Abstract: The present application discloses a hypochlorous acid composition and applications thereof wherein the hypochlorous acid composition comprises fluorosilicate, hypochlorous acid, and hypochlorite. The viscosity of the hypochlorous acid composition can be changed by exerting different pressures, wherein a low-viscosity fluid can be transformed into a variety of fluids with different high viscosities through pressure. Also, the high-viscosity hypochlorous acid fluid can also be formed by spraying, so that the high-viscosity hypochlorous acid fluid can be evenly coated on the surface of an object without a medium. The risks of infection and contamination when using the hypochlorous acid fluid can be mitigated, while spreading the application of hypochlorous acid in sterilization as well as cleaning and washing.

Abstract: A method for fiber modification provided in the present disclosure comprises the following steps: reacting fibers with a hypochlorous acid oxidant for development of antioxidant fibers, separating the antioxidant fibers from the hypochlorous acid oxidant and drying the antioxidant fibers to develop modified fibers which feature better oxidation resistance.

Abstract: A method for fiber modification provided in the present disclosure comprises steps: fibers react with a hypochlorous acid oxidant for development of antioxidant fibers, separate the antioxidant fibers from the hypochlorous acid oxidant and dry the antioxidant fibers for development of modified fibers which feature better oxidation resistance.

Abstract: The present application discloses a hypochlorous acid composition and applications thereof wherein the hypochlorous acid composition comprises fluorosilicate, hypochlorous acid, and hypochlorite, the hypochlorous acid composition sprayed is transformed to hypochlorous acid gels, and the hypochlorous acid gels deriving from the sprayed hypochlorous acid composition are evenly coated on an object for a long period of time without another medium for lower infection and contamination risks during usage of hypochlorous acid gels.

Abstract: A method of manufacture of an integrated circuit coupling system includes: forming a waveguide assembly, having a top clad over an open end of an optical core; forming a first photoresist having a base photoresist pattern shape with sloped photoresist sidewalls tapered down to expose a portion of the top clad; forming a recess having clad sidewalls from the portion of the top clad exposed by the base photoresist pattern shape, the clad sidewalls having a shape replicating a shape of the base photo resist pattern shape; and forming an optical vertical insertion area, from the clad sidewalls forming the recess, having a pocket trench, a horizontal step, and a mirror with a reflective material selectively applied to a section of the clad sidewalls and exposing the open end opposite to the mirror, the horizontal step between the mirror and the pocket trench.

Abstract: A method of manufacture of an integrated circuit coupling system includes: forming a waveguide assembly, having a top clad over an open end of an optical core; forming a first photoresist having a base photoresist pattern shape with sloped photoresist sidewalls tapered down to expose a portion of the top clad; forming a recess having clad sidewalls from the portion of the top clad exposed by the base photoresist pattern shape, the clad sidewalls having a shape replicating a shape of the base photo resist pattern shape; and forming an optical vertical insertion area, from the clad sidewalls forming the recess, having a pocket trench, a horizontal step, and a mirror with a reflective material selectively applied to a section of the clad sidewalls and exposing the open end opposite to the mirror, the horizontal step between the mirror and the pocket trench.

Abstract: A method of manufacture of an integrated circuit coupling system includes: forming a waveguide assembly, having a top clad over an open end of an optical core; forming a first photoresist having a base photoresist pattern shape with sloped photoresist sidewalls tapered down to expose a portion of the top clad; forming a recess having clad sidewalls from the portion of the top clad exposed by the base photoresist pattern shape, the clad sidewalls having a shape replicating a shape of the base photo resist pattern shape; and forming an optical vertical insertion area, from the clad sidewalls forming the recess, having a pocket trench, a horizontal step, and a mirror with a reflective material selectively applied to a section of the clad sidewalls and exposing the open end opposite to the mirror, the horizontal step between the mirror and the pocket trench.