Abstract: According to an example embodiment, a position arrangement device includes at least one joint module between a first base and a second base. The at least one joint module is configured to adjust a position of the second base relative to the first base based on elastic flexion in the joint module.

Abstract: A method to compress exposure data may include converting image data into a plurality of exposure data, generating new exposure data by combining part of the plurality of exposure data or by excluding part of the plurality of exposure data, and compressing the new exposure data. An exposure apparatus may include a conversion unit that converts image data into a plurality of exposure data, a control unit that generates new exposure data by combining part of the plurality of exposure data or by excluding part of the plurality of exposure data, and a compression unit that compresses the new exposure data.

Abstract: According to an example embodiment, a position arrangement device includes at least one joint module between a first base and a second base. The at least one joint module is configured to adjust a position of the second base relative to the first base based on elastic flexion in the joint module.

Abstract: Example embodiments are directed to a maskless exposure device and an alignment method. The alignment method performs an overlay of each layer of a plurality of layers on a substrate using a virtual mask in a maskless exposure technique. The maskless exposure device and the alignment method use a virtual mask instead of a physical mask used in a conventional mask exposure, a virtual target mark instead of an alignment mark used in the conventional mask exposure, and perform an overlay per layer, such that the deposition exposure can be achieved in the maskless exposure.

Abstract: Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical system, and a control method thereof. The maskless exposure apparatus includes the measurement optical system including a photo sensor and an image sensor, and a control unit configured to generate and/or correct the exposure data using the information acquired by the measurement optical system.

Abstract: An exposure apparatus and a method to measure a beam position and assigning an address using the same are disclosed. The exposure apparatus includes a Digital Micromirror Device (DMD) having a plurality of micromirrors, each micromirror to modulate light projected from a light source and project a modulated DMD beam onto an exposed surface, a measurement mask to measure positions of the DMD beams projected onto the exposed surface, a sensor to detect light intensities of the DMD beams measured by the measurement mask, and a controller to determine the positions of the DMD beams according to the detected light intensities.

Abstract: A method to compress exposure data may include converting image data into a plurality of exposure data, generating new exposure data by combining part of the plurality of exposure data or by excluding part of the plurality of exposure data, and compressing the new exposure data. An exposure apparatus may include a conversion unit that converts image data into a plurality of exposure data, a control unit that generates new exposure data by combining part of the plurality of exposure data or by excluding part of the plurality of exposure data, and a compression unit that compresses the new exposure data.

Abstract: A method of inspecting a flat panel display including inputting an image data signal into the flat panel display, obtaining an image displayed on the flat panel display in response to the input image data signal with a camera, extracting a raw brightness information corresponding to each location from the obtained image, calculating a fitting brightness information corresponding to each location through the curve fitting based on the raw brightness information, calculating a brightness difference corresponding to each location between the raw brightness information and the fitting brightness information, and detecting stain locations with the brightness difference beyond a predetermined permitted limit.

Abstract: A TFT array inspecting apparatus inspects a TFT array disposed at either an inclined position and a level position. The TFT array inspecting apparatus includes a vacuum chamber, a stage disposed in the vacuum chamber so that a TFT array to be inspected is disposed on the stage, an electron gun disposed opposite to the stage in the vacuum chamber to generate an electron beam onto the TFT array, an electron detecting unit to detect secondary electrons emitted from the TFT array by the electron gun, and at least one elevating unit to move the TFT array move between a level position and an inclined position having a designated angle with the level position.

Abstract: An apparatus to inspect a TFT substrate including a gate line, a data line crossed with the gate line and insulated from the gate line, a TFT disposed at an intersection of the gate line and the data line, and a pixel electrode connected to the TFT includes a vacuum chamber, a stage disposed in the vacuum chamber and on which the TFT substrate is settled, an electron beam generator disposed over the stage, a gate driving part to apply a gate-on voltage to the gate line to turn on the TFT, a signal detector connected to the data line and to sense an electric signal from the pixel electrode, and a controller to control the gate driving part and the electron beam generator so that a electron beam is irradiated to the pixel electrode while the TFT is turned on.

Abstract: An inspection apparatus for a TFT substrate formed with a plurality of pixels, includes a reference substrate being opposite to and spaced from the TFT substrate and formed with a plurality of reference patterns corresponding to the pixels, a power supply to supply power to both a predetermined number of the pixels and the corresponding reference pattern to form an electric field in a space between the TFT substrate and the reference substrate, an electron beam emitter to emit an electron beam to travel from a first side to a second side of the space, an electron beam detector to detect the electron beam emitted from the electron beam emitter and passed through the space, and a controller to determine whether the TFT substrate includes a defective pixel based on a location of the electron beam detected by the electron beam detector. Thus, the inspection apparatus can correctly and quickly inspect the TFT substrate for defects in a low vacuum state regardless a size of the TFT substrate.

Abstract: An apparatus to inspect a TFT substrate including a gate line, a data line crossed with the gate line and insulated from the gate line, a TFT disposed at an intersection of the gate line and the data line, and a pixel electrode connected to the TFT includes a vacuum chamber, a stage disposed in the vacuum chamber and on which the TFT substrate is settled, an electron beam generator disposed over the stage, a gate driving part to apply a gate-on voltage to the gate line to turn on the TFT, a signal detector connected to the data line and to sense an electric signal from the pixel electrode, and a controller to control the gate driving part and the electron beam generator so that a electron beam is irradiated to the pixel electrode while the TFT is turned on.

Abstract: A panel inspection apparatus inspecting a display panel, including: a panel supporting table supporting the panel; a plurality of cameras installed being spaced from the panel supporting table and photographing the panel supported by the panel supporting table; and a rotatable camera support rotatably supporting at least one of the plurality of cameras. As a result, the number of cameras required is reduced, costing less, and easy installation.

Abstract: An inspection apparatus for a TFT substrate formed with a plurality of pixels, includes a reference substrate being opposite to and spaced from the TFT substrate and formed with a plurality of reference patterns corresponding to the pixels, a power supply to supply power to both a predetermined number of the pixels and the corresponding reference pattern to form an electric field in a space between the TFT substrate and the reference substrate, an electron beam emitter to emit an electron beam to travel from a first side to a second side of the space, an electron beam detector to detect the electron beam emitted from the electron beam emitter and passed through the space, and a controller to determine whether the TFT substrate includes a defective pixel based on a location of the electron beam detected by the electron beam detector. Thus, the inspection apparatus can correctly and quickly inspect the TFT substrate for defects in a low vacuum state regardless a size of the TFT substrate.

Abstract: A method of inspecting a flat panel display including inputting an image data signal into the flat panel display, obtaining an image displayed on the flat panel display in response to the input image data signal with a camera, extracting a raw brightness information corresponding to each location from the obtained image, calculating a fitting brightness information corresponding to each location through the curve fitting based on the raw brightness information, calculating a brightness difference corresponding to each location between the raw brightness information and the fitting brightness information, and detecting stain locations with the brightness difference beyond a predetermined permitted limit.

Abstract: A panel inspection apparatus inspecting a display panel, including: a panel supporting table supporting the panel; a plurality of cameras installed being spaced from the panel supporting table and photographing the panel supported by the panel supporting table; and a rotatable camera support rotatably supporting at least one of the plurality of cameras. As a result, the number of cameras required is reduced, costing less, and easy installation.

Abstract: An image processing system and an image processing method which correct a moiré in an image taken from a displayed image. An imaging taking apparatus takes an image of an image displayed by an image displaying apparatus and an optical characteristic changing apparatus is provided between the image taking apparatus and the image displaying apparatus. A lightpath of the displayed image is changed before the image of the displayed image is taken and an image processor receives a plurality of the taken images from the image taking apparatus and generates a processed image with a removed moiré by correcting or superposing the plurality of the images. Thus, a processed image, in which a moiré of the displayed image is removed, is promptly obtainable, and a quality of the taken image is increased. The image processing system and method are adaptable to various systems for inspection and/or measurement.