Patents by Inventor Hongxu Yan

Hongxu Yan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask plate and a method for producing a substrate mark
    Patent number: 9256121
    Abstract: The general inventive concepts relate to the field of display technology, and provide a mask plate and a method for producing a substrate mark to increase the accuracy of the production of a substrate mark, and decrease the difficulty in monitoring products and the production cost. An exemplary mask plate comprises: a display region mask part; at least one pair of test mark mask parts, a test mark mask part being located on either side of the display region mask part and their positions being opposite to each other; and a protection mark mask part correspondingly disposed on the outside of each test mark mask part relative to the display region mask part, wherein the pattern outline of the protection mark mask part is larger than that of the test mark mask part.
    Type: Grant
    Filed: September 30, 2014
    Date of Patent: February 9, 2016
    Assignees: Boe Technology Group Co., Ltd., Chengdu Boe Optoelectronics Technology Co., Ltd.
    Inventors: Xiaodan Wei, Xingqiang Zhang, Wei Zhao, Hongxu Yan
  • MASK PLATE AND A METHOD FOR PRODUCING A SUBSTRATE MARK
    Publication number: 20150331310
    Abstract: The general inventive concepts relate to the field of display technology, and provide a mask plate and a method for producing a substrate mark to increase the accuracy of the production of a substrate mark, and decrease the difficulty in monitoring products and the production cost. An exemplary mask plate comprises: a display region mask part; at least one pair of test mark mask parts, a test mark mask part being located on either side of the display region mask part and their positions being opposite to each other; and a protection mark mask part correspondingly disposed on the outside of each test mark mask part relative to the display region mask part, wherein the pattern outline of the protection mark mask part is larger than that of the test mark mask part.
    Type: Application
    Filed: September 30, 2014
    Publication date: November 19, 2015
    Inventors: Xiaodan Wei, Xingqiang Zhang, Wei Zhao, Hongxu Yan