Patents by Inventor Hong Yee Low

Hong Yee Low has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120302465
    Abstract: A biologic-adsorbent, e.g., protein-adsorbent, material is prepared by forming a polymeric substrate into structures having high surface area topography whose biologic adsorbing properties can be controlled. Biologic adsorption by these structures of optimized high surface area topography is increased by mild treating of the surfaces, e.g., by oxygen plasma, without substantially altering topography. Structures can have tailored geometric features including microstructures, e.g., pillars, with a diameter from 100 nm-50 ?m and height greater than 1 ?m.
    Type: Application
    Filed: May 26, 2011
    Publication date: November 29, 2012
    Applicants: AGENCY FOR SCIENCE TECHNOLOGY AND RESEARCH, ADVANCED TECHNOLOGIES & REGENERATIVE MEDICINE, LLC
    Inventors: Noha ELMOUELHI, Kevin COOPER, Sriram NATARAJAN, Hong Yee LOW, Isabel RODRIGUEZ, Emma Kim LUONG-VAN
  • Publication number: 20120302427
    Abstract: A biologic-adsorbent, e.g., protein-adsorbent, material is prepared by forming a polymeric substrate into structures having high surface area topography whose biologic adsorbing properties can be controlled. Biologic adsorption by these structures of optimized high surface area topography is increased by mild treating of the surfaces, e.g., by oxygen plasma, without substantially altering topography. Structures can have tailored geometric features including microstructures, e.g., pillars, with a diameter from 100 nm-50 ?m and height greater than 1 ?m.
    Type: Application
    Filed: December 29, 2011
    Publication date: November 29, 2012
    Applicants: ADVANCED TECHNOLOGIES & REGENERATIVE MEDICINE, LLC
    Inventors: Noha Elmouelhi, Kevin Cooper, Sriram Natarajan, Hong Yee Low, Isabel Rodriguez, Emma Kim Luong-Van
  • Publication number: 20120286250
    Abstract: A process for producing a substrate with electrode for an organic electroluminescent device comprising a low-refractive index layer, a functional layer, and a transparent electrode that are laminated in this order, the substrate being for an organic electroluminescent device wherein the refractive index n1 of the electrode, the refractive index n2 of the functional layer, and the refractive index n3 of the low-refractive index layer satisfy the following formula (1): { 0.3 ? ( n ? ? 1 - n ? ? 2 ) ? 0 n ? ? 1 ? n ? ? 2 > n ? ? 3 ( 1 ) , the process comprising the step of forming the low-refractive index layer by forming raised and depressed portions on the surface of the low-refractive index layer by means of imprinting that uses a mold wherein multiple particles having an average particle size of 1.
    Type: Application
    Filed: August 11, 2010
    Publication date: November 15, 2012
    Applicants: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH, SUMITMO CHEMICAL COMPANY, LIMITED
    Inventors: Kyoko Yamamoto, Hong Yee Low, Feng Xiang Zhang, Benzhong Wang
  • Patent number: 8298467
    Abstract: The present invention is directed to novel methods of imprinting substrate-supported or freestanding structures at low cost, with high pattern transfer yield, and using low processing temperature. Such methods overcome many of the above-described limitations of the prior art. Generally, such methods of the present invention employ a sacrificial layer of film.
    Type: Grant
    Filed: January 31, 2011
    Date of Patent: October 30, 2012
    Assignee: Agency for Science Technology and Research
    Inventors: Yongan Xu, Hong Yee Low
  • Publication number: 20120268822
    Abstract: An antiretlective biomimetic hierarchical structure, a composite antiretlective hierarchical structure, and an antiretlective surface including a pattern of antiretlective biomimetic hierarchical structures are provided. The antiretlective hierarchical structures include one or more clusters of primary structures and a plurality of secondary structures formed on each of the primary structures. The primary structures have dimensions in the micrometer range with a major dimension of approximately two micrometers. Each of the secondary structures has dimensions in the nanometer range wherein the pitch and height are approximately three hundred nanometers.
    Type: Application
    Filed: April 18, 2012
    Publication date: October 25, 2012
    Inventors: Bee Khuan Jaslyn Law, Hong Yee Low, Ming Hua Andrew Ng, Ai Yu He
  • Publication number: 20120251611
    Abstract: A polydioxanone film comprising substantially cylindrical polydioxanone pillars on at least one side thereof, said pillars having diameters from about 0.2 ?m to about 3 ?m, and heights from about 2 ?m to about 20 ?m from the surface of the film, a process for adsorbing proteins using the film and medical devices incorporating the film.
    Type: Application
    Filed: March 30, 2012
    Publication date: October 4, 2012
    Applicants: AGENCY FOR SCIENCE TECHNOLOGY AND RESEARCH, ADVANCED TECHNOLOGIES & REGENERATIVE MEDICINE, LLC
    Inventors: Emma Kim Luong-Van, Isabel Rodriguez, Hong Yee Low, Noha Elmouelhi, Kevin Cooper, Sriram Natarajan, Murty N. Vyakarnam, Chee Tiong Lim
  • Publication number: 20120143228
    Abstract: A laminate and process of making the laminate is disclosed comprising: a surgical mesh having first and second surfaces; and an adhesive structure having adhesive and non-adhesive surfaces, wherein the non-adhesive surface of the adhesive structure is laminated to at least one of said first and second surfaces of said surgical mesh, and the adhesive surface of said adhesive structure has protrusions extending therefrom comprising a resin having a Young's modulus of greater than 17 MPa, which protrusions are of sufficiently low diameter to promote adhesion by increasing physical attractive forces between the adhesive structure and a target surface, as measured by shear adhesion.
    Type: Application
    Filed: December 29, 2011
    Publication date: June 7, 2012
    Applicants: AGENCY FOR SCIENCE TECHNOLOGY AND RESEARCH, ADVANCED TECHNOLOGIES & REGENERATIVE MEDICINE, LLC
    Inventors: Sriram Natarajan, Joseph J. Hammer, Kevin Cooper, Murty N. Vyakarnam, Hong Yee Low, Isabel Rodriguez, Chee Tiong Lim, Audrey Yoke Yee Ho
  • Publication number: 20120052234
    Abstract: An adhesive structure is provided comprising a surface from which extend substantially cylindrical protrusions comprising a stiff resin having a Young's modulus of greater than 17 MPa. The protrusions are of sufficiently low diameter to promote adhesion by physical attractive forces, e.g., Van der Waals attractive forces, as measured by shear adhesion between the adhesive structure and a target surface. A method for preparing the structure is provided as well as a combination of the adhesive structure and target surface.
    Type: Application
    Filed: August 30, 2010
    Publication date: March 1, 2012
    Inventors: Sriram NATARAJAN, Kevin COOPER, Noha ELMOUELHI, Murty N. VYAKARNAM, Hong Yee LOw, Isabel RODRIGUEZ, Chee Tiong LIM, Audrey Yoke Yee HO
  • Publication number: 20110250407
    Abstract: A method of making a substrate having multi-layered structures thereon, the method comprising the steps of (a) applying a mold having an imprint forming surface to the substrate to form an array of imprint structures that projects from the substrate; and (b) applying a lateral force that is substantially normal to said projecting imprint structures to cause said imprint structures to move angularly towards said substrate and thereby form a pattern of multi-layered structures thereon.
    Type: Application
    Filed: June 10, 2009
    Publication date: October 13, 2011
    Applicant: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH
    Inventors: Tanu Suryadi Kustandi, Hong Yee Low, Isabel Rodriguez Fernandez
  • Publication number: 20110236639
    Abstract: There is disclosed a method of making an imprint on a polymer structure comprising the steps of: a) providing an imprinted substrate mold having a defined imprinted surface pattern on a first side and a defined imprinted surface pattern on a second side, opposite to the first side; b) pressing a polymer structure against the first side of the imprinted substrate mold to form an imprint thereon; and c) pressing another polymer structure against the second side of the imprinted substrate mold to form an imprint thereon.
    Type: Application
    Filed: July 17, 2008
    Publication date: September 29, 2011
    Applicant: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH
    Inventors: Mohammad Sultan Mohiddin Saifullah, Richard Teng Thuan Khoo, Hong Yee Low
  • Patent number: 8025831
    Abstract: The present invention is directed to micro- and nano-scale imprinting methods and the use of such methods to fabricate supported and/or free-standing 3-D micro- and/or nano-structures of polymeric, ceramic, and/or metallic materials. In some embodiments, a duo-mold approach is employed in the fabrication of these structures. In such methods, surface treatments are employed to impart differential surface energies to different molds and/or different parts of the mold(s). Such surface treatments permit the formation of three-dimensional (3-D) structures through imprinting and the transfer of such structures to a substrate. In some or other embodiments, such surface treatments and variation in glass transition temperature of the polymers used can facilitate separation of the 3-D structures from the molds to form free-standing micro- and/or nano-structures individually and/or in a film.
    Type: Grant
    Filed: May 24, 2004
    Date of Patent: September 27, 2011
    Assignees: Agency for Science, Technology and Research, The Regents of University of Michigan
    Inventors: Yen Peng Kong, Hong Yee Low, Stella W. Pang, Albert F. Yee
  • Publication number: 20110140305
    Abstract: The present invention is directed to novel methods of imprinting substrate-supported or freestanding structures at low cost, with high pattern transfer yield, and using low processing temperature. Such methods overcome many of the above-described limitations of the prior art. Generally, such methods of the present invention employ a sacrificial layer of film.
    Type: Application
    Filed: January 31, 2011
    Publication date: June 16, 2011
    Inventors: Yongan Xu, Hong Yee Low
  • Patent number: 7901607
    Abstract: The present invention is directed to novel methods of imprinting substrate-supported or freestanding structures at low cost, with high pattern transfer yield, and using low processing temperature. Such methods overcome many of the above-described limitations of the prior art. Generally, such methods of the present invention employ a sacrificial layer of film.
    Type: Grant
    Filed: February 16, 2006
    Date of Patent: March 8, 2011
    Assignee: Agency for Science, Technology and Research
    Inventors: Yongan Xu, Hong Yee Low
  • Publication number: 20110031658
    Abstract: A method of reducing the dimension of an imprint structure on a substrate, the method comprising the steps of: (a) providing a substrate having at least one imprint structure thereon, said structure being formed of an inorganic-organic compound comprising an inorganic moiety and a polymer moiety, said polymer moiety having a lower vaporization temperature than the melting point of said inorganic moiety; and (b) selectively removing at least part of the polymer moiety while enabling at least part of the inorganic moiety to form a substantially continuous inorganic phase in said imprint structure, wherein the removal of the at least part of the polymer moiety from the imprint structure reduces the dimension of the imprint structure.
    Type: Application
    Filed: August 4, 2010
    Publication date: February 10, 2011
    Applicant: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH
    Inventors: M.S.M. Saifullah, Hazrat Hussain, Suhui Lim, Hong Yee Low, Wei Wei Loh
  • Publication number: 20100291723
    Abstract: A method of manufacturing an organic electronic or optoelectronic device, the method comprising the steps of: (a) providing a substrate having a plurality of banks formed thereon with alternating well formations formed therebetween, the surface of said banks having imprint formations formed thereon of a dimension conferring a selected wetting property to the surface of said banks that is different from the surface of said wells; and (b) depositing an organic solution into said well formations, wherein the wetting property of said banks causes any organic solution deposited thereon to be at least partially repelled.
    Type: Application
    Filed: August 28, 2007
    Publication date: November 18, 2010
    Applicants: Agency for Science, Technology and Research, Sumitomo Chemical col Ltd.
    Inventors: Hong Yee Low, Jarrett Dumond, Karen Chong, Kyoko Yamamoto, Satoshi Amamiya
  • Patent number: 7776250
    Abstract: There is disclosed an imprinted polymer support for solid phase organic synthesis (SPOS). The polymer support being obtainable from a method that comprises providing a substrate and a mold, the mold having a defined surface pattern. A composition is placed between the defined surface pattern of the mold and the substrate. The composition comprises a polymerisation medium with at least one functional monomer and a free radical initiator. The composition is polymerised to form an array of polymer imprints adhered to the substrate.
    Type: Grant
    Filed: September 15, 2004
    Date of Patent: August 17, 2010
    Assignee: Agency for Science, Technology and Research
    Inventors: Hong Yee Low, Suresh Parappuveetil Sarangadharan, Yen Peng Kong, Karan Darmono
  • Publication number: 20100193993
    Abstract: There is disclosed a method of making an imprint on a polymer structure comprising the step of pressing a mold having a defined surface pattern against the surface of a primary imprint of a polymer structure to form a secondary imprint thereon.
    Type: Application
    Filed: June 23, 2008
    Publication date: August 5, 2010
    Applicant: Agency for Science, Technology and Research
    Inventors: Hong Yee Low, Karen Chong
  • Publication number: 20100129608
    Abstract: A method of modifying the wetting properties of the surface of a substrate, the method comprising the step of applying a first mold having an imprint forming surface to said substrate to form a first imprint thereon, said imprint forming surface being chosen to modify the wetting properties of the substrate surface.
    Type: Application
    Filed: October 10, 2007
    Publication date: May 27, 2010
    Applicant: AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH
    Inventors: Hong Yee Low, Fengxiang Zhang
  • Patent number: 7704432
    Abstract: An imprint lithographic method for making a polymeric structure comprising the steps of: (a) providing a mold having a shape forming a mold pattern; (b) providing a substrate having a higher surface energy relative to said mold; (c) providing a polymer film on said mold, said polymer film having a selected thickness, wherein the selected thickness of the polymer film on the mold pattern is capable of forming at least one frangible region in the polymer film having a thickness that is less than the remainder of the polymer film; (d) pressing the mold and the substrate relatively toward each other to form said frangible region; and (e) releasing at least one of said mold and said substrate from the other, wherein after said releasing, said frangible region remains substantially attached to said mold while the remainder of said polymer film forms the polymeric structure attached to said substrate.
    Type: Grant
    Filed: May 18, 2006
    Date of Patent: April 27, 2010
    Assignee: Agency for Science, Technology and Research
    Inventors: Jarrett Dumond, Hong Yee Low
  • Publication number: 20090298712
    Abstract: The invention provides a microcapsule array comprising a plurality of microcapsules immobilised on a surface, optionally in microwells in said surface. Each of the microcapsules comprises an outer layer or shell defining a microcapsule interior, said outer layer having a permeability towards a nanoscale species which is dependent on an environmental condition to which said array is exposed.
    Type: Application
    Filed: February 27, 2009
    Publication date: December 3, 2009
    Inventors: Maxim V. Kiryukhin, Maria N. Antipina, Karen Chong, Hong Yee Low, Gleb B. Sukhorukov