Patents by Inventor Horst Kibbel

Horst Kibbel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7079039
    Abstract: The invention concerns a device for and a process for testing electric motors, in particular fan motors, for functionality, wherein electromagnetic alternating fields produced by an electric motor are received by an antenna, wherein the received signals are analyzed for signal components in the frequency range of the rotation value of electric motors or their harmonics via an analysis unit, and wherein upon determination of functionality the results are indicated by an indicator unit.
    Type: Grant
    Filed: December 15, 2003
    Date of Patent: July 18, 2006
    Assignee: DaimlerChrysler AG
    Inventors: Andreas Gruhle, Horst Kibbel
  • Publication number: 20060051271
    Abstract: Filter body with internal cavities for use in particulate filters for internal combustion engines, which is preferably produced using micro-patterning processes employed in semiconductor technology, such as for example etching or patterned deposition. Integrated resistance heating can be realized by means of the choice of an electrically conductive material for the filter body.
    Type: Application
    Filed: August 19, 2003
    Publication date: March 9, 2006
    Applicant: DaimlerChrysler AG
    Inventors: Claus Holm, Horst Kibbel, Ulf Koenig
  • Publication number: 20060037641
    Abstract: The invention relates to a body part of a vehicle provided with a support and with a transparent covering layer. A thin-film solar cell is applied to said support. The support, together with the thin-film solar cell, is covered by the transparent covering layer. The transparent covering layer consists of a paint layer, particularly a clear varnish layer. The thin-film solar cell is a CIS-, CIGS-, CIGSS-, CdTe- or an Si-based (particularly Si/SiGe) thin-film solar cell.
    Type: Application
    Filed: August 12, 2003
    Publication date: February 23, 2006
    Inventors: Horst Kibbel, Johannes Konle, Ulf Koeing, Harmut Presting
  • Publication number: 20040124844
    Abstract: The invention concerns a device for and a process for testing electric motors, in particular fan motors, for functionality, wherein electromagnetic alternating fields produced by an electric motor are received by an antenna, wherein the received signals are analyzed for signal components in the frequency range of the rotation value of electric motors or their harmonics via an analysis unit, and wherein upon determination of functionality the results are indicated by an indicator unit.
    Type: Application
    Filed: December 15, 2003
    Publication date: July 1, 2004
    Inventors: Andreas Gruhle, Horst Kibbel
  • Patent number: 6670544
    Abstract: A silicon-germanium thin-film solar cell having a quantum well structure as an active base layer within the space-charge region of the silicon p-n diode junction. The quantum well structure is composed of a sequence of silicon and germanium layers. In this manner, a highly absorbent base layer is produced in a silicon solar cell.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: December 30, 2003
    Assignee: DaimlerChrysler AG
    Inventors: Horst Kibbel, Ulf Koenig, Johannes Konle, Hartmut Presting
  • Publication number: 20020112755
    Abstract: A silicon-germanium thin-film solar cell having a quantum well structure as an active base layer within the space-charge region of the silicon p-n diode junction. The quantum well structure is composed of a sequence of silicon and germanium layers. In this manner, a highly absorbent base layer is produced in a silicon solar cell.
    Type: Application
    Filed: December 6, 2001
    Publication date: August 22, 2002
    Inventors: Horst Kibbel, Ulf Koenig, Johannes Konle, Hartmut Presting
  • Patent number: 6313016
    Abstract: A method for producing relaxed epitaxy layers on a semiconductor substrate by an epitaxy process, particularly molecular beam epitaxy, with a hydrogen source, wherein the following steps occur during an in situ process sequence: a hydrogen-containing intermediate layer is deposited on the substrate surface or diffused into the substrate near the surface; a strained epitaxy layer is grown on this intermediate layer; and the epitaxial layer subsequently is relaxed by a temperature treatment. A preferred layer sequence formed according to the above method includes a substrate of silicon with a hydrogen-containing intermediate layer that is deposited thereon or diffused into the substrate surface; a relaxed Si1−xGex epitaxial layer with a germanium concentration of x=0.1 to 0.3 as a first buffer layer; a hydrogen-containing intermediate layer deposited on or diffused into an outer surface of the first buffer layer; a Si1−xGex relaxed epitaxy layer with a germanium concentration of x=0.
    Type: Grant
    Filed: December 22, 1999
    Date of Patent: November 6, 2001
    Assignee: DaimlerChrysler AG
    Inventors: Horst Kibbel, Jessica Kuchenbecker
  • Patent number: 5587327
    Abstract: A process for preparing a bipolar transistor for very high frequencies is described, which is especially advantageous for the preparation of heterobipolar transistors and leads to components with low parasitic capacities and low base lead resistance. The process includes forming a structured first layer with collector zone and insulation areas surrounding the collector zone on a monocrystalline lead layer. A series of monocrystalline transistor layers are grown on the first layer over the collector zone by differential epitaxy and a series of polycrystalline layers is grown at the same time over the insulation areas. A series of polycrystalline layers is designed as a base lead.
    Type: Grant
    Filed: May 23, 1995
    Date of Patent: December 24, 1996
    Assignees: Daimler Benz AG, Temictelefunken Microelectronic GmbH
    Inventors: Ulf Konig, Andreas Gruhle, Andreas Schuppen, Horst Kibbel, Harry Dietrich, Heinz-Achim Hefner
  • Patent number: 4843028
    Abstract: In a method for producing a spatially periodic semiconductor layer structure in the form of a superlattice composed of an alternating arrangement of strained semicondutor layers of at least two different semiconductor compositions forming at least one heterojunction, at least one of the semiconductor layers is provided with a doped layer which extends essentially parallel to the heterojunction and whose layer thickness is no greater than the thickness of the semiconductor layer in which it is produced.
    Type: Grant
    Filed: December 8, 1988
    Date of Patent: June 27, 1989
    Assignee: Icentia Patent-Verwaltungs-GmbH
    Inventors: Hans-Joest Herzog, Helmut Jorke, Horst Kibbel
  • Patent number: 4806502
    Abstract: A method for producing a doped semiconductor layer on a semiconductor substrate, employing particle radiation, including the steps of initially applying an adsorbed layer containing a doping substance to the semiconductor substrate; controlling the concentration of the doping substance in the adsorbed layer; growing a semiconductor layer having a crystal lattice structure on the substrate; performing a secondary implantation operation for incorporating the doping substance in the crystal lattice of the semiconductor layer; and performing a heat treatment for removing crystal lattice imperfections and incorporating the doping substance into crystal lattice positions.
    Type: Grant
    Filed: December 9, 1987
    Date of Patent: February 21, 1989
    Assignee: Licentia Patent-Verwaltungs-GmbH
    Inventors: Helmut Jorke, Horst Kibbel