Patents by Inventor Hongbin Ma

Hongbin Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6562386
    Abstract: A method and apparatus are provided for at least partially sterilizing a liquid that has pathogens living in the liquid. The liquid comprising living pathogens is placed in a reaction volume, and a non-thermal plasma is generated within the reaction volume to thereby kill at least a portion of the pathogens within the liquid.
    Type: Grant
    Filed: May 7, 2001
    Date of Patent: May 13, 2003
    Assignee: Regents of the University of Minnesota
    Inventors: R. Roger Ruan, Hongbin Ma, Mingliang Zhang, Paul L. Chen, Duane Oyen
  • Publication number: 20030026877
    Abstract: A method and apparatus are provided for at least partially sterilizing a liquid that has pathogens living in the liquid. The liquid comprising living pathogens is placed in a reaction volume, and a non-thermal plasma is generated within the reaction volume to thereby kill at least a portion of the pathogens within the liquid.
    Type: Application
    Filed: May 7, 2001
    Publication date: February 6, 2003
    Inventors: R. Roger Ruan, Hongbin Ma, Mingliang Zhang, Paul L. Chen, Duane Oyen
  • Patent number: 6451252
    Abstract: An odor removal system includes an odorous gas inlet, a treated gas outlet and a gas treatment flow path from the odorous gas inlet to the treated gas outlet. A mixer is coupled in series with the gas treatment flow path and has an ozone inlet coupled to an ozone outlet of an ozone generator. A non-thermal plasma reactor is also coupled in series with the gas treatment flow path.
    Type: Grant
    Filed: January 20, 2000
    Date of Patent: September 17, 2002
    Assignee: Regents of the University of Minnesota
    Inventors: R. Roger Ruan, Hongbin Ma, Ling Chen, Philip R. Goodrich, Shaobo Deng, Ye Wang
  • Patent number: 6146599
    Abstract: A dielectric barrier discharge system includes first and second non-thermal plasma reactors which are coupled together in series. The first reactor includes a first surface discharge electrode which defines a first discharge path along the first surface discharge electrode. The second reactor includes second and third electrodes which are separated by a gap and define a second discharge path which extends across the gap. The system can be used to decompose hazardous compounds in a liquid or a gas, such as in power plant flue gases.
    Type: Grant
    Filed: February 24, 1999
    Date of Patent: November 14, 2000
    Assignee: Seagate Technology LLC
    Inventors: R. Roger Ruan, Paul L. Chen, Anrong Ning, Richard L. Bogaard, Donald G. Robinson, Shaobo Deng, Hongbin Ma, Chuanshuang Bie