Patents by Inventor Holger Kierey
Holger Kierey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11231658Abstract: An arrangement for an EUV lithography apparatus includes a reflective optical element (60) having an optically effective surface (62) configured to reflect incident EUV radiation, and a filament arrangement (65) configured to produce a reagent that cleans the optically effective surface (62). The filament arrangement (65) has at least one filament (66) configured as a glow or heating element. The at least one filament (66) is arranged along the optically effective surface (62) of the reflective optical element (60) wherein a thickness and/or positioning of the at least one filament (66) are/is chosen so as to minimize an optical influence of the at least one filament (66) in the far field of the EUV radiation reflected by the optically effective surface (62).Type: GrantFiled: May 24, 2020Date of Patent: January 25, 2022Assignee: CARL ZEISS SMT GMBHInventors: Holger Kierey, Wolfgang Merkel
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Publication number: 20210263423Abstract: A mirror for an illumination optical unit of a projection exposure apparatus comprises a spectral filter in the form of a grating structure, wherein the grating structure has a maximum edge steepness in the range of 15° to 60°.Type: ApplicationFiled: May 11, 2021Publication date: August 26, 2021Inventors: Christof Jalics, Fabian Schuster, Holger Kierey, Andreas Sandner, Tobias Meisch
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Patent number: 11099484Abstract: A cost-effective method for repairing reflective optical elements for EUV lithography. These optical elements (60) have a substrate (61) and a coating (62) that reflects at a working wavelength in the range between 5 nm and 20 nm and is damaged as a result of formation of hydrogen bubbles. The method includes: localizing a damaged area (63, 64, 65, 66) in the coating (62) and covering the damaged area (63, 64, 65, 66) with one or more materials having low hydrogen permeability by applying a cover element to the damaged area. The cover element is formed of a surface structure, a convex or concave surface, or a coating corresponding to the coating of the reflective optical element, or a combination thereof. The method is particularly suitable for collector mirrors (70) for EUV lithography. After the repair, the optical elements have cover elements (71, 72, 73).Type: GrantFiled: June 6, 2019Date of Patent: August 24, 2021Assignee: CARL ZEISS SMT GMBHInventors: Robert Meier, Holger Kierey, Christof Jalics, Eric Eva, Ralf Winter, Arno Schmittner, Alexey Kuznetsov, Vitaliy Shklover, Christoph Nottbohm, Wolfgang Merkel
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Publication number: 20200285142Abstract: An arrangement for an EUV lithography apparatus includes a reflective optical element (60) having an optically effective surface (62) configured to reflect incident EUV radiation, and a filament arrangement (65) configured to produce a reagent that cleans the optically effective surface (62). The filament arrangement (65) has at least one filament (66) configured as a glow or heating element. The at least one filament (66) is arranged along the optically effective surface (62) of the reflective optical element (60) wherein a thickness and/or positioning of the at least one filament (66) are/is chosen so as to minimize an optical influence of the at least one filament (66) in the far field of the EUV radiation reflected by the optically effective surface (62).Type: ApplicationFiled: May 24, 2020Publication date: September 10, 2020Inventors: Holger KIEREY, Wolfgang MERKEL
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Patent number: 10649340Abstract: In order to prevent delamination of a reflective coating from the substrate under the influence of reactive hydrogen, a reflective optical element (50) for EUV lithography is provided, which has a substrate (51) and a reflective coating (54) for reflecting radiation in the wavelength range of 5 nm to 20 nm. A functional layer (60) is arranged between the reflective coating (54) and the substrate (51). With the functional layer, the concentration of hydrogen in atom % at the side of the substrate facing the reflective coating is reduced by at least a factor of 2.Type: GrantFiled: January 25, 2019Date of Patent: May 12, 2020Assignee: CARL ZEISS SMT GMBHInventors: Dirk Heinrich Ehm, Vitaliy Shklover, Irene Ament, Stefan-Wolfgang Schmidt, Moritz Becker, Stefan Wiesner, Diana Urich, Robert Meier, Ralf Winter, Christof Jalics, Holger Kierey, Eric Eva
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Patent number: 10578974Abstract: The disclosure relates to an optical element, in particular for a microlithographic projection exposure apparatus. The optical element has an optical effective surface. The optical element includes a substrate, a layer system that is present on the substrate, and a protective cover extending over an edge region of the optical element that is adjacent to the optical effective surface. During operation of the optical element, the protective coating reduces an ingress of hydrogen radicals into the layer system in comparison with an analogous design without the protective cover, wherein a gap is formed between the protective cover and the layer system.Type: GrantFiled: June 20, 2019Date of Patent: March 3, 2020Assignee: Carl Zeiss SMT GmbHInventors: Ralf Moser, Florian Herold, Arno Schmittner, Holger Kierey, Wolfgang Merkel, Georgo Metalidis
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Patent number: 10578972Abstract: An EUV collector serves for use in an EUV projection exposure apparatus. The collector guides EUV used light emitted by a plasma source region. An overall impingement surface of the collector is impinged upon by radiation emitted by the plasma source region. A used light portion of the overall impingement surface guides the EUV used light. An extraneous light portion of the overall impingement surface is impinged upon by extraneous light radiation, the wavelength of which differs from that of the used light. The used light portion and the extraneous light portion are not congruent. This EUV collector has increased efficiency can involve reduced production costs.Type: GrantFiled: September 20, 2018Date of Patent: March 3, 2020Assignee: Carl Zeiss SMT GmbHInventors: Holger Kierey, Johannes Zellner
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Patent number: 10503075Abstract: An EUV collector for use in an EUV projection exposure apparatus includes at least one mirror surface having surface structures for scattering a used EUV wavelength (?) of used EUV light. The mirror surface has a surface height with a spatial wavelength distribution between a lower limit spatial wavelength and an upper limit spatial wavelength. An effective roughness (rmsG) below the lower limit spatial wavelength (PG) satisfies the following relation: (4? rmsG cos(?)/?)2<0.1. ? denotes an angle of incidence of the used EUV light at the mirror surface. The following applies to an effective roughness (rmsGG?) between the lower limit spatial wavelength (PG) and the upper limit spatial wavelength (PG?): 1.5 rmsG<rmsGG?<6 rmsG.Type: GrantFiled: November 26, 2018Date of Patent: December 10, 2019Assignee: Carl Zeiss SMT GmbHInventors: Ingrid Schuster, Wolfgang Merkel, Georgo Metalidis, Holger Kierey
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Publication number: 20190302628Abstract: A cost-effective method for repairing reflective optical elements for EUV lithography. These optical elements (60) have a substrate (61) and a coating (62) that reflects at a working wavelength in the range between 5 nm and 20 nm and is damaged as a result of formation of hydrogen bubbles. The method includes: localizing a damaged area (63, 64, 65, 66) in the coating (62) and covering the damaged area (63, 64, 65, 66) with one or more materials having low hydrogen permeability by applying a cover element to the damaged area. The cover element is formed of a surface structure, a convex or concave surface, or a coating corresponding to the coating of the reflective optical element, or a combination thereof. The method is particularly suitable for collector mirrors (70) for EUV lithography. After the repair, the optical elements have cover elements (71, 72, 73).Type: ApplicationFiled: June 6, 2019Publication date: October 3, 2019Inventors: Robert MEIER, Holger KIEREY, Christof JALICS, Eric EVA, Ralf WINTER, Arno SCHMITTNER, Alexey KUZNETSOV, Vitaliy SHKLOVER, Christoph NOTTBOHM, Wolfgang MERKEL
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Publication number: 20190302624Abstract: The disclosure relates to an optical element, in particular for a microlithographic projection exposure apparatus. The optical element has an optical effective surface. The optical element includes a substrate, a layer system that is present on the substrate, and a protective cover extending over an edge region of the optical element that is adjacent to the optical effective surface. During operation of the optical element, the protective coating reduces an ingress of hydrogen radicals into the layer system in comparison with an analogous design without the protective cover, wherein a gap is formed between the protective cover and the layer system.Type: ApplicationFiled: June 20, 2019Publication date: October 3, 2019Inventors: Ralf Moser, Florian Herold, Arno Schmittner, Holger Kierey, Wolfgang Merkel, Georgo Metalidis
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Publication number: 20190171108Abstract: In order to prevent delamination of a reflective coating from the substrate under the influence of reactive hydrogen, a reflective optical element (50) for EUV lithography is provided, which has a substrate (51) and a reflective coating (54) for reflecting radiation in the wavelength range of 5 nm to 20 nm. A functional layer (60) is arranged between the reflective coating (54) and the substrate (51). With the functional layer, the concentration of hydrogen in atom % at the side of the substrate facing the reflective coating is reduced by at least a factor of 2.Type: ApplicationFiled: January 25, 2019Publication date: June 6, 2019Inventors: Dirk Heinrich EHM, Vitaliy SHKLOVER, Irene AMENT, Stefan-Wolfgang SCHMIDT, Moritz BECKER, Stefan WIESNER, Diana URICH, Robert MEIER, Ralf WINTER, Christof JALICS, Holger KIEREY, Eric EVA
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Patent number: 10303067Abstract: The disclosure relates to a cooler for use in a device in a vacuum, wherein the partial pressure of the cooling medium in the vacuum environment during the operation of the cooler is less than 10?3 mbar. The cooler includes a heat sink, wherein a cavity through which the cooling medium flows is formed in the heat sink, and wherein the heat sink includes a connection element which surrounds one end of the cavity through which the cooling medium flows. The cooler also includes a connecting piece for joining a coolant line to the cavity. The connecting piece includes a jacket secured on the connection element by a thermal connecting process. An intermediate layer is between the jacket and the connection element. The jacket exerts a force in the direction of the connection element so that the intermediate layer is under compressive stress in the radial direction during operation of the cooler.Type: GrantFiled: March 24, 2016Date of Patent: May 28, 2019Assignee: Carl Zeiss SMT GmbHInventors: Willi Anderl, Bernhard Weigl, Ann-Kathrin Wandner, Holger Kierey, Arno Schmittner, Markus Bauer, Marcus Schmelzeisen, Andreas Kolloch
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Publication number: 20190094699Abstract: An EUV collector for use in an EUV projection exposure apparatus includes at least one mirror surface having surface structures for scattering a used EUV wavelength (?) of used EUV light. The mirror surface has a surface height with a spatial wavelength distribution between a lower limit spatial wavelength and an upper limit spatial wavelength. An effective roughness (rmsG) below the lower limit spatial wavelength (PG) satisfies the following relation: (4 ? rmsG cos(?)/?)2<0.1. ? denotes an angle of incidence of the used EUV light at the mirror surface. The following applies to an effective roughness (rmsGG?) between the lower limit spatial wavelength (PG) and the upper limit spatial wavelength (PG?): 1.5 rmsG<rmsGG?<6 rmsG.Type: ApplicationFiled: November 26, 2018Publication date: March 28, 2019Inventors: Ingrid Schuster, Wolfgang Merkel, Georgo Metalidis, Holger Kierey
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Publication number: 20190033723Abstract: An EUV collector serves for use in an EUV projection exposure apparatus. The collector guides EUV used light emitted by a plasma source region. An overall impingement surface of the collector is impinged upon by radiation emitted by the plasma source region. A used light portion of the overall impingement surface guides the EUV used light. An extraneous light portion of the overall impingement surface is impinged upon by extraneous light radiation, the wavelength of which differs from that of the used light. The used light portion and the extraneous light portion are not congruent. This EUV collector has increased efficiency can involve reduced production costs.Type: ApplicationFiled: September 20, 2018Publication date: January 31, 2019Inventors: Holger Kierey, Johannes Zellner
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Patent number: 9541685Abstract: A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.Type: GrantFiled: August 20, 2013Date of Patent: January 10, 2017Assignee: Carl Zeiss SMT GmbHInventors: Holger Kierey, Heiko Siekmann, Andre Bresan
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Publication number: 20160299443Abstract: The disclosure relates to a cooler for use in a device in a vacuum, wherein the partial pressure of the cooling medium in the vacuum environment during the operation of the cooler is less than 10?3 mbar. The cooler includes a heat sink, wherein a cavity through which the cooling medium flows is formed in the heat sink, and wherein the heat sink includes a connection element which surrounds one end of the cavity through which the cooling medium flows. The cooler also includes a connecting piece for joining a coolant line to the cavity. The connecting piece includes a jacket secured on the connection element by a thermal connecting process. An intermediate layer is between the jacket and the connection element. The jacket exerts a force in the direction of the connection element so that the intermediate layer is under compressive stress in the radial direction during operation of the cooler.Type: ApplicationFiled: March 24, 2016Publication date: October 13, 2016Inventors: Willi Anderl, Bernhard Weigl, Ann-Kathrin Wandner, Holger Kierey, Arno Schmittner, Markus Bauer, Marcus Schmelzeisen, Andreas Kolloch
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Publication number: 20150092170Abstract: A method for repairing a collector for an EUV projection exposure apparatus having a first coating and a second coating, wherein the first coating is arranged between the second coating and a surface of the collector. The method includes completely or partly removing the first coating by treatment with a first chemical solution, and applying a new first coating.Type: ApplicationFiled: October 21, 2014Publication date: April 2, 2015Inventors: Oli Ehrler, Uwe Meier, Alexander Uhl, Holger Kierey
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Publication number: 20150083938Abstract: The disclosure provides a cooler for use in a plasma generation chamber of a radiation source for an extreme ultraviolet wavelength range. The cooler has a heat sink which is at least partially manufactured of a substrate material having a thermal conductivity of greater than 50 W/mK. A coolant duct is formed in the substrate material, and the coolant duct is configured to have a coolant flow therethrough. The cooler also includes a connection piece made of a metal or a metal alloy for connecting a coolant line to the coolant duct. The cooler further includes a connecting element for connecting the connection piece to the heat sink so that, when the connection piece is connected to the heat sink, a continuous line is formed by the coolant duct and the coolant line.Type: ApplicationFiled: September 22, 2014Publication date: March 26, 2015Inventors: Willi Anderl, Bernhard Weigl, Ann-Kathrin Wandner, Holger Kierey, Arno Schmittner, Markus Bauer, Marcus Schmelzeisen, Andreas Kolloch
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Publication number: 20130335816Abstract: A method for producing a reflective optical component for an EUV projection exposure apparatus, the component having a substrate having a base body, and a reflective layer arranged on the substrate, wherein the substrate has an optically operative microstructuring, comprises the following steps: working the microstructuring into the substrate, polishing the substrate after the microstructuring has been worked into the substrate, applying the reflective layer to the substrate. A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.Type: ApplicationFiled: August 20, 2013Publication date: December 19, 2013Inventors: Holger Kierey, Heiko Siekmann, Andre Bresan
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Patent number: 8342701Abstract: A reflective optical element for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.Type: GrantFiled: August 5, 2010Date of Patent: January 1, 2013Assignee: Carl Zeiss Laser Optics GmbHInventors: Holger Kierey, Michel Le Maire, Willi Anderl, Hubert Holderer, Anton Lengel