Abstract: An endcap chip is provided for a multichip stack comprising multiple integrated circuit chips laminated together. The endcap chip has a substrate with an upper surface and a edge surface, which extends in a plane orthogonal to the upper surface. At least one conductive, monolithic L-connect is disposed over the substrate such that a first leg extends at least partially over the upper surface of the substrate and a second leg extends at least partially over the edge surface of the substrate. When the endcap chip is located at the end of the multichip stack, the at least one conductive, monolithic L-connect electrically connects metal on an end face of the stack to metal on a side face of the stack. A fabrication process is set forth for producing the endcap chip with lithographically defined dimensions.

Abstract: An integrated memory cube structure and method of fabrication wherein stacked semiconductor memory chips are integrated by a controlling logic chip such that a more powerful memory architecture is defined with the functional appearance of a single, higher level memory chip. A memory/logic cube is formed having N memory chips and at least one logic chip, with each memory chip of the cube having M memory devices. The controlling logic chip coordinates external communication with the N memory chips such that a single memory chip architecture with N.times.M memory devices appears at the cube's I/O pins. A corresponding fabrication technique includes an approach for facilitating metallization patterning on the side surface of the memory subunit.

Abstract: An integrated memory cube structure and method of fabrication wherein stacked semiconductor memory chips are integrated by a controlling logic chip such that a more powerful memory architecture is defined with the functional appearance of a single, higher level memory chip. A memory/logic cube is formed having N memory chips and at least one logic chip, with each memory chip of the cube having M memory devices. The controlling logic chip coordinates external communication with the N memory chips such that a single memory chip architecture with N.times.M memory devices appears at the cube's I/O pins. A corresponding fabrication technique includes an approach for facilitating metallization patterning on the side surface of the memory subunit.

Abstract: In a memory system comprising a plurality of memory units each of which possesses unit-level error correction capabilities and each of which are tied to a system level error correction function, memory reliability is enhanced by providing means for disabling the unit-level error correction capability, for example, in response to the occurrence of an uncorrectable error in one of the memory units. This counter-intuitive approach which disables an error correction function nonetheless enhances overall memory system reliability since it enables the employment of the complement/recomplement algorithm which depends upon the presence of reproducible errors for proper operation. Thus, chip level error correction systems, which are increasingly desirable at high packaging densities, are employed in a way which does not interfere with system level error correction methods.

Abstract: A power up detection circuit is provided which includes a power supply terminal, an output terminal, an impedance device coupling the output terminal to the power supply terminal and a latch including a first inverter having a first device connected between the output terminal and a point of reference potential and a second device connected between the output terminal and the power supply terminal, the devices are designed so that subthreshold current passing through the first device is greater than the effective subthreshold current passing through the impedance device and the second device, and a second inverter including third and fourth devices which are designed so that a smaller subthreshold current passes through the third device than the subthreshold current passing through the fourth device. The power up circuit may further include a capacitor connected between the power supply terminal and gate electrodes of the first and second devices.

Abstract: Multichip integrated circuit packages and systems of multichip packages having reduced interconnecting lead lengths are disclosed. The multichip package includes a multiplicity of semiconductor chip layers laminated together in a unitized module. A first metallization pattern is connected to the integrated circuit chips on at least one side surface of the unitized module. In addition, at least one end surface of the module contains a second metallization pattern which is configured to facilitate connection of the package to an external signal source, such as another multichip package. The system includes at least two such packages which are electrically coupled via either metallization patterns provided on the end surface of the packagers. If required, a plurality of multichip packages can be directly coupled into the system in an analogous manner. Further specific details of the multichip package and the system of multichip packages are set forth herein.

Abstract: A semiconductor device memory array formed on a semiconductor substrate comprising a multiplicity of field effect transistor DRAM devices disposed in array is disclosed. Each of the DRAM devices is paired with a non-volatile EEPROM cell and the EEPROM cells are disposed in a shallow trench in the semiconductor substrate running between the DRAM devices such that each DRAM-EEPROM pair shares a common drain diffusion. The EEPROM cells are arranged in the trench such that there are discontinuous laterally disposed floating gate polysilicon electrodes and continuous horizontally disposed program and recall gate polysilicon electrodes. The floating gate is separated from the program and recall gates by a silicon rich nitride. The array of the invention provides high density shadow RAMs. Also disclosed are methods for the fabrication of devices of the invention.

Abstract: A fabrication method and resultant three-dimensional multichip package having a densely stacked array of semiconductor chips interconnected at least partially by means of a plurality of metallized trenches are disclosed. The fabrication method includes providing an integrated circuit chip having high aspect ratio metallized trenches therein extending from a first surface to a second surface thereof. An etch stop layer is provided proximate the termination position of the metallized trenches with the semiconductor substrate. Next the integrated circuit device is affixed to a carrier such that the surface of the supporting substrate is exposed and substrate is thinned from the integrated circuit device until exposing at least some of the plurality of metallized trenches therein. Electrical contact can thus be made to the active layer of the integrated circuit chip via the exposed metallized trenches. Specific details of the fabrication method and the resultant multichip package are set forth.

Abstract: A method is provided for flash writing to multiple cells of a memory array. Initially, a first set of word lines, each of which controls connection of a memory cell of a first set of memory cells to a first bit line of a bit line pair, is turned on. The voltage between the two bit lines of the bit line pair is then equalized so that the charge on the first bit line of the bit line pair is higher than the charge on the second bit line of the bit line pair. Next, a sense amplifier attached to the bit line pair is turned on to sense a difference in charge between the bit line pair and to charge the first set of memory cells. Then a second set of word lines, each of which controls connection of a memory cell of a second set of memory cells to the second bit line is turned on. Finally, the word lines previously turned on are shut off and then the sense amplifier is shut off.

Abstract: In a memory system comprising a plurality of memory units each of which possesses unit-level error correction capabilities and each of which are tied to a system level error correction function, memory reliability is enhanced by providing a mechanism for disabling the unit-level error correction capability, for example, in response to the occurrence of an uncorrectable error in one of the memory units. This counter-intuitive approach which disables an error correction function nonetheless enhances overall memory system reliability since it enables the employment of the complement/recomplement algorithm which depends upon the presence of reproducible errors for proper operation. Thus, chip level error correction systems, which are increasingly desirable at high packaging densities, are employed in a way which does not interfere with system level error correction methods.

Abstract: A fabrication method and resultant three-dimensional multichip package having a densely stacked array of semiconductor chips interconnected at least partially by means of a plurality of metallized trenches are disclosed. The fabrication method includes providing an integrated circuit chip having high aspect ratio metallized trenches therein extending from a first surface to a second surface thereof. An etch stop layer is provided proximate the termination position of the metallized trenches with the semiconductor substrate. Next the integrated circuit device is affixed to a carrier such that the surface of the supporting substrate is exposed and substrate is thinned from the integrated circuit device until exposing at least some of the plurality of metallized trenches therein. Electrical contact can thus be made to the active layer of the integrated circuit chip via the exposed metallized trenches. Specific details of the fabrication method and the resultant multichip package are set forth.

Abstract: A semiconductor device memory array formed on a semiconductor substrate comprising a multiplicity of field effect transistor DRAM devices disposed in array is disclosed. Each of the DRAM devices is paired with a non-volatile EEPROM cell and the EEPROM cells are disposed in a shallow trench in the semiconductor substrate running between the DRAM devices such that each DRAM-EEPROM pair shares a common drain diffusion. The EEPROM cells are arranged in the trench such that there are discontinuous laterally disposed floating gate polysilicon electrodes and continuous horizontally disposed program and recall gate polysilicon electrodes. The floating gate is separated from the program and recall gates by a silicon rich nitride. The array of the invention provides high density shadow RAMs. Also disclosed are methods for the fabrication of devices of the invention.

Abstract: A DRAM having on-chip ECC and both bit and word redundancy that have been optimized to support the on-chip ECC. The bit line redundancy features a switching network that provides an any-for-any substitution for the bit lines in the associated memory array. The word line redundancy is provided in a separate array section, and has been optimized to maximize signal while reducing soft errors. The array stores data in the form of error correction words (ECWs) on each word line. A first set of data lines (formed in a zig-zag pattern to minimize unequal capacitive loading on the underlying bit lines) are coupled to read out an ECW as well as the redundant bit lines. A second set of data lines receive the ECW as corrected by bit line redundancy, and a third set of data lines receive the ECW as corrected by the word line redundancy. The third set of data lines are coupled to the ECC block, which corrects errors encountered in the ECW.

Abstract: In a memory system comprising a plurality of memory units each of which possesses unit-level error correction capabilities and each of which are tied to a system level error correction function, memory reliability is enhanced by providing means for fixing the output of one of the memory units at a fixed value in response to the occurrence of an uncorrectable error in one of the memory units. This counter-intuitive approach to the generation of forced hard errors nonetheless enhances overall memory system reliability since it enables the employment of the complement/recomplement algorithm which depends upon the presence of reproducible errors for proper operation. Thus, clip level error correction systems, which are increasingly desirable at high packaging densities, are employed in a way which does not interfere with system level error correction methods.

Abstract: A semiconductor memory device is described in which wordline redundancy is implemented without impacting the access time. A redundant decoder circuit generates a wordline drive inhibit signal which inhibits the generation of a normal wordline signal. Deselection also deselects the normally accessed reference cells, requiring that the redundant cells provide their own reference signal. This last requirement is accomplished by utilization of twin cells for the redundant memory. Placing the redundant memory cells on the sense node side of the bit line isolators enables the effective doubling of the number of redundant cells available to each of a plurality of sub-arrays of normal memory.

Abstract: A CMOS integrated circuit for driving capacitance devices is provided. The circuit has an input node and an output node and includes a first transistor operatively connected to the input node which is turned "on" and "off" by the input node to supply an output signal to the output node when turned "on". A second transistor is provided, the output of which is connected to the output node when turned "on" to supply an output signal thereto. A control circuit is provided to turn on the first transistor prior to the second transistor, and to turn on the second transistor if and only if the slew rate of the output signal of the first transistor is less or slower than a given value.

Abstract: This invention relates to semiconductor memories and includes a sense amplifier architecture in which sensed data bit or column lines are electrically isolated and shielded from their immediately adjacent active neighbors by utilization of non-selected bit lines as an AC ground bus. In its simplest embodiment, shielded bit line (SBL) architecture includes two pairs of opposed bit lines associated with a common sense amplifier. One of each of the bit line pairs is multiplexed into the sense amplifier and the other unselected bit line pair is clamped to AC ground to shield the selected bit line pair from all dynamic line-to-line coupling.

Abstract: Low power addressing systems are provided which include a given number of memory segments, each having word and bit/sense lines, a given number of decoders coupled to the given number of memory segments for selecting one word line in each of the memory segments, a first plurality of transmission gate systems, each having first and second transmission gates, with each of the gates being coupled to a different one of the decoders, a second decoder having the first plurality of outputs, each of the outputs being coupled to a respective one of the transmission gate systems, first control circuits for selectively activating the first and second gates in each of the first plurality of transmission gate systems, a second given number of decoders coupled to the given number of memory segments for selecting one bit/sense line in each of the memory segments, a second plurality of transmission gate systems, each having first and second transmission gates, with each of the gates of the second plurality of transmission ga

Abstract: A CMOS off-chip driver circuit is provided which includes a first P-channel field effect transistor arranged in series with a second or pull-up P-channel transistor and a third P-channel transistor connected from the common point between the first and second transistors and the gate electrode of the first transistor. The first and second transistors are disposed between a data output terminal and a first voltage source having a supply voltage of a given magnitude, with the data output terminal also being connected to a circuit or system including a second voltage source having a supply voltage of a magnitude significantly greater than that of the given magnitude. In a more specific aspect of this invention, a fourth P-channel transistor, disposed in a common N-well with the other P-channel transistors, is connected at its source to the first voltage source and at its drain to the common N-well, with its gate electrode being connected to the data output terminal.

Abstract: A read only memory array of stacked IGFET devices composed of first and second sub-arrays of field effect transistors. The first sub-array of first field effect transistors is formed in a substrate. Each of the first field effect transistor devices is responsive to a polysilicon gate electrode. The second sub-array of second field effect transistors is formed in a layer of laser annealed polysilicon material which overlies the first sub-array. The gate electrodes of the first field effect transistors act as the gate electrodes of the second field effect transistors.