Patents by Inventor Horace Paul Bowser, Jr.

Horace Paul Bowser, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7162326
    Abstract: The physical movement of reticles and solder bump masks within a wafer processing plant are continually tracked and documented in a historical database for the useful life of the reticles or masks. In an example embodiment of the mask tracking method, the method includes moving the masks from one location to another in mask pods. In addition, a mask data set is generated for each mask composed of a mask identification code cross-referenced to a pod identification code and the mask data sets are processed by a computer arrangement. The mask data sets are then updated in the computer arrangement to include a facility location identification code as each mask moves to a subsequent location during wafer processing. The present invention provides the advantage that wafer lots and reticles can be matched to an event on the processing line and stored as data for later review and analysis.
    Type: Grant
    Filed: December 7, 2001
    Date of Patent: January 9, 2007
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Russel Shirley, Michael R. Conboy, Horace Paul Bowser, Jr.
  • Patent number: 6351684
    Abstract: The physical movement of reticles and solder bump masks within a wafer processing plant are continually tracked and documented in a historical database for the useful life of the reticles or masks. In an example embodiment of the mask tracking method, the method includes moving the masks from one location to another in mask pods. In addition, a mask data set is generated for each mask composed of a mask identification code cross-referenced to a pod identification code and the mask data sets are then stored in a computer arrangement. The mask data sets are then updated in the computer arrangement to include a facility location identification code as each mask moves to a subsequent location during wafer processing. An important advantage is that wafer lots and reticles can now be matched to an event on the processing line and stored as data for later review and analysis.
    Type: Grant
    Filed: September 19, 2000
    Date of Patent: February 26, 2002
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Russel Shirley, Michael R. Conboy, Horace Paul Bowser, Jr.