carboxypolysaccharide.
    Type: Grant
    Filed: June 4, 1999
    Date of Patent: August 29, 2000
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Hiromitsu Nagashima, Hisashi Sakaitani, Hidechika Wakabayashi, Toshiaki Kozaki
  • Patent number: 5614165
    Abstract: A process for purification of hydrogen peroxide is provided which comprises contacting an aqueous hydrogen peroxide solution with a chelate resin. According to the process, it is possible to remove impurities in the aqueous hydrogen peroxide solution in high efficiency, and particularly, it is possible to remove iron, aluminum, etc., which are difficult to remove singly by ion exchange resins, up to extremely low concentrations. Highly pure hydrogen peroxide solutions obtained by this invention can suitably used for washing of silicon wafers.
    Type: Grant
    Filed: March 21, 1995
    Date of Patent: March 25, 1997
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Yasuo Sugihara, Kazushige Tanaka, Hisashi Sakaitani