Abstract: A method for measuring a substrate is provided. The method comprises irradiating a measurement beam into a site box of an identifiable pattern of a substrate, detecting a center position of the irradiated measurement beam, calculating an amount of shift of the center position of the measurement beam from the center position of the site box, and correcting the center position of the measurement beam to the center position of the site box by compensating the calculated amount of shift.

Abstract: A method for measuring a substrate is provided. The method comprises irradiating a measurement beam into a site box of an identifiable pattern of a substrate, detecting a center position of the irradiated measurement beam, calculating an amount of shift of the center position of the measurement beam from the center position of the site box, and correcting the center position of the measurement beam to the center position of the site box by compensating the calculated amount of shift.

Abstract: An ionizer includes a body extending in a first direction, a sheath gas nozzle installed in a lower portion of the body and having a spray hole and an electrode needle disposed within the spray hole to generate a corona discharge, a gas supply provided in the body and configured to be in fluid communication with the spray hole to supply a gas to the spray hole such that ions generated by the electrode needle are spayed out to the outside of the ionizer from the spray hole, and a pair of first and second guiding plates disposed at opposite sides of the sheath gas nozzle and extending downward from first and second sides of the body opposite to each other to guide the ions sprayed from the spray hole to be directed to a target. A semiconductor device may be manufactured using the ionizer.

Abstract: A load port module includes a plate to support at least one substrate, a sensor to detect foreign matter at a predetermined location, and a cleaner to remove the foreign matter at the predetermined location when the foreign matter is detected by the sensor. The cleaner removes the foreign matter at the predetermined location in synchronism with movement of the plate. A mover to move the plate continues to operate after detection of the foreign matter by the sensor and removal of the foreign matter by the cleaner.

Abstract: A substrate transfer system includes a substrate transfer chamber between a substrate receiving port and a process chamber, the substrate transfer chamber providing a space for transferring a substrate between the substrate receiving port and the process chamber, and an ionizer within the substrate transfer chamber, the ionizer including a light source to irradiate electromagnetic waves having a predetermined radiation angle toward the substrate to eliminate static electricity of the substrate.

Abstract: An ionizer includes a body extending in a first direction, a sheath gas nozzle installed in a lower portion of the body and having a spray hole and an electrode needle disposed within the spray hole to generate a corona discharge, a gas supply provided in the body and configured to be in fluid communication with the spray hole to supply a gas to the spray hole such that ions generated by the electrode needle are spayed out to the outside of the ionizer from the spray hole, and a pair of first and second guiding plates disposed at opposite sides of the sheath gas nozzle and extending downward from first and second sides of the body opposite to each other to guide the ions sprayed from the spray hole to be directed to a target. A semiconductor device may be manufactured using the ionizer.

Abstract: A device to inspect a non-pattern wafer includes a light source to emit light that reflected from a wafer. A judgment unit converts the detected light into a quantitative measured value to determine whether the wafer is faulty. The wafer comprises a first region and a second region. The detection unit sequentially detects lights reflected from the first and second regions of the wafer, and a judgment unit converts the lights reflected from the first and second regions of the wafer into first and second quantitative measured values, respectively. The second region of the wafer is determined to be faulty by comparing the second measured value with a first reference value, wherein the first reference value is calculated using an average value between the first and second measured values, and a characteristic value that indicates distribution of the first and second measured values.

Abstract: A load port module includes a plate to support at least one substrate, a sensor to detect foreign matter at a predetermined location, and a cleaner to remove the foreign matter at the predetermined location when the foreign matter is detected by the sensor. The cleaner removes the foreign matter at the predetermined location in synchronism with movement of the plate. A mover to move the plate continues to operate after detection of the foreign matter by the sensor and removal of the foreign matter by the cleaner.

Abstract: A device to inspect a non-pattern wafer includes a light source to emit light that reflected from a wafer. A judgment unit converts the detected light into a quantitative measured value to determine whether the wafer is faulty. The wafer comprises a first region and a second region. The detection unit sequentially detects lights reflected from the first and second regions of the wafer, and a judgment unit converts the lights reflected from the first and second regions of the wafer into first and second quantitative measured values, respectively. The second region of the wafer is determined to be faulty by comparing the second measured value with a first reference value, wherein the first reference value is calculated using an average value between the first and second measured values, and a characteristic value that indicates distribution of the first and second measured values.

Abstract: A reference value setting unit of a specimen inspection apparatus comprises a calibration specimen, a calibration light source for emitting a predetermined light to the calibration specimen, at least one detector for receiving a first light-scattering signal reflected through the calibration specimen as well as a second light-scattering signal reflected from an inspection specimen, and a detector calibration unit for comparing a measured value measured from the calibration specimen with a reference value for the detector, and for calculating an offset value for calibration based on the comparison to calibrate the detector.

Abstract: A sample holder and auxiliary apparatus are provided to position and hold a sample in the sample holder. A method of positioning and holding a sample in the sample holder is also provided. The sample holder preferably includes a holder body having a sample holding portion arranged therein. An opening in the sample holding portion is configured to receive a sample therein. An elastic member is configured to supply a holding force to hold the sample in the opening. The auxiliary apparatus preferably includes one or more holder supports configured to support a sample holder. The auxiliary apparatus is configured to receive the sample holder and force a sample holding member of the sample holder into a rearward position to permit the sample holder to receive a sample into an opening thereof.

Abstract: A sample holder and auxiliary apparatus are provided to position and hold a sample in the sample holder. A method of positioning and holding a sample in the sample holder is also provided. The sample holder preferably includes a holder body having a sample holding portion arranged therein. An opening in the sample holding portion is configured to receive a sample therein. An elastic member is configured to supply a holding force to hold the sample in the opening. The auxiliary apparatus preferably includes one or more holder supports configured to support a sample holder. The auxiliary apparatus is configured to receive the sample holder and force a sample holding member of the sample holder into a rearward position to permit the sample holder to receive a sample into an opening thereof.

Abstract: A sample holder and auxiliary apparatus are provided to position and hold a sample in the sample holder. A method of positioning and holding a sample in the sample holder is also provided. The sample holder preferably includes a holder body having a sample holding portion arranged therein. An opening in the sample holding portion is configured to receive a sample therein. An elastic member is configured to supply a holding force to hold the sample in the opening. The auxiliary apparatus preferably includes one or more holder supports configured to support a sample holder. The auxiliary apparatus is configured to receive the sample holder and force a sample holding member of the sample holder into a rearward position to permit the sample holder to receive a sample into an opening thereof.