Patents by Inventor Howard Hao

Howard Hao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11301377
    Abstract: A memory tile, in a local memory, may be considered to be a unit of memory structure that carries multiple memory elements, wherein each memory element is a one-dimensional memory structure. Multiple memory tiles make up a memory segment. By structuring the memory tiles, and a mapping matrix to the memory tiles, within a memory segment, non-blocking, concurrent write and read accesses to the local memory for multiple requestors may be achieved with relatively high throughput. The accesses may be either row-major or column-major for a two-dimensional memory array.
    Type: Grant
    Filed: August 20, 2020
    Date of Patent: April 12, 2022
    Assignee: Marvell Rianta Semiconductor ULC
    Inventors: Alan Chi-Lun Wai, Alexandre Zassoko, Howard (Hao) Lu
  • Publication number: 20220058126
    Abstract: A memory tile, in a local memory, may be considered to be a unit of memory structure that carries multiple memory elements, wherein each memory element is a one-dimensional memory structure. Multiple memory tiles make up a memory segment. By structuring the memory tiles, and a mapping matrix to the memory tiles, within a memory segment, non-blocking, concurrent write and read accesses to the local memory for multiple requestors may be achieved with relatively high throughput. The accesses may be either row-major or column-major for a two-dimensional memory array.
    Type: Application
    Filed: August 20, 2020
    Publication date: February 24, 2022
    Inventors: Alan Chi-Lun Wai, Alexandre ZASSOKO, Howard (Hao) LU
  • Patent number: 8832029
    Abstract: A record of changes to virtual machine data of a virtual machine and a record of changes to snapshots of the virtual machine that have been received since the virtual machine was last backed up are maintained. In response to it being time to perform an incremental backup of the virtual machine, a portion of the virtual machine data is backed up based on the record of changes to the virtual machine data, and a portion of the snapshots is backed up based on the record of changes to the snapshots. In response to it being time to migrate the virtual machine to a second host device, the virtual machine data, the record of changes to the virtual machine data, the record of changes to the snapshots, and one or more of the snapshots are migrated to the second host device.
    Type: Grant
    Filed: February 16, 2011
    Date of Patent: September 9, 2014
    Assignee: Microsoft Corporation
    Inventors: Angshuman Bezbaruah, Christopher L. Eck, Soumya Kanti Das Bhaumik, Hasan Serdar Sutay, Howard Hao
  • Publication number: 20130054533
    Abstract: The subject disclosure is directed towards verifying a data recovery component of a volume snapshot service using a managed interface. The managed interface enables interoperability between the data recovery component and one or more complementary data recovery components by converting compatible instructions for the data recovery component and a complementary data recovery component into native data recovery operations for the volume snapshot service and vice versa. Via the managed interface, the complementary data recovery component emulates the native data recovery operations. Using status information associated with such an emulation, the data recovery component is verifiable.
    Type: Application
    Filed: August 24, 2011
    Publication date: February 28, 2013
    Applicant: MICROSOFT CORPORATION
    Inventors: Howard Hao, James Robert Benton, Thothathri Vanamamalai
  • Publication number: 20120209812
    Abstract: A record of changes to virtual machine data of a virtual machine and a record of changes to snapshots of the virtual machine that have been received since the virtual machine was last backed up are maintained. In response to it being time to perform an incremental backup of the virtual machine, a portion of the virtual machine data is backed up based on the record of changes to the virtual machine data, and a portion of the snapshots is backed up based on the record of changes to the snapshots. In response to it being time to migrate the virtual machine to a second host device, the virtual machine data, the record of changes to the virtual machine data, the record of changes to the snapshots, and one or more of the snapshots are migrated to the second host device.
    Type: Application
    Filed: February 16, 2011
    Publication date: August 16, 2012
    Applicant: MICROSOFT CORPORATION
    Inventors: Angshuman Bezbaruah, Christopher L. Eck, Soumya Kanti Das Bhaumik, Hasan Serdar Sutay, Howard Hao
  • Patent number: 8129609
    Abstract: Semiconductor integrated thermoelectric devices are provided, which are formed having high-density arrays of thermoelectric (TE) elements using semiconductor thin-film and VLSI (very large scale integration) fabrication processes. Thermoelectric devices can be either separately formed and bonded to semiconductor chips, or integrally formed within the non-active surface of semiconductor chips, for example.
    Type: Grant
    Filed: May 13, 2009
    Date of Patent: March 6, 2012
    Assignee: International Business Machines Corporation
    Inventors: Howard Hao Chen, Richard C. Chu, Louis L. Hsu
  • Patent number: 8004097
    Abstract: Methods for manufacturing an integrated wafer scale package that reduces a potential misalignment between a chip and a pocket of a carrier substrate. According to one aspect of the present invention, a method for manufacturing a semiconductor device includes a photoresist layer disposed on a carrier substrate, a chip placed onto a surface of the photoresist layer. The photoresist layer is patterned using the chip as a mask. The chip is removed from the photoresist layer after the patterning step. A pocket is formed in the carrier substrate, and the chip that was removed is placed into the pocket formed in the carrier substrate.
    Type: Grant
    Filed: October 2, 2008
    Date of Patent: August 23, 2011
    Assignee: International Business Machines Corporation
    Inventors: Howard Hao Chen, Louis L. Hsu
  • Patent number: 7947566
    Abstract: A semiconductor processing method includes providing a substrate, forming a plurality of semiconductor layers in the substrate, each of the semiconductor layers being distinct and selected from different groups of semiconductor element types. The semiconductor layers include a first, second, and third semiconductor layers. The method further includes forming a plurality of lateral void gap isolation regions for isolating portions of each of the semiconductor layers from portions of the other semiconductor layers.
    Type: Grant
    Filed: January 31, 2008
    Date of Patent: May 24, 2011
    Assignee: International Business Machines Corporation
    Inventors: Howard Hao Chen, Louis Lu-Chen Hsu, Jack Allan Mandelman
  • Patent number: 7867820
    Abstract: Economical methods for forming a co-planar multi-chip wafer-level packages are proposed. Partial wafer bonding and partial wafer dicing techniques are used to create chips as well as pockets. The finished chips are then mounted in the corresponding pockets of a carrier substrate, and global interconnects among the chips are formed on the top planar surface of the finished chips. The proposed methods facilitate the integration of chips fabricated with different process steps and materials. There is no need to use a planarization process such as chemical-mechanical polish to planarize the top surfaces of the chips. Since the chips are precisely aligned to each other and all the chips are mounted facing up, the module is ready for global wiring, which eliminates the need to flip the chips from an upside-down position.
    Type: Grant
    Filed: May 15, 2008
    Date of Patent: January 11, 2011
    Assignee: International Business Machines Corporation
    Inventors: Lloyd G. Burrell, Howard Hao Chen, Louis L. Hsu, Wolfgang Sauter
  • Patent number: 7736949
    Abstract: A semiconductor package includes an SOI wafer having a first side including an integrated circuit system, and a second side, opposite the first side, forming at least one cavity. At least one chip or component is placed in the cavity. An optical through via is formed through a buried oxide which optically connects the chip(s) to the integrated circuit system.
    Type: Grant
    Filed: August 27, 2008
    Date of Patent: June 15, 2010
    Assignee: International Business Machines Corporation
    Inventors: Howard Hao Chen, Louis Lu-Chen Hsu
  • Publication number: 20090217961
    Abstract: Semiconductor integrated thermoelectric devices are provided, which are formed having high-density arrays of thermoelectric (TE) elements using semiconductor thin-film and VLSI (very large scale integration) fabrication processes. Thermoelectric devices can be either separately formed and bonded to semiconductor chips, or integrally formed within the non-active surface of semiconductor chips, for example.
    Type: Application
    Filed: May 13, 2009
    Publication date: September 3, 2009
    Applicant: International Business Machines Corporation
    Inventors: Howard Hao Chen, Richard C. Chu, Louis L. Hsu
  • Patent number: 7544883
    Abstract: Semiconductor integrated thermoelectric devices are provided, which are formed having high-density arrays of thermoelectric (TE) elements using semiconductor thin-film and VLSI (very large scale integration) fabrication processes. Thermoelectric devices can be either separately formed and bonded to semiconductor chips, or integrally formed within the non-active surface of semiconductor chips, for example.
    Type: Grant
    Filed: November 12, 2004
    Date of Patent: June 9, 2009
    Assignee: International Business Machines Corporation
    Inventors: Howard Hao Chen, Richard C. Chu, Louis L. Hsu
  • Publication number: 20090121312
    Abstract: A semiconductor processing method includes providing a substrate, forming a plurality of semiconductor layers in the substrate, each of the semiconductor layers being distinct and selected from different groups of semiconductor element types. The semiconductor layers include a first, second, and third semiconductor layers. The method further includes forming a plurality of lateral void gap isolation regions for isolating portions of each of the semiconductor layers from portions of the other semiconductor layers.
    Type: Application
    Filed: January 31, 2008
    Publication date: May 14, 2009
    Inventors: Howard Hao Chen, Louis Lu-Chen Hsu, Jack Allan Mandelman
  • Patent number: 7528483
    Abstract: A cooling system for a semiconductor substrate includes a plurality of trenches formed from a backside of the semiconductor substrate, and thermally conductive material deposited in the plurality of trenches. A method of forming cooling elements in a semiconductor substrate, includes coating a backside of the semiconductor substrate with a first mask layer, forming a plurality of trench patterns in the first mask layer, etching the semiconductor substrate to form a plurality of trenches along the plurality of trench patterns, and depositing thermally conductive material in the plurality of trenches. Trenches constructed from the backside of a wafer improve efficiency of heat transfer from a front-side to the backside of an integrated-circuit chip. The fabrication of trenches from the backside of the wafer allows for increases in the depth and number of trenches, and provides a means to attach passive and active cooling devices directly to the backside of a wafer.
    Type: Grant
    Filed: November 9, 2006
    Date of Patent: May 5, 2009
    Assignee: International Business Machines Corporation
    Inventors: Howard Hao Chen, Louis L. Hsu, Joseph F. Shepard, Jr.
  • Patent number: 7489025
    Abstract: A semiconductor package includes an SOI wafer having a first side including an integrated circuit system, and a second side, opposite the first side, forming at least one cavity. At least one chip or component is placed in the cavity. An optical through via is formed through a buried oxide which optically connects the chip(s) to the integrated circuit system.
    Type: Grant
    Filed: January 4, 2006
    Date of Patent: February 10, 2009
    Assignee: International Business Machines Corporation
    Inventors: Howard Hao Chen, Louis Lu-Chen Hsu
  • Publication number: 20090020891
    Abstract: Methods for manufacturing an integrated wafer scale package that reduces a potential misalignment between a chip and a pocket of a carrier substrate. According to one aspect of the present invention, a method for manufacturing a semiconductor device includes a photoresist layer disposed on a carrier substrate, a chip placed onto a surface of the photoresist layer. The photoresist layer is patterned using the chip as a mask. The chip is removed from the photoresist layer after the patterning step. A pocket is formed in the carrier substrate, and the chip that was removed is placed into the pocket formed in the carrier substrate.
    Type: Application
    Filed: October 2, 2008
    Publication date: January 22, 2009
    Inventors: Howard Hao Chen, Louis L. Hsu
  • Publication number: 20080318360
    Abstract: A semiconductor package includes an SOI wafer having a first side including an integrated circuit system, and a second side, opposite the first side, forming at least one cavity. At least one chip or component is placed in the cavity. An optical through via is formed through a buried oxide which optically connects the chip(s) to the integrated circuit system.
    Type: Application
    Filed: August 27, 2008
    Publication date: December 25, 2008
    Inventors: HOWARD HAO CHEN, LOUIS LU-CHEN HSU
  • Publication number: 20080280399
    Abstract: Economical methods for forming a co-planar multi-chip wafer-level packages are proposed. Partial wafer bonding and partial wafer dicing techniques are used to create chips as well as pockets. The finished chips are then mounted in the corresponding pockets of a carrier substrate, and global interconnects among the chips are formed on the top planar surface of the finished chips. The proposed methods facilitate the integration of chips fabricated with different process steps and materials. There is no need to use a planarization process such as chemical-mechanical polish to planarize the top surfaces of the chips. Since the chips are precisely aligned to each other and all the chips are mounted facing up, the module is ready for global wiring, which eliminates the need to flip the chips from an upside-down position.
    Type: Application
    Filed: May 15, 2008
    Publication date: November 13, 2008
    Inventors: Lloyd G. Burrell, Howard Hao Chen, Louis L. Hsu, Wolfgang Sauter
  • Patent number: 7442579
    Abstract: Methods for manufacturing an integrated wafer scale package that reduces a potential misalignment between a chip and a pocket of a carrier substrate. According to one aspect of the present invention, a method for manufacturing a semiconductor device includes a photoresist layer disposed on a carrier substrate, a chip placed onto a surface of the photoresist layer. The photoresist layer is patterned using the chip as a mask. The chip is removed from the photoresist layer after the patterning step. A pocket is formed in the carrier substrate, and the chip that was removed is placed into the pocket formed in the carrier substrate.
    Type: Grant
    Filed: November 22, 2004
    Date of Patent: October 28, 2008
    Assignee: International Business Machines Corporation
    Inventors: Howard Hao Chen, Louis L. Hsu
  • Patent number: 7405108
    Abstract: Economical methods for forming a co-planar multi-chip wafer-level packages are proposed. Partial wafer bonding and partial wafer dicing techniques are used to create chips as well as pockets. The finished chips are then mounted in the corresponding pockets of a carrier substrate, and global interconnects among the chips are formed on the top planar surface of the finished chips. The proposed methods facilitate the integration of chips fabricated with different process steps and materials. There is no need to use a planarization process such as chemical-mechanical polish to planarize the top surfaces of the chips. Since the chips are precisely aligned to each other and all the chips are mounted facing up, the module is ready for global wiring, which eliminates the need to flip the chips from an upside-down position.
    Type: Grant
    Filed: November 20, 2004
    Date of Patent: July 29, 2008
    Assignee: International Business Machines Corporation
    Inventors: Lloyd G. Burrell, Howard Hao Chen, Louis L. Hsu, Wolfgang Sauter