Patents by Inventor Hongxia Ma

Hongxia Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230004519
    Abstract: A multi-antenna channel device and a configuration method for the multi-antenna channel device are provided. The device includes: a main control chip and radio frequency chips, wherein the main control chip is connected to chip selection signal interfaces of the radio frequency chips via a shared chip selection signal line and is configured to send a chip selection signal to a target radio frequency chip; the main control chip is connected to clock signal interfaces of the radio frequency chips via a shared clock signal line and is configured to send a clock signal to the target radio frequency chip; and the main control chip is connected to data interfaces of the radio frequency chips via a shared data line and is configured to send target serial data to the target radio frequency chip or receive target serial data from the target radio frequency chip.
    Type: Application
    Filed: August 27, 2020
    Publication date: January 5, 2023
    Inventors: Hongxia MA, Hongyi XU
  • Patent number: 11302524
    Abstract: Embodiments of apparatus and method for testing metal contamination are disclosed. In an example, an apparatus for testing metal contamination includes a chamber in which a test object is placed, a gas supply configured to supply nitrogen gas into the chamber, a pressure controller configured to apply a pressure of at least about 1 torr in the chamber, and a measurement unit configured to measure a concentration of a metal from the test object.
    Type: Grant
    Filed: April 29, 2020
    Date of Patent: April 12, 2022
    Assignee: YANGTZE MEMORY TECHNOLOGIES CO., LTD.
    Inventors: Bingguo Wang, Hongxia Ma, Hongbin Zhu
  • Publication number: 20210249247
    Abstract: Embodiments of apparatus and method for testing metal contamination are disclosed. In an example, an apparatus for testing metal contamination includes a chamber in which a test object is placed, a gas supply configured to supply nitrogen gas into the chamber, a pressure controller configured to apply a pressure of at least about 1 torr in the chamber, and a measurement unit configured to measure a concentration of a metal from the test object.
    Type: Application
    Filed: April 29, 2020
    Publication date: August 12, 2021
    Applicant: YANGTZE MEMORY TECHNOLOGIES CO., LTD.
    Inventors: Bingguo Wang, Hongxia Ma, Hongbin Zhu