Abstract: To provide a means removing chlorine gas, which can remove chlorine gas contained in, for example, exhaust gas with high efficiency and does not require frequent exchange. A chlorine gas decomposition catalyst including a metal oxide (X), wherein the metal oxide (X) includes an oxide (X1) of at least one element selected from the group consisting of Ce and Co.

Abstract: To provide a process and an apparatus for treating a waste anesthetic gas containing a volatile anesthetic and nitrous oxide, discharged from an operating room. In the present invention, a waste anesthetic gas containing a volatile anesthetic and nitrous oxide is introduced into an adsorbing cylinder filled with an adsorbent, where the volatile anesthetic contained in the waste anesthetic gas is adsorbed and thereby removed, and successively this gas is introduced into a catalyst layer filled with a nitrous oxide decomposition catalyst, where nitrous oxide is decomposed into nitrogen and oxygen.

Abstract: To provide a process and an apparatus for treating a waste anesthetic gas containing a volatile anesthetic and nitrous oxide discharged from an operating room by introducing the gas into an adsorbing cylinder filled with an adsorbent, where the volatile anesthetic contained in the waste anesthetic gas is adsorbed and thereby removed, and successively introducing the gas into a catalyst layer filled with a nitrous oxide decomposition catalyst, where nitrous oxide is decomposed into nitrogen and oxygen. By using the process and the apparatus for treating a waste anesthetic gas of the present invention, a volatile anesthetic having a possibility of destroying the ozone layer or nitrous oxide as a global warming gas can be made harmless while preventing the release into atmosphere.

Abstract: Tetrafluorosilane is produced by a process comprising a step (1) of heating a hexafluorosilicate, a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas, a step (2-2) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a high valent metal fluoride, or a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas and a step (2-3) of reacting a tetrafluorosilane gas produced in the step (2-1) with a high valent metal fluoride. Further, impurities in high-purity tetrafluorosilane are analyzed.

Abstract: A method for decomposing nitrous oxide comprises contacting a catalyst for decomposing nitrous oxide with a nitrous oxide-containing gas at 200 to 600° C. The catalyst comprises a support and supported thereon at least one noble metal selected from rhodium, ruthenium and palladium. The support comprises silica or silica alumina. At least one metal selected from zinc, iron and manganese can be supported on the support.

Abstract: [Problem to be Solved]To provide a process and an apparatus for treating a waste anesthetic gas containing a volatile anesthetic and nitrous oxide, discharged from an operating room. [Means to Solve the Problem]A waste anesthetic gas containing a volatile anesthetic and nitrous oxide is introduced into an adsorbing cylinder filled with an adsorbent, where the volatile anesthetic contained in the waste anesthetic gas is adsorbed and thereby removed, and successively this gas is introduced into a catalyst layer filled with a nitrous oxide decomposition catalyst, where nitrous oxide is decomposed into nitrogen and oxygen.

Abstract: A step (1) of heating a fluoronickel compound to release a fluorine gas, a step (2) of allowing a fluorine gas to be occluded into a fluorinated compound, and a step (3) of heating the fluoronickel compound and reducing an inner pressure are conducted in a container, respectively, at least once, and thereafter a high-purity fluorine gas is obtained in the step (1). Also, a step (5) of heating a fluoronickel compound and reducing an inner pressure and a step (6) of allowing a fluorine gas reduced in a hydrogen fluoride content to be occluded into the fluoronickel compound are conducted in a container having a fluorinated layer formed on its surface, respectively, at least once, the step (5) is further conducted, and thereafter a fluorine gas containing impurity gases is contacted with the fluoronickel compound to fix and remove the fluorine gas, and the impurities are analyzed by gas chromatography.

Abstract: A reaction apparatus comprising a heat exchanger 5 and a reactor 1 with a heater 2, which are enclosed in an outer casing 6, the top of the heat exchanger 5 being connected to the reactor 1, the other end part of the heat exchanger 5 and the bottom of the outer casing 6 being fixed to each other by a flange 4, and a double piping 7 for introducing a gas to be treated and discharging the treated gas being connected to the other end part of the heat exchanger 5, such that the gas passes through the heat exchanger 5, the reactor 1 and the heat exchanger 5 during the process from introducing gas through one of the inner tube and the outer tube in the double piping to discharging the gas through the other tube, and reaction method using the apparatus. Using the apparatus of the present invention, the temperature distribution inside the reactor can be kept uniform and efficiency in energy recovery is enhanced.

Abstract: The invention relates to a catalyst for decomposing nitrous oxide, which is [1] a catalyst comprising a support having supported thereon aluminum, magnesium and rhodium, [2] a catalyst comprising an alumina support having supported thereon magnesium and rhodium, [3] a catalyst comprising a support having supported thereon rhodium, the support comprising a spinel crystalline composite oxide formed by magnesium and at least a part of aluminum, [4] a catalyst comprising a support having supported thereon aluminum, rhodium and at least one metal selected from zinc, iron, manganese and nickel, [5] a catalyst comprising an alumina support having supported thereon rhodium and at least one metal selected from zinc, iron, manganese and nickel, or [6] a catalyst comprising a support having supported thereon rhodium, the support comprising a spinel crystalline composite oxide formed by at least a part of aluminum and the at least one metal selected from zinc, iron, manganese and nickel.

Abstract: Tetrafluorosilane is produced by a process comprising a step (1) of heating a hexafluorosilicate, a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas, a step (2-2) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a highvalent metal fluoxide, or a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas and a step (2-3) of reacting a tetrafluorosilane gas produced in the step (2-1) with a highvalent metal fluoride. Further, impurities in high-purity tetrafluorosilane are analyzed.

Abstract: A step (1) of heating a fluoronickel compound to release a fluorine gas, a step (2) of allowing a fluorine gas to be occluded into a fluorinated compound, and a step (3) of heating the fluoronickel compound and reducing an inner pressure are conducted in a container, respectively, at least once, and thereafter a high-purity fluorine gas is obtained in the step (1). Also, a step (5) of heating a fluoronickel compound and reducing an inner pressure and a step (6) of allowing a fluorine gas reduced in a hydrogen fluoride content to be occluded into the fluoronickel compound are conducted in a container having a fluorinated layer formed on its surface, respectively, at least once, the step (5) is further conducted, and thereafter a fluorine gas containing impurity gases is contacted with the fluoronickel compound to fix and remove the fluorine gas, and the impurities are analyzed by gas chromatography.

Abstract: The present invention intends to provide an agent and a method for removing harmful gas, which exhibits high harm-removing ability per unit volume for harmful halogen-containing gas contained in the exhaust gas from the etching or cleaning step in the manufacturing process of a semiconductor device, and which is inexpensive. The invention is characterized by that halogen-containing gas is removed using a harm-removing agent comprising a specific iron oxide, an alkaline earth metal compound and activated carbon in the specific amount. In the case where the exhaust gas contains halogen gas such as chlorine or a gas such as sulfur dioxide, the gas is rendered harmless by using in combination a harm-removing agent comprising activated carbon or zeolite.

Abstract: A reactive agent for decomposing fluorine compounds comprising alumina and an alkaline earth metal compound; a process for decomposing fluorine compounds, comprising contacting the reactive agent with a fluorine compound at a temperature of 200° C. or more; and a process for manufacturing a semiconductor device, comprising an etching or cleaning and a decomposing using the reactive agent.

Abstract: To provide a process and an apparatus for treating a waste anesthetic gas containing a volatile anesthetic and nitrous oxide discharged from an operating room by introducing the gas into an adsorbing cylinder filled with an adsorbent, where the volatile anesthetic contained in the waste anesthetic gas is adsorbed and thereby removed, and successively introducing the gas into a catalyst layer filled with a nitrous oxide decomposition catalyst, where nitrous oxide is decomposed into nitrogen and oxygen. By using the process and the apparatus for treating a waste anesthetic gas of the present invention, a volatile anesthetic having a possibility of destroying the ozone layer or nitrous oxide as a global warming gas can be made harmless while preventing the release into atmosphere.

Abstract: To provide a catalyst obtained by loading at least one noble metal selected from the group consisting of rhodium, ruthenium and palladium on a support selected from silica and silica alumina, and a method for decomposing nitrous oxide using the catalyst thereof. The catalyst for decomposing nitrous oxide of the present invention cannot be easily affected by a volatile anesthetic contained in a waste anesthetic gas, can recover the activity by activation and regeneration even when deteriorated, and can reduce the amount of NOx generated to less than the allowable concentration.

Abstract: A reactive agent for decomposing fluorine compounds comprising alumina and an alkaline earth metal compound; a process for decomposing fluorine compounds, comprising contacting the reactive agent with a fluorine compound at a temperature of 200° C. or more; and a process for manufacturing a semiconductor device, comprising an etching or cleaning and a decomposing using the reactive agent.

Abstract: The present invention intends to provide an agent and a method for removing harmful gas, which exhibits high harm-removing ability per unit volume for harmful halogen-containing gas contained in the exhaust gas from the etching or cleaning step in the manufacturing process of a semiconductor device, and which is inexpensive.

Abstract: A method for decomposing nitrogen fluoride or sulfur fluoride, comprising contacting gaseous nitrogen fluoride or sulfur fluoride with a solid reagent comprising elemental carbon, one or more of the alkaline earth metal elements and optionally one or more of the alkali metal elements, to fix the fluorine component in the nitrogen fluoride or sulfur fluoride in said reagent.

Abstract: The invention relates to a catalyst for decomposing nitrous oxide, which is [1] a catalyst comprising a support having supported thereon aluminum, magnesium and rhodium, [2] a catalyst comprising an alumina support having supported thereon magnesium and rhodium, [3] a catalyst comprising a support having supported thereon rhodium, the support comprising a spinel crystalline composite oxide formed by magnesium and at least a part of aluminum, [4] a catalyst comprising a support having supported thereon aluminum, rhodium and at least one metal selected from zinc, iron, manganese and nickel, [5] a catalyst comprising an alumina support having supported thereon rhodium and at least one metal selected from zinc, iron, manganese and nickel, or [6] a catalyst comprising a support having supported thereon rhodium, the support comprising a spinel crystalline composite oxide formed by at least a part of aluminum and the at least one metal selected from zinc, i

Abstract: A reactive agent for decomposing fluorine compounds comprising alumina and an alkaline earth metal compound; a process for decomposing fluorine compounds, comprising contacting the reactive agent with a fluorine compound at a temperature of 200° C. or more; and a process for manufacturing a semiconductor device, comprising an etching or cleaning and a decomposing using the reactive agent.