Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and first and second electrode layers. The ceramic dielectric substrate includes first and second major surfaces. The first and second electrode layers are provided inside the ceramic dielectric substrate. The first electrode layer includes first and second portions. The first portion is positioned more centrally of the ceramic dielectric substrate than is the second portion. The first portion includes first and second surfaces. The second portion includes third and fourth surfaces. A distance between the third surface and the first major surface is constant. A thickness of the second portion between the third and fourth surfaces varies such that the thickness at a circumferential end portion of the second portion which is less than that at a central portion of the second portion.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and first and second electrode layers. The ceramic dielectric substrate includes first and second major surfaces. The first and second electrode layers are provided inside the ceramic dielectric substrate. The first electrode layer includes first and second portions. The first portion is positioned more centrally of the ceramic dielectric substrate than is the second portion. The first portion includes first and second surfaces. The second portion includes third and fourth surfaces. A distance between the fourth surface and the first major surface is constant. A thickness of the second portion between the third and fourth surfaces varies such that the thickness at a circumferential end portion of the second portion which is less than that at a central portion of the second portion.

Abstract: There is provided a device that enables an operator of a work machine to recognize whether or not an object exists in the periphery of the work machine with an appropriate amount of information from the viewpoint of avoiding a reduction in focus of the operator of the work machine. When the state of operation of an operation device 400 performed by an operator is a “first operation state”, and an object exists in a target space around a work machine 200, an alarm is output in a “first mode”. When the state of operation of the operation device 400 performed by the operator is a “second operation state”, and an object exists in the target space around the work machine 200, an alarm is output in a “second mode” in which a larger amount of information is provided than in the “first mode”.

Abstract: A periphery monitoring apparatus for a work machine determines at least one part of a plurality of target spaces as a “first designated target space”, according to an action mode of the work machine, which is predicted on the basis of an operation state by the operator of an operating device of the work machine. When a position of the object is included in the first designated target space, an alarm is output by the first designated output device that is arranged in an azimuth corresponding to an azimuth of the first designated target space with reference to the work machine, with reference to a location of the operator in a driving space of the work machine. The alarm is differentiated according to a varying mode of a relative position between the work machine and the object.

Abstract: In one non-limiting embodiment, the present disclosure relates to lyophilized formulations containing an IL-31 antagonist (for example, an anti-IL-31RA antibody) as an active ingredient, the lyophilized formulations further containing arginine and/or a salt thereof and sucrose and/or trehalose. In another non-limiting embodiment, the present disclosure relates to solution formulations containing an IL-31 antagonist as an active ingredient, the solution formulations further containing arginine and/or a salt thereof.

Abstract: A server causes an information terminal device to display a selection image for allowing an operator to select a desired operation among one or more operations and a desired master device among one or more master devices based on operation request information stored in a first database and master device information stored in a second database. The information terminal device sends to the server a selection instruction of the operator who selects the desired operation and the desired master device via the selection image. The server receives an operation order acceptance of the operator by storing, in an operation plan database, an operator ID, a master device ID and the operation designated by the selection instruction in combination with one another.

Abstract: A vehicle behavior stabilization system includes a yaw moment applying device configured to apply a yaw moment to the vehicle, a vehicle behavior stabilization control unit configured to selectively control the yaw moment applying device in such a way to stabilize a vehicle behavior according to a computed rear wheel slip angle in relation to a start threshold value and an end threshold value, and a threshold value correcting unit configured to correct the start threshold value and the end threshold value according to a change rate of the computed rear wheel slip angle and/or a change rate of a computed vehicle body slip angle.

Abstract: A surrounding monitoring apparatus enables an operator of a work machine to recognize the situation in the surroundings of the work machine at an appropriate timing. The apparatus includes an operation state detector detecting an operation state which is a state of an operation applied to an operation device for operating a work machine by the operator, a surrounding object detection part detecting the presence or absence of an object in a target space around the work machine, a speaker for outputting notification information to the operator, and an output information control unit making the speaker output a sound indicating a result of the detection by the surrounding object detection unit in response to the detection of an initial operation state where an initial operation for starting the work machine is applied to the operation device by the operation state detector.

Abstract: In one non-limiting embodiment, the present disclosure relates to lyophilized formulations containing an IL-31 antagonist (for example, an anti-IL-31RA antibody) as an active ingredient, the lyophilized formulations further containing arginine and/or a salt thereof and sucrose and/or trehalose. In another non-limiting embodiment, the present disclosure relates to solution formulations containing an IL-31 antagonist as an active ingredient, the solution formulations further containing arginine and/or a salt thereof.

Abstract: An electrostatic chuck includes: a ceramic dielectric substrate; a base plate; and a heater plate. The heater plate includes a first and a second support plates including a metal, a heater element provided between the first and the second support plates, a first resin layer provided between the first support plate and the heater element, and a second resin layer provided between the second support plate and the heater element. A surface of the first support plate on the second support plate side includes a first region and a second region, the first region overlapping the heater element when viewed along the stacking direction, the second region not overlapping the heater element when viewed along the stacking direction. In a cross section parallel to the stacking direction, the second region protrudes toward the second support plate side compared to the first region.

Abstract: A coil device includes a main core and a sub core. The main core includes a middle leg for winding a coil body and an outer leg connected with the middle leg via a base portion. The sub core is disposed to face the base portion across the middle leg. A gap between the middle leg and the sub core is wider than that between the outer leg and the sub core.

Abstract: The present invention relates to stable antibody-containing solution formulations in which aggregate formation of Emicizumab (ACE910) which is a bispecific antibody functionally substituting for FVIII, is suppressed. Specifically, the present invention relates to the above-mentioned antibody-containing solution formulations of pH 4.5 to 6.5 that contain the aforementioned bispecific antibody at 20 to 180 mg/mL, 10 mM to 40 mM histidine-aspartate buffer, Poloxamer 188 at 0.2 to 1 mg/mL, and 100 mM to 300 mM arginine.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate having a first major surface placing an object to be processed and a second major surface on an opposite side of the first major surface, and a base plate provided on a side of the second major surface and supporting the ceramic dielectric substrate. The base plate includes a first communicating passage passing a medium which adjusts a temperature of the object to be processed. The first communicating passage has an upper surface, a side surface, and a lower surface. A ratio of variation of a maximum height Sz in the upper surface to a height of the first communicating passage is not more than 1%.

Abstract: A correction value for matching an operation characteristic of a slave operating device with an operation characteristic of a master operating device is registered in advance in a correction table for each combination of type information of a construction machine and type information of the slave operating device. A controller acquires, from correction information, a correction value corresponding to a combination of the type information of the construction machine and the type information of the slave operating device received by a communication unit, corrects an amount of operation accepted by an operating lever based on the acquired correction value, and transmits the corrected amount of operation to the communication unit.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and first and second electrode layers. The ceramic dielectric substrate includes first and second major surfaces. The first and second electrode layers are provided inside the ceramic dielectric substrate. The second electrode layer is provided between the first electrode layer and the first major surface. The first electrode layer includes first and second portions. The first portion is positioned more centrally of the ceramic dielectric substrate than is the second portion. The first portion includes first and second surfaces. The second portion includes third and fourth surfaces. The third surface is positioned between the first surface and the second electrode layer. An electrical resistance of the first surface is less than an average electrical resistance of the first portion.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and first and second electrode layers. The ceramic dielectric substrate includes first and second major surfaces. The first and second electrode layers are provided inside the ceramic dielectric substrate. The second electrode layer is provided between the first electrode layer and the first major surface. The first electrode layer includes first and second portions. The first portion is positioned more centrally of the ceramic dielectric substrate than is the second portion. The first portion includes first and second surfaces. The second portion includes third and fourth surfaces. The third surface is positioned between the first surface and the second electrode layer. An electrical resistance of the first surface is greater than an average electrical resistance of the first portion.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and first and second electrode layers. The ceramic dielectric substrate includes first and second major surfaces. The first and second electrode layers are provided inside the ceramic dielectric substrate. The first electrode layer includes first and second portions. The first portion is positioned more centrally of the ceramic dielectric substrate than is the second portion. The first portion includes first and second surfaces. The second portion includes third and fourth surfaces. A distance between the fourth surface and the first major surface is constant. A thickness of the second portion between the third and fourth surfaces varies such that the thickness at a circumferential end portion of the second portion which is less than that at a central portion of the second portion.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and first and second electrode layers. The ceramic dielectric substrate includes first and second major surfaces. The first and second electrode layers are provided inside the ceramic dielectric substrate. The first electrode layer includes first and second portions. The first portion is positioned more centrally of the ceramic dielectric substrate than is the second portion. The first portion includes first and second surfaces. The second portion includes third and fourth surfaces. A distance between the third surface and the first major surface is constant. A thickness of the second portion between the third and fourth surfaces varies such that the thickness at a circumferential end portion of the second portion which is less than that at a central portion of the second portion.

Abstract: According to one embodiment, an electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a first electrode layer. The ceramic dielectric substrate has first and second major surfaces. The first electrode layer is provided inside the ceramic dielectric substrate. The first electrode layer is connected to a high frequency power supply. The first electrode layer has a first surface at the first major surface side and a second surface at a side opposite to the first surface. The first electrode layer includes a first portion including the first surface. The first electrode layer includes a ceramic component and a metal component. A concentration of the metal component in the first portion is higher than an average concentration of the metal component in the first electrode layer.

Abstract: An electrostatic chuck includes a ceramic dielectric substrate, a base plate, and a heater plate. The heater plate is provided between the ceramic dielectric substrate and the base plate. The heater plate includes first and second support plates, first and second resin layers, and a heater element. Each of the first and second resin layers is provided between the first support plate and the second support plate. The heater element includes first and second electrically conductive portions. The first electrically conductive portion is provided between the first resin layer and the second resin layer. The second electrically conductive portion is separated from the first electrically conductive portion in an in-plane direction. The first resin layer contacts the second resin layer between the first electrically conductive portion and the second electrically conductive portion.