Abstract: An electronic device for estimating body temperature may include: a sensor including a heat source, a pair of first temperature sensors horizontally spaced apart from each other at two opposing sides of the heat source, and a pair of second temperature sensors vertically spaced apart from the pair of first temperature sensors in a thickness direction of the electronic device; and at least one processor configured to estimate a blood temperature difference based on temperatures measured by the pair of first temperature sensors and the pair of second temperature sensors, and estimate blood flow information based on the estimated blood temperature difference.

Abstract: An electronic device may include: a first temperature sensor configured to measure a first temperature when an object comes into contact with a contact surface of a main body of the electronic device; a second temperature sensor spaced apart from the first temperature sensor in a direction opposite the contact surface and configured to measure a second temperature; and a processor configured to detect a temperature change due to heat generation inside the main body, and estimate skin surface temperature based on the first temperature, the second temperature, and the temperature change.

Abstract: Embodiments of the disclosure relate to a display device and a data driving circuit. The display device comprises a display panel including a plurality of subpixels and a plurality of data lines electrically connected with the plurality of subpixels and a data driving circuit outputting a data voltage to the plurality of data lines, wherein the data driving circuit outputs the data voltage for image display to the plurality of data lines during an active period and outputs a step voltage to stepwise decrease a level of the data voltage to a preset target voltage level or stepwise increase the level of the data voltage from the target voltage level during a blank period different from the active period.

Abstract: Embodiments of the disclosure relate to a display device and a data driving circuit. The display device comprises a display panel including a plurality of subpixels and a plurality of data lines electrically connected with the plurality of subpixels and a data driving circuit outputting a data voltage to the plurality of data lines, wherein the data driving circuit outputs the data voltage for image display to the plurality of data lines during an active period and outputs a step voltage to stepwise decrease a level of the data voltage to a preset target voltage level or stepwise increase the level of the data voltage from the target voltage level during a blank period different from the active period.

Abstract: Embodiments of the disclosure relate to a display device and a data driving circuit. Specifically, there may be provided a display device with enhanced power efficiency and a data driving circuit by providing a display device including a display panel divided into an always-on display area displaying information during a standby screen period and a black grayscale area except for the always-on display area, an image display voltage output circuit outputting a data voltage to input to the always-on display area during the standby screen period, and a voltage stabilization circuit outputting a constant voltage to input to at least a partial area of the black grayscale area during the standby screen period.

Abstract: A power supply includes a boost circuit having a first boost circuit configured to output a first driving voltage to be supplied to the display panel by stepping unit an input voltage and a second boost circuit configured to output a second driving voltage to be supplied to the display panel by stepping down the input voltage, and a correction circuit configured to output a correction signal based on a result obtained by sensing the input voltage, and controls output efficiency of the boost circuit based on the input voltage and current sensed from the display panel.

Abstract: A power supply includes a boost circuit having a first boost circuit configured to output a first driving voltage to be supplied to the display panel by stepping unit an input voltage and a second boost circuit configured to output a second driving voltage to be supplied to the display panel by stepping down the input voltage, and a correction circuit configured to output a correction signal based on a result obtained by sensing the input voltage, and controls output efficiency of the boost circuit based on the input voltage and current sensed from the display panel.

Abstract: Embodiments of the present invention provide systems, apparatus, and methods for protecting processing recipes. Embodiments include a remote host external to an electronic device manufacturing facility, the remote host including a recipe editor adapted to allow creating of a protected processing recipe; a material control system (MCS) within the electronic device manufacturing facility and operable to communicate with the remote host; a master controller (MC) in communication with the MCS; and at least one processing tool in communication with the MC and including volatile memory adapted to store the protected processing recipe for execution by the processing tool. The remote host is operable to transfer the protected processing recipe to the volatile memory of the processing tool without allowing the protected processing recipe to be accessible by a user within the electronic device manufacturing facility. Numerous additional aspects are disclosed.

Abstract: In an embodiment, an utensil may include a first head having a concave shape and configured to contain food, a handle coupled to the first head and configured to act as a handle for the first head, a first sensor in the handle and configured to detect a user's body part, a second sensor in the first head and configured to sense the food or the user's body part, a control circuit in the handle and configured to determine whether the food contained in the first head is eaten by the user according to change in sensing signals received from the first sensor and the second sensor, and an output device in the handle and configured to output sound or light, or both, according to a result of the determination made by the control circuit.

Abstract: Systems, methods, and apparatus are provided for operating a cluster tool including receiving recipe time data; receiving transfer time data; receiving process programs and associated substrate lots wherein the process programs include a plurality of sequences; determining cluster tool chambers associated with sequences that are bottleneck sequences; setting equipment constant values for components of the cluster tool to implement transfer priorities wherein the chambers associated with bottleneck sequences are given highest priority; executing a next sequence based on the transfer priorities; and repeating the determining, setting and executing for each remaining sequence. Numerous additional aspects are disclosed.

Abstract: Malfunction of a component within an RF-powered plasma chamber is detected by observing an operating condition of the plasma chamber and detecting when the operating condition deviates from a previously observed range bounded by lower and upper limits. The lower and upper limits are determined by observing the minimum and maximum values of that operating condition during the processing of workpieces throughout one or more plasma chamber cleaning cycles immediately preceding the most recent cleaning of the plasma chamber.

Abstract: The present invention generally relates to a method for flexible process condition monitoring. In a process that utilizes RF power, the RF power may be applied at different levels during different points in the process. Software may be programmed to facilitate the monitoring of the different points in the process so that the acceptable deviation range of the RF power for each point in the process may be set to different values. For example, one phase of the process may permit a greater range of RF power deviation while a second phase may be much more particular and permit very little deviation. By programming software to permit each phase of the process to be uniquely monitored, a more precise RF process may be obtained.

Abstract: Systems, methods, and apparatus are provided for operating a cluster tool including receiving recipe time data; receiving transfer time data; receiving process programs and associated substrate lots wherein the process programs include a plurality of sequences; determining cluster tool chambers associated with sequences that are bottleneck sequences; setting equipment constant values for components of the cluster tool to implement transfer priorities wherein the chambers associated with bottleneck sequences are given highest priority; executing a next sequence based on the transfer priorities; and repeating the determining, setting and executing for each remaining sequence. Numerous additional aspects are disclosed.

Abstract: Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are established as a function of the frequency of the power supply sampled after a new process step begins or after a sample control signal changes state. In a second aspect, a second pair of lower and upper limits are not adapted to the frequency of the power supply. Both aspects preferably are used together to detect different occurrences of abnormal conditions.

Abstract: Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are established as a function of the frequency of the power supply sampled after a new process step begins or after a sample control signal changes state. In a second aspect, a second pair of lower and upper limits are not adapted to the frequency of the power supply. Both aspects preferably are used together to detect different occurrences of abnormal conditions.

Abstract: The present invention generally relates to a method for flexible process condition monitoring. In a process that utilizes RF power, the RF power may be applied at different levels during different points in the process. Software may be programmed to facilitate the monitoring of the different points in the process so that the acceptable deviation range of the RF power for each point in the process may be set to different values. For example, one phase of the process may permit a greater range of RF power deviation while a second phase may be much more particular and permit very little deviation. By programming software to permit each phase of the process to be uniquely monitored, a more precise RF process may be obtained.

Abstract: Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are established as a function of the frequency of the power supply sampled after a new process step begins or after a sample control signal changes state. In a second aspect, a second pair of lower and upper limits are not adapted to the frequency of the power supply. Both aspects preferably are used together to detect different occurrences of abnormal conditions.

Abstract: Malfunction of a component within an RF-powered plasma chamber is detected by observing an operating condition of the plasma chamber and detecting when the operating condition deviates from a previously observed range bounded by lower and upper limits. The lower and upper limits are determined by observing the minimum and maximum values of that operating condition during the processing of workpieces throughout one or more plasma chamber cleaning cycles immediately preceding the most recent cleaning of the plasma chamber.

Abstract: Abnormal conditions within an RF-powered plasma process chamber are detected by detecting whether the frequency of a variable-frequency RF power supply moves outside established lower and upper limits. In a first aspect, a first pair of lower and upper limits are established as a function of the frequency of the power supply sampled after a new process step begins or after a sample control signal changes state. In a second aspect, a second pair of lower and upper limits are not adapted to the frequency of the power supply. Both aspects preferably are used together to detect different occurrences of abnormal conditions.