Patents by Inventor Hitoshi Kubota

Hitoshi Kubota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7556869
    Abstract: Localized temperature increases inside integrated circuits due to heating at operation are prevented or controlled by electronic devices or wirings with CPP (current-perpendicular-to-plane) structures which have a current cooling effect. A CPP structure refers to a structure comprising a columnar electrically conductive portion and an insulator portion surrounding the conductive portion. The columnar portion is formed from a multilayered structure in a direction perpendicular to the plane of the layers, so as to allow a current to flow from an upper layer to a lower layer (or vice versa). The cooling effect is induced by current at the interface (or a plural of interfaces) of appropriately selected different kinds of materials (which are conductive substances in general, such as metals, semiconductors, and alloys thereof) in the columnar portion due to the Peltier effect when a current flows through the column. Temperature in a minute range is detected by a thermocouple with the CPP structure.
    Type: Grant
    Filed: September 9, 2005
    Date of Patent: July 7, 2009
    Assignee: National Institute of Advanced Industrial Science and Technology
    Inventors: Akio Fukushima, Hitoshi Kubota, Atsushi Yamamoto
  • Publication number: 20090029994
    Abstract: The present invention relates to a compound of the general formula (1): wherein, Y is a methylene group, and the like; A is an optionally substituted heterocyclic group, and the like; B is an optionally substituted phenyl group, and the like; R1 is an optionally substituted alkyl group, and the like; and R2 is an optionally substituted amino group, and the like; or a pharmaceutically acceptable derivative thereof, which has an inhibitory activity against cholesteryl ester transfer protein (CETP), thereby being useful for prophylaxis and/or treatment of arteriosclerotic diseases, hyperlipemia or dyslipidemia, and the like.
    Type: Application
    Filed: July 28, 2008
    Publication date: January 29, 2009
    Applicant: Mitsubishi Tanabe Pharma Corporation
    Inventors: Yoshinori Nakamura, Norimitsu Hayashi, Takanori Higashijima, Hitoshi Kubota, Kozo Oka
  • Publication number: 20090023729
    Abstract: The present invention relates to a compound of the general formula (1): wherein, Y is a methylene group, and the like; A is an optionally substituted heterocyclic group, and the like; B is an optionally substituted heterocyclic group, and the like; R1 is an optionally substituted alkyl group, wherein the alkyl group further may optionally be substituted by an optionally substituted homocyclic group, and the like; and R2 is an optionally substituted amino group, and the like; or a pharmaceutically acceptable derivative thereof, which has an inhibitory activity against cholesteryl ester transfer protein (CETP), thereby being useful for prophylaxis and/or treatment of arteriosclerotic diseases, hyperlipemia or dyslipidemia, and the like.
    Type: Application
    Filed: July 28, 2008
    Publication date: January 22, 2009
    Applicant: Mitsubishi Tanabe Pharma Corporation
    Inventors: Yoshinori Nakamura, Norimitsu Hayashi, Takanori Higashijima, Hitoshi Kubota, Kozo Oka
  • Publication number: 20080302964
    Abstract: A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined changed state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.
    Type: Application
    Filed: August 12, 2008
    Publication date: December 11, 2008
    Inventors: Hiroyuki Shinada, Mari Nozoe, Haruo Yoda, Kimiaki Ando, Katsuhiro Kuroda, Yutaka Kaneko, Maki Tanaka, Shunji Maeda, Hitoshi Kubota, Aritoshi Sugimoto, Katsuya Sugiyama, Atsuko Takafuji, Yusuke Yajima, Hiroshi Tooyama, Tadao Ino, Takashi Hiroi, Kazushi Yoshimura, Yasutsugu Usami
  • Patent number: 7460220
    Abstract: A method of inspecting a specimen, including: emitting a light from a lamp of a light source; illuminating a specimen on which plural patterns are formed with the light emitted from the light source and, passed through an objective lens; forming an optical image of the specimen by collecting light reflected from the specimen by the illuminating and passed through the objective lens and a image forming lens; detecting the optical image with a TDI image sensor; and processing a signal outputted from the TDI image sensor and detecting a defect of a pattern among the plural patterns formed on the specimen, wherein the image detected by the TDI image sensor is formed with light having a wavelength selected from the wavelengths of the light emitted from the light source.
    Type: Grant
    Filed: November 29, 2006
    Date of Patent: December 2, 2008
    Assignee: Renesas Technology Corporation
    Inventors: Shunji Maeda, Yasuhiko Nakayama, Minoru Yoshida, Hitoshi Kubota, Kenji Oka
  • Patent number: 7417444
    Abstract: A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined charged state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.
    Type: Grant
    Filed: November 9, 2005
    Date of Patent: August 26, 2008
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyuki Shinada, Mari Nozoe, Haruo Yoda, Kimiaki Ando, Katsuhiro Kuroda, Yutaka Kaneko, Maki Tanaka, Shunji Maeda, Hitoshi Kubota, Aritoshi Sugimoto, Katsuya Sugiyama, Atsuko Takafuji, Yusuke Yajima, Hiroshi Tooyama, Tadao Ino, Takashi Hiroi, Kazushi Yoshimura, Yasutsugu Usami
  • Publication number: 20070297407
    Abstract: A communication apparatus that constitutes a communication system including a group of communication apparatuses identified by a first identifier, and includes a storage unit, a control unit, and a broadcasting unit. The storage unit is configured to store a first identifier of a group to which the communication apparatus belongs. The control unit controls exchange of signals for setting a first identifier. The broadcasting unit broadcasts a first-identifier request signal to other communication apparatuses. Upon receipt of a first-identifier notification signal that includes a first identifier in response to the first-identifier request signal, the control unit stores the first identifier in the storage unit for use in communication.
    Type: Application
    Filed: June 21, 2007
    Publication date: December 27, 2007
    Applicant: Renesas Technology Corp.
    Inventor: Hitoshi Kubota
  • Publication number: 20070082896
    Abstract: A novel compound of the formula (I): wherein R1 is alkoxycarbonyl or the like, R2 is alkyl or the like; R3 is hydrogen or the like; R4 is alkylene or the like; R5 is optionally substituted heterocyclic group; R6, R7, R8 and R9 are independently hydrogen; alkyl, alkoxy, or the like; R10 is optionally substituted aromatic ring, or the like; or a pharmaceutically acceptable salt thereof, which has an inhibitory activity against cholesteryl ester transfer protein (CETP).
    Type: Application
    Filed: September 27, 2006
    Publication date: April 12, 2007
    Inventors: Hitoshi Kubota, Masakatsu Sugahara, Mariko Furukawa, Mayumi Takano, Daisuke Motomura
  • Publication number: 20070070336
    Abstract: A method of inspecting a specimen, including: emitting a light from a lamp of a light source; illuminating a specimen on which plural patterns are formed with the light emitted from the light source and, passed through an objective lens; forming an optical image of the specimen by collecting light reflected from the specimen by the illuminating and passed through the objective lens and a image forming lens; detecting the optical image with a TDI image sensor; and processing a signal outputted from the TDI image sensor and detecting a defect of a pattern among the plural patterns formed on the specimen, wherein the image detected by the TDI image sensor is formed with light having a wavelength selected from the wavelengths of the light emitted from the light source.
    Type: Application
    Filed: November 29, 2006
    Publication date: March 29, 2007
    Inventors: Shunji Maeda, Yasuhiko Nakayama, Minoru Yoshida, Hitoshi Kubota, Kenji Oka
  • Patent number: 7180584
    Abstract: A pattern detection method and apparatus thereof for inspecting with high resolution a micro fine defect of a pattern on an inspected object and a semiconductor substrate manufacturing method and system for manufacturing semiconductor substrates such as semiconductor wafers with a high yield. A micro fine pattern on the inspected object is inspected by irradiating an annular-looped illumination through an objective lens onto a wafer mounted on a stage, the wafer having micro fine patterns thereon. The illumination light may be circularly or elliptically polarized and controlled according to an image detected on the pupil of the objective lens and image signals are obtained by detecting a reflected light from the wafer. The image signals are compared with reference image signals and a part of the pattern showing inconsistency is detected as a defect so that simultaneously, a micro fine defect or defects on the micro fine pattern are detected with high resolution.
    Type: Grant
    Filed: October 17, 2003
    Date of Patent: February 20, 2007
    Assignee: Renesas Technology Corp.
    Inventors: Shunji Maeda, Yasuhiko Nakayama, Minoru Yoshida, Hitoshi Kubota, Kenji Oka
  • Publication number: 20070032485
    Abstract: A novel compound of the formula (I): wherein R1 is alkoxycarbonyl or the like, R2 is alkyl or the like; R3 is hydrogen or the like; R4 is alkylene or the like; R5 is optionally substituted heterocyclic group; R6, R7, and R8 are independently hydrogen; alky, alkoxy, or the like; R10 is optionally substituted aromatic ring, or the like; or a pharmaceutically acceptable salt thereof, which has an inhibitory activity against cholesteryl ester transfer protein (CETP).
    Type: Application
    Filed: September 27, 2006
    Publication date: February 8, 2007
    Inventors: Hitoshi Kubota, Yoshinori Nakamura, Takanori Higashijima, Yasuo Yamamoto, Kozo Oka, Shigeki Igarashi
  • Patent number: 7061600
    Abstract: A pattern detection method and apparatus for inspecting, with high resolution, a micro fine defect of a pattern on an inspected object, and a semiconductor substrate manufacturing method and system with a high yield. A micro fine pattern on the inspected object is inspected by annular-looped illumination through an objective lens onto a wafer, the wafer having micro fine patterns thereon. The illumination may be polarized and controlled according to an image detected on the pupil of the objective lens, and image signals are obtained by detecting a reflected light from the wafer. The image signals are compared with reference image signals and a part of the pattern showing inconsistency is detected as a defect. Simultaneously, micro fine defects on the micro-fine pattern are detected with high resolution. Further, process conditions of a manufacturing line are controlled by analyzing a cause of defect and a factor of defect.
    Type: Grant
    Filed: March 18, 2002
    Date of Patent: June 13, 2006
    Assignee: Renesas Technology Corp.
    Inventors: Shunji Maeda, Yasuhiko Nakayama, Minoru Yoshida, Hitoshi Kubota, Kenji Oka
  • Patent number: 7026830
    Abstract: To make possible the in-line inspection of a pattern of an insulating material. A patterned wafer 40 formed with a pattern by a resist film is placed on a specimen table 21 of a patterned wafer inspection apparatus 1 in opposed relation to a SEM 3. An electron beam 10 of a large current is emitted from an electron gun 11 and the pattern of the patterned wafer is scanned only once at a high scanning rate. The secondary electrons generated by this scanning from the patterned wafer are detected by a secondary electron detector 16 thereby to acquire an electron beam image. Using this electron beam image, the comparative inspection is conducted on the patterned wafer through an arithmetic operation unit 32 and a defect determining unit 33. Since an electron beam image of high contrast can be obtained by scanning an electron beam only once, a patterned wafer inspection method using a SEM can be implemented in the IC fabrication method.
    Type: Grant
    Filed: March 6, 2003
    Date of Patent: April 11, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyuki Shinada, Mari Nozoe, Haruo Yoda, Kimiaki Ando, Katsuhiro Kuroda, Yutaka Kaneko, Maki Tanaka, Shunji Maeda, Hitoshi Kubota, Aritoshi Sugimoto, Katsuya Sugiyama, Atsuko Takafuji, Yusuke Yajima, Hiroshi Tooyama, Tadao Ino, Takashi Hiroi, Kazushi Yoshimura, Yasutsugu Usami
  • Publication number: 20060056113
    Abstract: Localized temperature increases inside integrated circuits due to heating at operation are prevented or controlled by electronic devices or wirings with CPP (current-perpendicular-to-plane) structure which has a current cooling effect. The CPP structure refers to a structure comprising a columnar electrically conductive portion and an insulator portion surrounding the conductive portion. The columnar portion is formed from the multilayered structure in a direction perpendicular to the plane of the layers, so as to allow a current to flow from an upper layer to a lower layer (or vice versa). The cooling effect is induced by current at the interface (or a plural of interfaces) of appropriately selected different kinds of materials (which are conductive substances in general, such as metals, semiconductors, and alloys thereof) in the columnar portion due to the Peltier effect when a current flows through the column. Temperature in minute range is detected by thermocouple with CPP structure.
    Type: Application
    Filed: September 9, 2005
    Publication date: March 16, 2006
    Inventors: Akio Fukushima, Hitoshi Kubota, Atsushi Yamamoto
  • Publication number: 20060043982
    Abstract: A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined charged state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.
    Type: Application
    Filed: November 9, 2005
    Publication date: March 2, 2006
    Inventors: Hiroyuki Shinada, Mari Nozoe, Haruo Yoda, Kimiaki Ando, Katsuhiro Kuroda, Yutaka Kaneko, Maki Tanaka, Shunji Maeda, Hitoshi Kubota, Aritoshi Sugimoto, Katsuya Sugiyama, Atsuko Takafuji, Yusuke Yajima, Hiroshi Tooyama, Tadao Ino, Takashi Hiroi, Kazushi Yoshimura, Yasutsugu Usami
  • Patent number: 6941200
    Abstract: A waiting time of an automated guided vehicle is substantially eliminated by significantly shortening the communication time of various information, and the transport efficiency of an automated guided vehicle as well as the operating rate of work stations and production lines as a whole are improved, and in addition, the flexibility of an operation control system for the automated guided vehicle is improved. An automated guided vehicle (1) includes a wireless local area network adapter (11) for passing information by radio with an operation control unit connected to the local area network or with another automated guided vehicle, a memory part (12) for storing at least information from the operation control unit or from another automated guided vehicle and information related to the automated guided vehicle itself, and a control part (14) for controlling the wireless local area network adapter and the memory part.
    Type: Grant
    Filed: October 15, 2001
    Date of Patent: September 6, 2005
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Osamu Sonoyama, Takahiro Yokomae, Yoichi Sugitomo, Masahide Yoshihara, Osamu Matsushima, Toyotoshi Tsujikawa, Takeshi Asano, Hitoshi Kubota
  • Publication number: 20050052642
    Abstract: The present invention relates to a high-sensitivity inspection method and apparatus adapted for the fine-structuring of patterns, wherein defect inspection sensitivity is improved using the following technologies: detection optical system is improved in resolution by filling the clearance between an objective lens 30 and a sample 1, with a liquid, and increasing effective NA (Numerical Aperture); and when a transparent interlayer-insulating film is formed on the surface of the sample, amplitude splitting at the interface between the liquid and the insulating film is suppressed for reduction in the unevenness of optical images in brightness due to interference of thin-film, by immersing the clearance between the objective lens and the sample, with a liquid of a refractive index close to that of the transparent film.
    Type: Application
    Filed: July 20, 2004
    Publication date: March 10, 2005
    Inventors: Yukihiro Shibata, Shunji Maeda, Hitoshi Kubota
  • Publication number: 20040122570
    Abstract: A waiting time of an automated guided vehicle is substantially eliminated by significantly shortening the communication time of various information, and the transport efficiency of an automated guided vehicle as well as the operating rate of work stations and production lines as a whole are improved, and in addition, the flexibility of an operation control system for the automated guided vehicle is improved. An automated guided vehicle 1 includes a wireless local area network adapter 11 for passing information by radio with an operation control unit connected to the local area network or with another automated guided vehicle, a memory part 12 for storing at least information from the operation control unit or from another automated guided vehicle and information related to the automated guided vehicle itself, and a control part 14 for controlling the wireless local area network adapter and the memory part.
    Type: Application
    Filed: June 16, 2003
    Publication date: June 24, 2004
    Inventors: Osamu Sonoyama, Takahiro Yokomae, Yoichi Sugitomo, Masahide Yoshihara, Osamu Matsushima, Toyotoshi Tsujikawa, Takeshi Asano, Hitoshi Kubota
  • Publication number: 20040075837
    Abstract: A pattern detection method and apparatus thereof for inspecting with high resolution a micro fine defect of a pattern on an inspected object and a semiconductor substrate manufacturing method and system for manufacturing semiconductor substrates such as semiconductor wafers with a high yield. A micro fine pattern on the inspected object is inspected by irradiating an annular-looped illumination through an objective lens onto a wafer mounted on a stage, the wafer having micro fine patterns thereon. The illumination light may be circularly or elliptically polarized and controlled according to an image detected on the pupil of the objective lens and image signals are obtained by detecting a reflected light from the wafer. The image signals are compared with reference image signals and a part of the pattern showing inconsistency is detected as a defect so that simultaneously, a micro fine defect or defects on the micro fine pattern are detected with high resolution.
    Type: Application
    Filed: October 17, 2003
    Publication date: April 22, 2004
    Inventors: Shunji Maeda, Yasuhiko Nakayama, Minoru Yoshida, Hitoshi Kubota, Kenji Oka
  • Patent number: 6627201
    Abstract: The composition for beverages/food of the present invention is a mixture of the AGARICUS BLAZEI MURRILL fruiting body and mycelium extract in a ratio by dry weight of 1:0.05 to 1:0.5, and chlorella growth factor. The ratio by dry weight of said mixture and chlorella growth factor is 1:0.05 to 1:1.
    Type: Grant
    Filed: April 1, 2002
    Date of Patent: September 30, 2003
    Assignee: Kabushiki Kaisha Sun Chlorella
    Inventors: Takayoshi Ichinose, Yo Naoki, Toru Mizoguchi, Yasuaki Nanba, Hitoshi Kubota