Patents by Inventor Hong Ye Lin

Hong Ye Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation curable and developable polyurethane and radiation curable and developable photo resist composition containing the same
    Patent number: 7935776
    Abstract: The present invention relates to a radiation curable and developable polyurethane which is characterized by having a carboxy group in its main chain and a acryloyl group in its side chain and comprising the following repeat units (I), (II), and (II) in a random arrangement: wherein R1, R2, R3, R4, and T are defined in the specification. The polyurethane has a weight molecular weight measured by GPC in a range of from 3,000 to 400,000; an acid value in a range of from 5 to 120 mgKOH/g. The present invention also relates to a radiation curable and developable composition containing the polyurethane.
    Type: Grant
    Filed: March 20, 2008
    Date of Patent: May 3, 2011
    Assignee: AGI Corporation
    Inventors: Wei Hsiang Huang, Ying Jen Chen, Jui Ming Chang, Chun Hung Kuo, Hong Ye Lin, Li Chung Chang
  • Radiation curable and developable polyurethane and radiation curable and developable photo resist composition containing the same
    Publication number: 20080234403
    Abstract: The present invention relates to a radiation curable and developable polyurethane which is characterized by having a carboxy group in its main chain and a acryloyl group in its side chain and comprising the following repeat units (I), (II), and (II) in a random arrangement: wherein R1, R2, R3, R4, and T are defined in the specification. The polyurethane has a weight molecular weight measured by GPC in a range of from 3,000 to 400,000; an acid value in a range of from 5 to 120 mgKOH/g. The present invention also relates to a radiation curable and developable composition containing the polyurethane.
    Type: Application
    Filed: March 20, 2008
    Publication date: September 25, 2008
    Inventors: Wei Hsiang Huang, Ying Jen Chen, Jui Ming Chang, Chun Hung Kuo, Hong Ye Lin, Li Chung Chang