Patents by Inventor HITACHI HIGH-TECHNOLOGIES CORPORATION

HITACHI HIGH-TECHNOLOGIES CORPORATION has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130112872
    Abstract: An object of the present invention is to provide a suitable method of observing a wafer edge by using an electron microscope. The electron microscope includes a column which can take an image in being tilted, and thus allows a wafer edge to be observed from an oblique direction.
    Type: Application
    Filed: October 8, 2012
    Publication date: May 9, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventor: Hitachi High-Technologies Corporation
  • Publication number: 20130108400
    Abstract: Transportation control in a vacuum processing device with high transportation efficiency without lowering throughput is provided. A control unit is configured to update in real time and holds device state information showing an action state of each of a process chamber, a transportation mechanism unit, a buffer room, and a holding mechanism unit, the presence of a process subject member, and a process state thereof; select a transport algorithm from among transport algorithm judgment rules that are obtained by simulating in advance a plurality of transport algorithms for controlling transportation of a process subject member for each condition of a combination of the number and arrangement of the process chambers and process time of a process subject member based on the device state information and process time of the process subject member; and compute a transport destination of the process subject member based on the selected transport algorithm.
    Type: Application
    Filed: October 2, 2012
    Publication date: May 2, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventor: Hitachi High-Technologies Corporation
  • Publication number: 20130100441
    Abstract: The invention provides an optical inspection apparatus having an edge inspection device capable of accommodating wide positional changes in the edges of wafers. The optical inspection apparatus comprises the following components: a surface inspection device 300 for inspecting the surfaces of a wafer 100 for defects; a wafer stage 210 located on the wafer transfer path along which the wafer 100 is transferred to the surface inspection device 300; an edge inspection module 530 for inspecting the edge of the wafer 100 when the wafer 100 is on the wafer stage 210; and a module mover 650 for moving the edge inspection module 530 along the optical axis of the edge inspection module 530.
    Type: Application
    Filed: October 24, 2012
    Publication date: April 25, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventor: Hitachi High-Technologies Corporation
  • Publication number: 20130097739
    Abstract: To detect both of near-field light and magnetic field generated by a thermal assist type magnetic head and to perform inspection of the head, a cantilever of a scanning probe microscope has a lever in which a probe is formed, a thin magnetic film formed on a surface of the probe, and fine particles or thin film of noble metal or an alloy including noble metal formed on a surface of the magnetic film. An inspection apparatus has the cantilever, a displacement detection unit to detect vibration of the cantilever, a near-field light detection unit to detect scattered light caused by near-field light generated from a near-field light emitter and enhanced on the surface of the probe of the cantilever, and a processing unit to process signals obtained by detection with the displacement detection unit and the near-field light detection unit.
    Type: Application
    Filed: October 12, 2012
    Publication date: April 18, 2013
    Inventor: Hitachi High-Technologies Corporation
  • Publication number: 20130087704
    Abstract: A gas field ionization ion source (GFIS) is characterized in that the aperture diameter of the extraction electrode can be set to any of at least two different values or the distance from the apex of the emitter to the extraction electrode can be set to any of at least two different values. In addition, solid nitrogen is used for cooling. It may be possible to not only let divergently emitted ions go through the aperture of the extraction electrode but also, in behalf of differential pumping, reduce the diameter of the aperture. In addition, it may be possible to reduce the physical vibration of the cooling means. Consequently, it may be possible to provide a highly stable GFIS and a scanning charged particle microscope equipped with such a GFIS.
    Type: Application
    Filed: September 21, 2012
    Publication date: April 11, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventor: Hitachi High-Technologies Corporation
  • Publication number: 20130075603
    Abstract: The present invention relates to a pretreatment apparatus that performs concentration and separation of a sample, and in particular, in order to provide a sample pretreatment apparatus using a solid-phase extraction column, and a mass spectrometer using the same, which is particularly suitable for clinical analysis in which qualitative/quantitative analysis of a biological sample such as blood is performed, according to each operational step for a solid-phase extraction treatment, for example, a collection device serving as flow passages or containers for collection of waste liquid or extracted matter is installed on a bottom face of the solid-phase extraction column, and the extracted matter is separately collected without being mixed with waste liquid by switching the positions of the collection device.
    Type: Application
    Filed: November 19, 2012
    Publication date: March 28, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventor: Hitachi High-Technologies Corporation
  • Publication number: 20130075036
    Abstract: A plasma processing apparatus includes a plasma-generation high-frequency power supply which generates plasma in a processing chamber, a biasing high-frequency power supply which applies high-frequency bias electric power to an electrode on which a sample is placed, a monitor which monitors a peak-to-peak value of the high-frequency bias electric power applied to the electrode, an electrostatic chuck power supply which makes the electrode electrostatically attract the sample, a self-bias voltage calculating unit which calculates self-bias voltage of the sample by monitoring the peak-to-peak value of the high-frequency bias electric power applied to the electrode, and an output voltage control unit which controls output voltage of the electrostatic chuck power supply based on the calculated self-bias voltage.
    Type: Application
    Filed: November 19, 2012
    Publication date: March 28, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventor: HITACHI HIGH-TECHNOLOGIES CORPORATION
  • Publication number: 20130033705
    Abstract: An inspection device for inspecting defects of an inspection object including a light source for irradiating a luminous flux to the inspection object; an optical system for guiding reflected light from the inspection object; a photoelectric image sensor having a plurality of photoelectric cells arranged, for converting the light guided to detection signals; a detection signal transfer unit having channels each constituted by a signal correction unit, a converter and an image formation unit, and corresponding to each of a plurality of regions formed by dividing the photoelectric image sensor, respectively; and an image synthesis unit for forming an image of the surface of the object by synthesizing partial images outputted; the inspection device inspecting defects of the object by processing the synthesized image; whereby it becomes possible to correct a detection signal from said photoelectric cell close to a predetermined reference target value.
    Type: Application
    Filed: October 9, 2012
    Publication date: February 7, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventor: HITACHI HIGH-TECHNOLOGIES CORPORATION
  • Publication number: 20130026363
    Abstract: The present invention provides a scanning charged particle beam device including a sample chamber (8) and a detector. The detector has: a function of detecting light at least ranging from the vacuum ultraviolet region to the visible light region, of light (17) having image information which is obtained by a light emission phenomenon of gas scintillation when the sample chamber is controlled to a low vacuum (1 Pa to 3,000 Pa); and a function of detecting ion currents (11, 13) having image information which are obtained by cascade amplification of electrons and gas molecules. Accordingly, it becomes possible to realize a device which can deal with observation of various samples. Further, an optimal configuration of the detection unit is devised, to thereby make it possible to add value to an obtained image and provide users in wide-ranging fields with the observation image.
    Type: Application
    Filed: October 2, 2012
    Publication date: January 31, 2013
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventor: HITACHI HIGH-TECHNOLOGIES CORPORATION