Patents by Inventor Horst Roeschert

Horst Roeschert has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5364734
    Abstract: A positive-working radiation-sensitive mixture is disclosed that contains(a) a compound that forms strong acid on exposure to actinic radiation that is an ester of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II: ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10) alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl- (C.sub.1 -C.sub.10) alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n is 1 or 2,(b) a compound that contains at least one acid-cleavable C--O--C or C--O--Si bond, and(c) a water-insoluble polymeric binder that is soluble or at least swellable in aqueous alkaline solutions.
    Type: Grant
    Filed: June 9, 1992
    Date of Patent: November 15, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Horst Roeschert, Walter Spiess, Klaus-Juergen Przybilla
  • Patent number: 5346804
    Abstract: A radiation-sensitive mixture which contains compounds of the formula I which generate under irradiation sulfonic acids and are cleavable by the latter ##STR1## in which R.sup.1 is an unsubstituted or substituted alkyl, fluorinated alkyl, perfluoroalkyl or aryl radical,R.sup.2 is a hydrogen atom, an unsubstituted or substituted alkyl radical, or an unsubstituted or substituted aryl radical, (R.sup.1 --SO.sub.2 --O--).sub.n X--, or R.sub.3 O--,R.sup.3 and R.sup.4 are identical or different and are unsubstituted or substituted alkyl, cycloalkylalkyl, cycloalkenylalkyl or aralkyl radicals, in which 1 to 3 aliphatic CH.sub.2 or CH groups are optionally replaced by one or more of NR.sup.5, O, S, CO, CO--O, CO--NH, O--CO--NH, CO--NH--CO, NH--CO--NH, SO.sub.2, SO.sub.2 --O or SO.sub.2 --NH, or unsubstituted or substituted alkenyl, alkynyl, cycloalkyl or cycloalkenyl radicals, or R.sup.3 and R.sup.4 are mutually linked to form an unsubstituted or substituted heterocyclic ring,R.sup.
    Type: Grant
    Filed: April 20, 1992
    Date of Patent: September 13, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Geog Pawlowski, Ralph Dammel, Horst Roeschert, Walter Spiess, Charlotte Eckes
  • Patent number: 5346806
    Abstract: Ligomeric sulfonic acid derivatives having repeating units of the formula I ##STR1## in which R.sup.1 is an alkyl, haloalkyl or aryl radical,R.sup.2 is a hydrogen atom, an alkyl, alkenyl or aryl radical or the group (R.sup.1 --SO.sub.2 --O--).sub.n X--,R.sup.3 is a cycloalkylenedialkyl, cycloalkenylenedialkyl, arylenedialkyl, heteroarylenedialkyl group, alkylene, alkenylene, alkynylene, cycloalkylene or arylene group,X is an alkylene, cycloalkylene or arylene group Y is O, S, CO, CO--O, SO.sub.2, SO.sub.2 --O, NR.sup.4, CO--NH, O--CO--NR.sup.5, NH--CO--NR.sup.5 or NR.sup.5 --CO--O,Z is O, CO--NR.sup.6, O--CO--NR.sup.6 or NH--CO--NR.sup.6,R.sup.4 is an acyl radical,R.sup.5 is a hydrogen atom or an alkyl-, cycloalkyl, alkenyl, alkynyl or aryl radical,R.sup.6 is an alkyl, cycloalkyl, alkenyl, alkynyl or aryl radical,k is 0, 1, 2, 3 or 4,m is an integer greater than 1 andn is 1, 2 or 3,generate sulfonic acids under irradiation and are cleavable by the latter.
    Type: Grant
    Filed: April 20, 1992
    Date of Patent: September 13, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Ralph Dammel, Horst Roeschert, Walter Spiess, Charlotte Eckes
  • Patent number: 5340682
    Abstract: A positive-working radiation-sensitive mixture is disclosed which contains as essential constituents:a) an .alpha.-carbonyl-.alpha.-sulfonyl-diazomethane, which forms a strong acid on irradiation, of the general formula I ##STR1## in which R.sup.1 and R.sup.2, independently of one another, denote an alkyl-, cycloalkyl-, aryl- or heteroaryl radicalb) a compound having at least one C--O--C or C--O--Si bond which can be cleaved by acid, andc) a water-insoluble binder which is soluble or at least swellable in aqueous-alkaline solutions.The radiation-sensitive mixture according to the invention is notable for a high sensitivity over a wide spectral range. It also exhibits a high thermal stability and does not form any corrosive photoylsis products on exposure to light.
    Type: Grant
    Filed: April 9, 1993
    Date of Patent: August 23, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Hans-Joachim Merrem, Juergen Lingnau, Ralph Dammel, Horst Roeschert
  • Patent number: 5338641
    Abstract: A positive-working radiation-sensitive mixture is disclosed which contains as essential constituents:a) an .alpha.,.alpha.-bis(sulfonyl)diazomethane, which forms a strong acid on irradiation, of the general formula ##STR1## in which R is an optionally substituted alkyl, cycloalkyl, aryl or heteroaryl radical,b) a compound having at least one C--O--C or C--O--Si--bond which can be cleaved by acid, andc) a water-insoluble binder which is soluble or at least swellable in aqueous alkaline solutions.The radiation-sensitive mixture according to the invention is notable for a high sensitivity over a wide spectral range. It also exhibits a high thermal stability and does not form any corrosive photolysis products on exposure to light.
    Type: Grant
    Filed: March 4, 1993
    Date of Patent: August 16, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Hans-Joachim Merrem, Juergen Lingnau, Ralph Dammel, Horst Roeschert
  • Patent number: 5328973
    Abstract: A radiation-sensitive mixture which contains a polymeric binder having acid-labile side groups and a compound which generates a strong acid on irradiation wherein the binder is a polymer built up from novel amides of .alpha.,.beta.-unsaturated carboxylic acids, is highly sensitive in the shortwave uv region and useful in the production of recording material.
    Type: Grant
    Filed: July 31, 1992
    Date of Patent: July 12, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Horst Roeschert, Georg Pawlowski, Klaus-Juergen Przybilla
  • Patent number: 5326826
    Abstract: Radiation-sensitive polymers, a mixture containing these radiation-sensitive polymers as binder, and a process for the preparation of the radiation-sensitive polymer binders are disclosed. A positive radiation-sensitive recording material containing the radiation-sensitive polymer is also disclosed.
    Type: Grant
    Filed: February 26, 1992
    Date of Patent: July 5, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Horst Roeschert, Hans-Joachim Merrem, Georg Pawlowski, Juergen Fuchs, Ralph Dammel
  • Patent number: 5326840
    Abstract: A radiation-sensitive mixture is disclosed that contains a polymeric binder having acid-cleavable side groups and a compound which forms a strong acid on irradiation. Novel amides of .alpha.,.beta.-unsaturated carboxylic acids with which the polymers used as binders are synthesized are also disclosed. A positive- or negative-working radiation-sensitive recording material comprising a base and a layer of the radiation-sensitive mixture according to the invention is also disclosed.
    Type: Grant
    Filed: June 9, 1992
    Date of Patent: July 5, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Klaus-Juergen Przybilla, Georg Pawlowski, Horst Roeschert
  • Patent number: 5314786
    Abstract: A 2,4,6-tris-(2-hydroxyethoxy)-[1,3,5]triazine esterified with two or three arylsulfonic acids or heteroarylsulfonic acids is useful to prepare a positive-working radiation-sensitive mixture which is distinguished by a high resolution and a high sensitivity over a wide spectral range. It also shows high thermal stability and does not form corrosive photolysis products on exposure. A radiation-sensitive recording material which is produced from these esters is suitable for producing photoresists, electronic components, printing plates or for chemical milling.
    Type: Grant
    Filed: April 20, 1992
    Date of Patent: May 24, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Horst Roeschert, Georg Pawlowski, Juergen Fuchs
  • Patent number: 5302488
    Abstract: A radiation-sensitive polymer and a mixture containing this radiation-sensitive polymer as a binder are disclosed. A process for the preparation of the radiation-sensitive polymer binder and a positive-working radiation-sensitive recording material which is prepared using the radiation-sensitive mixture are also disclosed.
    Type: Grant
    Filed: February 26, 1992
    Date of Patent: April 12, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Horst Roeschert, Hans-Joachim Merrem, Georg Pawlowski, Juergen Fuchs, Ralph Dammel
  • Patent number: 5298364
    Abstract: Sulfonic acid esters of 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine are disclosed. Also disclosed is a negative-working radiation-sensitive mixture containing such a compound in combination with a compound containing at least two acid-crosslinkable groups, and a water-insoluble polymeric binder which is soluble or at least swellable in aqueous alkaline solutions. The esters are esters of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10)-alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl-(C.sub.1 -C.sub.10)alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n may be 1 or 2.
    Type: Grant
    Filed: June 9, 1992
    Date of Patent: March 29, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Horst Roeschert, Walter Spiess, Klaus-Juergen Przybilla
  • Patent number: 5286602
    Abstract: Compounds having repeating units of the formula I ##STR1## in which R.sup.1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH.sub.2 groups may be replaced by oxygen or sulfur atoms,R.sup.2 is an alkyl, alkenyl, alkynyl, cycloalkyl, alkoxyalkyl, aryl, aralkyl or aryloxyalkyl radical,R.sup.3 is an alkyl or aryl radical,X is --CO--, --O--CO-- or --NH--CO--, andn is an integer greater than 1, especially from 3 to 50.are cleavable by acid and, in combination with photolytic acid donors and alkali-soluble binders, are constituents of positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast.
    Type: Grant
    Filed: April 20, 1992
    Date of Patent: February 15, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Horst Roeschert, Walter Spiess, Ralph Dammel
  • Patent number: 5256517
    Abstract: A positive-working radiation-sensitive mixture is described which essentially contains a photoactive component and a water-insoluble binder which is soluble, or at least swellable, in aqueous alkaline solution, wherein a compound is used, as photoactive component, which contains .alpha.-diazo-.beta.-keto ester units and sulfonate units of the formula I ##STR1## in which R.sup.1 and R.sup.2, independently of one another, are an unsubstituted or substituted aliphatic, cycloaliphatic, araliphatic or aromatic radical having 4 to 20 carbon atoms, it being possible for individual CH.sub.2 groups to be replaced by oxygen or sulfur atoms or by N or NH groups and/or contain keto groups,X is an unsubstituted or substituted aliphatic, cycloaliphatic, carbocyclic, heterocyclic or araliphatic radical having 2 to 22 carbon atoms, it being possible for individual CH.sub.2 groups to be replaced by oxygen or sulfur atoms or by the groups --NR.sup.3 --, --C(O)--0--, --C(O)--NR.sup.3 --, ##STR2## --NR.sup.3 --C(O)--NR.sup.
    Type: Grant
    Filed: May 1, 1991
    Date of Patent: October 26, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Horst Roeschert, Georg Pawlowski, Hans-Joachim Merrem, Ralph Dammel, Walter Spiess
  • Patent number: 5247096
    Abstract: A process is described for preparing N-tert-butoxycarbonylmaleimide from maleimide and di-tert-butyl dicarbonate which comprises reacting maleimide with di-tert-butyl dicarbonate in the presence of a basic compound of the general formula I ##STR1## in which A represents the ring members required to complete a five- or six-membered saturated ring and R is (C.sub.1 -C.sub.4)alkyl, in one stage to give the end product.In a preferred embodiment, the compound of the general formula I is N-methylmorpholine.The product is useful as a monomer for polymerization, with the styrene copolymers being particularly suitable for chemically reinforced radiation-sensitive mixtures.
    Type: Grant
    Filed: July 17, 1992
    Date of Patent: September 21, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Horst Roeschert, Ralph Dammel, Georg Pawlowski, Klaus-Juergen Przybilla
  • Patent number: 5227276
    Abstract: A negative-working radiation-sensitive mixture containinga) a compound which generates a strong acid under the action of actinic radiation,b) a compound having at least two groups crosslinkable by means of acid andc) a polymeric binder which is insoluble in water and soluble or at least swellable in aqueous alkaline solutions,wherein the compound (a) contains a 2,4,6-tris-(2-hydroxyethoxy)-[1,3,5]triazine which is esterified with two or three arylsulfonic acids or heteroarylsulfonic acids, is distinguished by high resolution and high sensitivity over a wide spectral range. It also shows high thermal stability and does not form any corrosive photolysis products on exposure. A radiation-sensitive recording material which has been produced with this mixture is suitable for the production of photoresists, electronic components, printed plates or for chemical milling.
    Type: Grant
    Filed: April 20, 1992
    Date of Patent: July 13, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Horst Roeschert, Georg Pawlowski, Juergen Fuchs
  • Patent number: 5191069
    Abstract: Polyfunctional compounds containing .alpha.-diazo-.beta.-keto ester units and sulfonate units are disclosed. The polyfunctional compounds have high sensitivity in the deep UV and high thermal stability. Processes for producing the compounds are disclosed. A preferred process first synthesizes .beta.-ketoester/sulfonate precursors and then uses diazo transfer to convert the precursors into the novel compounds. Radiation-sensitive mixtures containing the compounds are also disclosed.
    Type: Grant
    Filed: May 1, 1991
    Date of Patent: March 2, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Horst Roeschert, Georg Pawlowski, Hans-Joachim Merrem, Ralph Dammel