Patents by Inventor Hrong-Roang Sheu

Hrong-Roang Sheu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6380305
    Abstract: A polymeric composition is provided which exhibits a combination of high gloss and high environmental stress crack resistance, comprising: (a) high impact polystyrene having a gloss at 60 degrees of greater than 85% and an impact resistance of greater than 0.7 ft-lb/inch, (b) high density polyethylene which has a density greater than or equal to about 0.94 g/cm3, and which has a stress exponent less than or equal to about 1.70; and (c) a compatibilizing polymer for components (a) and (b), selected from the group consisting of diblock styrene butadiene copolymers, triblock styrene butadiene copolymers, diblock styrene isoprene copolymers, triblock styrene isoprene copolymers, and mixtures thereof, wherein the gloss at 60 degrees of the composition is greater than or equal to about 85%, and the environmental stress crack resistance measured in minutes until breakage at 1000 psi is greater than about 60.
    Type: Grant
    Filed: December 19, 1997
    Date of Patent: April 30, 2002
    Assignee: BASF Corporation
    Inventor: Hrong-Roang Sheu
  • Patent number: 6027800
    Abstract: Thermoplastic manufactured articles are provided which exhibit an advantageous combination of high gloss and high environmental stress crack resistance, made from a polymeric composition comprising:(a) high impact polystyrene having a gloss at 60 degrees of greater than 85% and an impact resistance of greater than 0.7 ft-lb/inch;(b) high density polyethylene which has a density greater than or equal to about 0.94 g/cm.sup.3, and which has a stress exponent less than or equal to about 1.70; and(c) a compatibilizing polymer for components (a) and (b), selected from the group consisting of diblock styrene butadiene copolymers, triblock styrene butadiene copolymers, diblock styrene isoprene copolymers, triblock styrene isoprene copolymers, and mixtures thereof,wherein the gloss at 60 degrees of the composition is greater than or equal to about 85%, and the environmental stress crack resistance measured in minutes until breakage at 1000 psi is greater than about 60.
    Type: Grant
    Filed: December 19, 1997
    Date of Patent: February 22, 2000
    Assignee: BASF Corporation
    Inventor: Hrong-Roang Sheu
  • Patent number: 5834126
    Abstract: Disclosed herein is a composition for barrier layers for use in insulative cabinet wall structures, particularly those used in appliances such as refrigerators and dishwashers. The compositions of the barrier layer is resistant to the action of polyurethane foam blowing agents, and has(i) an effective amount of a polyethylene modified with a compound such as maleic anhydride, maleic acid, maleic anhydride derivatives, maleic acid derivatives, or mixtures thereof; and(ii) an effective amount of a rubber.The barrier layer composition may contain polyethylene, polypropylene, polybutylene, or copolymers thereof.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: November 10, 1998
    Assignee: BASF Corporation
    Inventor: Hrong-Roang Sheu
  • Patent number: 5629388
    Abstract: A process for producing a polydiorganosiloxane based graft copolymer is provided. The process involves producing an emulsion of crosslinked polydiorganosiloxane by admixing dihydroxyfunctional polydiorganosiloxane, an emulsifying agent, and water; polymerizing the polydiorganosiloxane in the presence of an acid catalyst, a cross linking agent and a grafting agent to form silicone rubber particles having functional sites, and graft polymerizing a vinyl functional monomer onto the resulting silicone particles. The process provides several advantages in a rubber particle size control thereby resulting in better control of the properties of the resulting graft copolymer.
    Type: Grant
    Filed: March 2, 1995
    Date of Patent: May 13, 1997
    Assignee: General Electric Company
    Inventors: Kenneth G. Himelrick, Kevin R. Kidder, Vijaya K. Kuruganti, Hrong-Roang Sheu