Abstract: Disclosed herein is a wireless remote controller having a navigation function and method of providing the navigation function to the same. The remote controller of the present invention includes a wireless transmission/reception unit, a display unit, a storage unit, at least tow function keys, a mode switching element, a device information selecting key, and a control unit. The function keys selectively operate in a first mode in which remote control key code information is transmitted through the wireless transmission/reception unit to devices and a second mode in which the device information is navigated. The device information selecting key selects information of one or more devices. The control unit controls the remote control key code information to be transmitted through the wireless transmission/reception unit in the first mode, and in the second mode controls the information of the device to be provided to the display.

Abstract: A method of managing an electronic program guide (EPG) and a multimedia device is provided, where the size and/or position of an EPG frame on a display, or the sizes of cells of a grid in the EPG frame, can be changed. The method of managing the EPG includes generating an EPG display frame; modifying the EPG frame; and storing the modified EGP frame. The multimedia device includes an AV decoder for receiving and separating EPG information; a storage unit for storing the EPG information and an EPG frame; an EPG control unit for generating EPG display signals and modifying the stored EPG frame; and a display for displaying an EPG. According to the invention, a user can adjust the sizes of the cells of the grid in the EPG frame, and the size and position of the EPG frame so that they are suitable for his/her preference.

Abstract: Disclosed herein is a wireless remote controller having a navigation function and method of providing the navigation function to the same. The remote controller of the present invention includes a wireless transmission/reception unit, a display unit, a storage unit, at least tow function keys, a mode switching element, a device information selecting key, and a control unit. The function keys selectively operate in a first mode in which remote control key code information is transmitted through the wireless transmission/reception unit to devices and a second mode in which the device information is navigated. The device information selecting key selects information of one or more devices. The control unit controls the remote control key code information to be transmitted through the wireless transmission/reception unit in the first mode, and in the second mode controls the information of the device to be provided to the display.

Abstract: A borderless contact structure and method of forming thereof are provided. A device isolation region having a protrusion is formed at a predetermined region of a semiconductor substrate. The top surface of the protrusion is higher in level than that of the semiconductor substrate. An impurity diffusion region is formed in an active region surrounded by the device isolation region. An etch stop spacer is formed on a sidewall of the protrusion. An etch stop layer and an interlayer insulating layer are sequentially formed on the resultant structure including the impurity diffusion region, the device isolation region and the etch stop spacer. A contact hole opening the interlayer insulating layer and the etch stop layer is formed to expose at least a portion of the impurity diffusion region.

Abstract: A borderless contact structure and method of forming thereof are provided. A device isolation region having a protrusion is formed at a predetermined region of a semiconductor substrate. The top surface of the protrusion is higher in level than that of the semiconductor substrate. An impurity diffusion region is formed in an active region surrounded by the device isolation region. An etch stop spacer is formed on a sidewall of the protrusion. An etch stop layer and an interlayer insulating layer are sequentially formed on the resultant structure including the impurity diffusion region, the device isolation region and the etch stop spacer. A contact hole opening the interlayer insulating layer and the etch stop layer is formed to expose at least a portion of the impurity diffusion region.